SCHEMBL1617162

SCHEMBL1617162

CCCO[Si](CC(C)C)(OCCC)OCCC

nearest known ligand 0.32

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
HSD17B10 Q99714 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL16497409 0.88
SCHEMBL2398601 0.85 ADRB2 (0.35)
SCHEMBL7923607 0.84 HSD17B10 (0.32) HSD17B10
SCHEMBL31142108 0.82 HSD17B10 (0.31) HSD17B10
SCHEMBL20448337 0.81 LPAR3 (0.38)
SCHEMBL8680466 0.81 LPAR3 (0.38)
SCHEMBL11808877 0.80 HSD17B10 (0.30) HSD17B10
SCHEMBL819873 0.80 OPRM1 (0.32) HSD17B10
SCHEMBL6725059 0.80 HSD17B10 (0.30) HSD17B10
SCHEMBL2338380 0.80 HSD17B10 (0.30) HSD17B10

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 147 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2021118145-A1 METHOD FOR PREPARING OLEFIN-BASED POLYMER BY GAS-PHASE POLYMERIZATION 한화솔루션 주식회사 2021-06-17 WO claimed
CN-107325394-B Polypropylene composition and high-performance flame-retardant antistatic polypropylene pipe 中国石油化工股份有限公司 2020-09-15 CN claimed
CN-107325411-B Flame-retardant antistatic random copolymerization polypropylene composition and pipe 中国石油化工股份有限公司 2020-09-15 CN claimed
CN-107325395-B Polypropylene composition and flame-retardant antistatic pipe 中国石油化工股份有限公司 2020-07-24 CN claimed
CN-103788256-A Preparation method of high-melt fluidity high-rigidity antishock polypropylene CHINA PETROLEUM & CHEMICAL 2014-05-14 CN claimed
EP-1029012-B1 Coatings that comprise reactive silicon oligomers DU PONT (US) 2007-09-19 EP claimed
US-20260118767-A1 REVERSE PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2026-04-30 US disclosed
EP-4700067-A1 COMPOSITION FOR FORMING SILICON-CONTAINING FILM, METHOD FOR FORMING FILM, AND SUPERSTRATE SHIN-ETSU CHEMICAL CO., LTD. (JP) 2026-02-25 EP disclosed
US-20260044081-A1 COMPOSITION FOR FORMING SILICON-CONTAINING RESIST FILM AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2026-02-12 US disclosed
EP-4692941-A2 COMPOSITION FOR FORMING SILICON-CONTAINING RESIST FILM AND PATTERNING PROCESS Shin-Etsu Chemical Co., Ltd. (JP) 2026-02-11 EP disclosed
US-20260029706-A1 COMPOSITION FOR FORMING SILICON-CONTAINING FILM, METHOD FOR FORMING FILM, AND SUPER STRAIGHT SHIN-ETSU CHEMICAL CO., LTD. (JP) 2026-01-29 US disclosed
EP-4621486-A2 POLYVALENT AMMONIUM SALT COMPOUND, COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM, AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2025-09-24 EP disclosed
US-20250289931-A1 POLYVALENT AMMONIUM SALT COMPOUND, COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM, AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2025-09-18 US disclosed
EP-1464410-A1 Low dielectric materials and methods for making same AIR PRODUCTS AND CHEMICALS, INC. (US) 2004-10-06 EP disclosed
US-20040048960-A1 Compositions for preparing low dielectric materials AIR PRODUCTS AND CHEMICALS, INC. 2004-03-11 US disclosed
CN-1134520-C Coatings that may comprrise reactive silicon oligoners 彭立军 2004-01-14 CN disclosed
EP-1376671-A1 Compositions for preparing materials with a low dielectric constant AIR PRODUCTS AND CHEMICALS, INC. (US) 2004-01-02 EP disclosed
CN-1278851-A Coatings that may comprrise reactive silicon oligoners DU PONT (US) 2001-01-03 CN disclosed
CN-1041368-A The preparation method of alpha-olefinic polymer UNION CARBIDE CHEM PLASTIC (US) 1990-04-18 CN disclosed
EP-0361371-A2 Process for the preparation of alphaolefin polymers UNION CARBIDE CHEMICALS AND PLASTICS COMPANY INC. (a New York corporation) (US) 1990-04-04 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (4 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20250289931-A1 POLYVALENT AMMONIUM SALT COMPOUND, COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM, AND PATTERNING PROCESS ASH2L, PUF60, IDUA HSD17B10 4516/4885
US-20260029706-A1 COMPOSITION FOR FORMING SILICON-CONTAINING FILM, METHOD FOR FORMING FILM, AND SUPER STRAIGHT SMC2, F12, SMC1A HSD17B10 1450/4885
US-20260118767-A1 REVERSE PATTERNING PROCESS EFNA1, EPHA4, ETV6 HSD17B10 4397/4885
US-20260044081-A1 COMPOSITION FOR FORMING SILICON-CONTAINING RESIST FILM AND PATTERNING PROCESS SMC1A, SPOUT1, LBR HSD17B10 2021/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.