SCHEMBL1607289

SCHEMBL1607289

COc1cccc(S(=O)(=O)O)c1N

nearest known ligand 0.56

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TTR P02766 1/20 0.46
HTR6 P50406 1/20 0.44
CA2 P00918 7/20 0.41
CA1 P00915 5/20 0.41
CA12 O43570 4/20 0.41
CA9 Q16790 4/20 0.41
CA7 P43166 2/20 0.41
CA14 Q9ULX7 2/20 0.41
ALDH1A1 P00352 4/20 0.41
TDP1 Q9NUW8 2/20 0.41
ADRA2B P18089 1/20 0.41
PTGS1 P23219 1/20 0.41
MAPT P10636 3/20 0.40
KMT2A Q03164 3/20 0.40
LMNA P02545 2/20 0.40
ACHE P22303 1/20 0.40
KDM4E B2RXH2 2/20 0.39
TP53 P04637 2/20 0.39
CYP3A4 P08684 2/20 0.39
HPGD P15428 2/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL31071497 0.83 HTR6 (0.46) HTR6CA2CA1CA12CA9
SCHEMBL1523031 0.83 CA2 (0.50) HTR6CA2CA1CA12CA9
SCHEMBL27943216 0.81 HTR6 (0.47) TTRHTR6CA2CA1CA12
SCHEMBL668439 0.81 HTR6 (0.47) TTRHTR6CA2CA1CA12
SCHEMBL15465584 0.81 HSD17B10 (0.52) TTRCA2CA1CA12CA9
SCHEMBL286480 0.80 HTR6 (0.60) HTR6CA2CA1CA12CA9
SCHEMBL29822548 0.80 HTR6 (0.60) HTR6CA2CA1CA12CA9
SCHEMBL599747 0.80 TTR (0.59) TTRCA2CA1CA12CA9
Sulfuric Acid SCHEMBL1039172 0.79 ALDH1A1 (0.52) TTRCA2CA1CA12CA9
SCHEMBL18700934 0.79 HTR6 (0.46) TTRHTR6CA2CA1CA12

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 43 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8313892-B2 Multi-layer body, method for forming resist pattern, method for manufacturing device having pattern by fine processing and electronic device FUJITSU LIMITED (JP) 2012-11-20 US claimed
CN-119836599-A Method for manufacturing conductive film, method for manufacturing mask, method for manufacturing semiconductor device, method for inspecting defect of conductive film, and defect inspection apparatus 三菱化学株式会社 2025-04-15 CN disclosed
CN-118165638-A Conductive polymer composition, coating material, and pattern forming method 信越化学工业株式会社 2024-06-11 CN disclosed
US-11739083-B2 Disposable sensor chip with reagent including 2-substituted benzothiazolyl-3-substituted phenyl-5-substituted sulfonated phenyl-2H-tetrazolium salt TERUMO KABUSHIKI KAISHA (JP) 2023-08-29 US disclosed
WO-2023132115-A1 RUST PREVENTIVE COMPOSITION AND RUST PREVENTION METHOD テック大洋工業株式会社 2023-07-13 WO disclosed
CN-116178948-A Conductive polymer composition, cover and pattern forming method 信越化学工业株式会社 2023-05-30 CN disclosed
CN-111433290-B Azo compound or salt thereof, and polarizing element, polarizing plate and display device each comprising the same 日本化药株式会社 2022-06-14 CN disclosed
CN-113795554-A Achromatic polarizing element, and achromatic polarizing plate and display device using same 日本化药株式会社 2021-12-14 CN disclosed
CN-110249008-B Azo compound or salt thereof, and dye-based polarizing film, dye-based polarizing plate, and liquid crystal display device each containing the same 日本化药株式会社 2021-06-11 CN disclosed
EP-3144351-B1 CONDUCTIVE COMPOSITION, ANTISTATIC FILM, LAMINATE AND PRODUCTION THEREFOR, AND PRODUCTION METHOD FOR PHOTOMASK MITSUBISHI CHEM CORP (JP) 2021-03-31 EP disclosed
US-20050277055-A1 Multi-layer body, method for forming resist pattern, method for manufacturing device having pattern by fine processing and electronic device FUJITSU LIMITED (JP) 2005-12-15 US disclosed
EP-0662694-B1 Soluble aniline conducting polymers MITSUBISHI RAYON CO (JP) 2002-02-27 EP disclosed
CN-1243062-A High-anti-static laminated material TOYO TEXTILE CO LTD (JP) 2000-02-02 CN disclosed
US-6017610-A INORGANIC OR ORGANIC SUBSTRATE AND A CONDUCTIVE LAYER FORMED ON AT LEAST A PART OF A SURFACE OF SAID SUBSTRATE; ANTISTATIC PERFORMANCE EVEN UNDER LOW HUMIDITY, HEAT RESISTANCE AND TRANSPARENCY TOYO BOSEKI KABUSHIKI KAISHA (JP) 2000-01-25 US disclosed
US-5932144-A ALKOXY GROUP SUBSTITUTED AMINOBENZENESULFONIC ACID, OR SALT THEREOF MITSUBISHI RAYON CO., LTD. (JP) 1999-08-03 US disclosed
US-5700399-A Soluble alkoxy-group substituted aminobenzenesulfonic acid aniline conducting polymers NITTO CHEMICAL INDUSTRY CO., LTD. (JP) 1997-12-23 US disclosed
US-5589108-A Soluble alkoxy-group substituted aminobenzenesulfonic acid aniline conducting polymers NITTO CHEMICAL INDUSTRY CO., LTD. (JP) 1996-12-31 US disclosed
EP-0662694-A2 Soluble aniline conducting polymers NITTO CHEMICAL INDUSTRY CO., LTD. (JP) 1995-07-12 EP disclosed
US-4125368-A Metallized monoazo dyes TOMS RIVER CHEMICAL CORP. (US) 1978-11-14 US disclosed
US-4058515-A Metallized phenyl-azo-naphthol compounds TOMS RIVER CHEMICAL CORPORATION (US) 1977-11-15 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-11739083-B2 Disposable sensor chip with reagent including 2-substituted benzothiazolyl-3-substituted phenyl-5-substituted sulfonated phenyl-2H-tetrazolium salt STUB1, BTK, TST TTR 331/4885HTR6 3274/4885CA2 822/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.