SCHEMBL16140252

SCHEMBL16140252

O=C(Cl)CC1OC2(OC1=O)C1CC3CC(C1)CC2C3

nearest known ligand 0.33

Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
HSD11B1 P28845 1/20 0.33
KCNH2 Q12809 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL16140251 0.88 HSD11B1 (0.37) HSD11B1KCNH2
SCHEMBL16140256 0.79
SCHEMBL16140253 0.76
SCHEMBL16546898 0.76
SCHEMBL16549961 0.73
SCHEMBL16546925 0.72
SCHEMBL8775272 0.71 GLS (0.46)
SCHEMBL16546881 0.71
SCHEMBL16546902 0.70
SCHEMBL16549962 0.68

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9256125-B2 Acid generators and photoresists comprising same ROHM AND HAAS ELECTRONIC MATERIALS, LLC (US) 2016-02-09 US disclosed
US-9067909-B2 Photoacid generator, photoresist, coated substrate, and method of forming an electronic device ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2015-06-30 US disclosed
US-9067909-B2 Photoacid generator, photoresist, coated substrate, and method of forming an electronic device ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2015-06-30 US disclosed
US-20150064620-A1 PHOTOACID GENERATOR, PHOTORESIST, COATED SUBSTRATE, AND METHOD OF FORMING AN ELECTRONIC DEVICE ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2015-03-05 US disclosed
US-20150064620-A1 PHOTOACID GENERATOR, PHOTORESIST, COATED SUBSTRATE, AND METHOD OF FORMING AN ELECTRONIC DEVICE ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2015-03-05 US disclosed
US-20140295347-A1 ACID GENERATORS AND PHOTORESISTS COMPRISING SAME ROHM AND HAAS ELECTRONIC MATERIALS, LLC (US) 2014-10-02 US disclosed
US-20140295347-A1 ACID GENERATORS AND PHOTORESISTS COMPRISING SAME ROHM AND HAAS ELECTRONIC MATERIALS, LLC (US) 2014-10-02 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20140295347-A1 ACID GENERATORS AND PHOTORESISTS COMPRISING SAME PPOX, HAO2, DUOX1 HSD11B1 1559/4885KCNH2 3547/4885
US-20150064620-A1 PHOTOACID GENERATOR, PHOTORESIST, COATED SUBSTRATE, AND METHOD OF FORMING AN ELECTRONIC DEVICE C1R, GLRA1, GLRA2 HSD11B1 1508/4885KCNH2 553/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.