SCHEMBL1616158

SCHEMBL1616158

O=C1NC(=O)c2c(OS(=O)(=O)c3ccccc3)cccc21

nearest known ligand 0.48

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ METAP2 P50579 1/20 0.48
▸ METAP1 P53582 1/20 0.48
▸ ALDH1A1 P00352 6/20 0.46
▸ KMT2A Q03164 6/20 0.45
▸ KDM4E B2RXH2 4/20 0.45
▸ MEN1 O00255 4/20 0.45
▸ POLB P06746 1/20 0.45
▸ MAPT P10636 4/20 0.44
▸ HPGD P15428 3/20 0.44
▸ TDP1 Q9NUW8 1/20 0.41
▸ HTT P42858 2/20 0.41
▸ L3MBTL1 Q9Y468 1/20 0.41
▸ HTR6 P50406 1/20 0.41
▸ GSK3B P49841 1/20 0.41
▸ CASP3 P42574 4/20 0.41
▸ CASP2 P42575 1/20 0.41
▸ CASP7 P55210 1/20 0.41
▸ CASP6 P55212 1/20 0.41
▸ CASP8 Q14790 1/20 0.41
▸ STK10 O94804 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3520419 0.87 KMT2A (0.50) ALDH1A1KMT2AKDM4EMEN1POLB
SCHEMBL5668275 0.84 PARP1 (0.47) METAP2METAP1ALDH1A1KMT2AKDM4E
SCHEMBL28249830 0.80 HTR6 (0.46) ALDH1A1KMT2AKDM4EMEN1POLB
SCHEMBL1027363 0.80 KDM4E (0.43) ALDH1A1KMT2AKDM4EMEN1POLB
SCHEMBL1026931 0.79 DRD2 (0.43) ALDH1A1KMT2AKDM4EMEN1POLB
SCHEMBL29868095 0.78 KMT2A (0.47) ALDH1A1KMT2AKDM4EMEN1POLB
SCHEMBL262473 0.75 GSK3B (0.50) ALDH1A1KMT2AKDM4EMEN1POLB
SCHEMBL28099802 0.75 GSK3B (0.50) ALDH1A1KMT2AKDM4EMEN1POLB
SCHEMBL5506330 0.74 MAOA (0.51) ALDH1A1KMT2AKDM4EPOLBMAPT
SCHEMBL31272384 0.74 ALDH1A1 (0.68) METAP2METAP1ALDH1A1KMT2AKDM4E

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7923704-B2 Charged particle beam writing method NUFLARE TECHNOLOGY, INC. (JP) 2011-04-12 — — US disclosed
US-20100178611-A1 Lithography method of electron beam NUFLARE TECHNOLOGY, INC. (JP) 2010-07-15 — — US disclosed
US-20090001293-A1 CHARGED PARTICLE BEAM WRITING METHOD NUFLARE TECHNOLOGY, INC. (JP) 2009-01-01 — — US disclosed
US-20070243487-A1 FORMING METHOD OF RESIST PATTERN AND WRITING METHOD OF CHARGED PARTICLE BEAM NUFLARE TECHNOLOGY, INC. (JP) 2007-10-18 — — US disclosed
US-4425424-A LEUCO DYE AND N-SULFONYLOXY PHOTOOXIDANT EASTMAN KODAK COMPANY (US) 1984-01-10 — — US disclosed
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