Known targets — ChEMBL curated mechanism
ACHECHRM1CHRM3CHRNA1CHRNB1CHRNDCHRNECHRNG
The experimentally established mechanism targets of Iodide. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 19)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ACHE known ✓ | P22303 | 1/20 | 0.32 |
| ▸ | KCNN4 | O15554 | 4/20 | 0.41 |
| ▸ | KIF11 | P52732 | 1/20 | 0.41 |
| ▸ | TRPA1 | O75762 | 1/20 | 0.38 |
| ▸ | ATM | Q13315 | 1/20 | 0.38 |
| ▸ | GABRA1 | P14867 | 1/20 | 0.37 |
| ▸ | GABRB2 | P47870 | 1/20 | 0.37 |
| ▸ | TAAR1 | Q96RJ0 | 2/20 | 0.35 |
| ▸ | ESR1 | P03372 | 1/20 | 0.33 |
| ▸ | ESR2 | Q92731 | 1/20 | 0.33 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.33 |
| ▸ | MAPT | P10636 | 1/20 | 0.33 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.33 |
| ▸ | TSHR | P16473 | 1/20 | 0.32 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.31 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.31 |
| ▸ | SLC6A2 | P23975 | 1/20 | 0.31 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.31 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1618598 | 0.98 | KCNN4 (0.43) | KCNN4KIF11TRPA1ATMGABRA1 | |
| Water SCHEMBL3190735 | 0.96 | KCNN4 (0.41) | KCNN4KIF11TRPA1ATMGABRA1 | |
| SCHEMBL7437441 | 0.84 | KCNN4 (0.42) | KCNN4KIF11GABRA1GABRB2TAAR1 | |
| Trifluoromethanesulfonic Acid SCHEMBL1618856 | 0.83 | PTPN1 (0.38) | KCNN4KIF11TRPA1ATMGABRA1 | |
| Hydrochloric Acid SCHEMBL2967639 | 0.82 | KCNN4 (0.41) | KCNN4KIF11GABRA1GABRB2TAAR1 | |
| SCHEMBL4615965 | 0.82 | KCNN4 (0.46) | KCNN4KIF11TRPA1ATMGABRA1 | |
| Bromide SCHEMBL9346402 | 0.82 | KCNN4 (0.41) | KCNN4KIF11GABRA1GABRB2TAAR1 | |
| SCHEMBL5598485 | 0.79 | ESR1 (0.44) | KCNN4KIF11TRPA1ATMGABRA1 | |
| SCHEMBL3740131 | 0.79 | ESR1 (0.42) | KCNN4KIF11TRPA1ATMGABRA1 | |
| SCHEMBL3638609 | 0.76 | TRPA1 (0.46) | TRPA1ATMGABRA1GABRB2MAPT |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 39 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20100078598-A1 | CONDUCTIVE POLYMER COMPOSITION FOR RADIOGRAPHIC IMAGING | ELPANI CO., LTD. (KR) | 2010-04-01 | — | — | US | claimed |
| WO-2008091135-A1 | CONDUCTIVE POLYMER COMPOSITION FOR RADIOGRAPHIC IMAGING | ELPANI CO., LTD. (KR) | 2008-07-31 | — | — | WO | claimed |
| US-12300507-B2 | Method of manufacturing a semiconductor device | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 2025-05-13 | — | — | US | disclosed |
| US-12112979-B2 | Semiconductor device and manufacturing method thereof | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 2024-10-08 | — | — | US | disclosed |
| US-20240186148-A1 | METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 2024-06-06 | — | — | US | disclosed |
| US-11935757-B2 | Method of manufacturing a semiconductor device | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 2024-03-19 | — | — | US | disclosed |
| US-20230245900-A1 | METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE | TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. (TW) | 2023-08-03 | — | — | US | disclosed |
| US-11626293-B2 | Method of manufacturing a semiconductor device | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 2023-04-11 | — | — | US | disclosed |
| US-20220301927-A1 | SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 2022-09-22 | — | — | US | disclosed |
| US-20220230889-A1 | METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 2022-07-21 | — | — | US | disclosed |
| US-11355388-B2 | Semiconductor device and manufacturing method thereof | TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. (TW) | 2022-06-07 | — | — | US | disclosed |
| US-20100159219-A1 | Negative pattern of carbon nanotubes and carbon nanotube composite comprising surface-modified carbon nanotubes | PARK JONG JIN | 2010-06-24 | — | — | US | disclosed |
| US-20100078598-A1 | CONDUCTIVE POLYMER COMPOSITION FOR RADIOGRAPHIC IMAGING | ELPANI CO., LTD. (KR) | 2010-04-01 | — | — | US | disclosed |
| WO-2008091135-A1 | CONDUCTIVE POLYMER COMPOSITION FOR RADIOGRAPHIC IMAGING | ELPANI CO., LTD. (KR) | 2008-07-31 | — | — | WO | disclosed |
| US-20080153991-A1 | Method of making carbon nanotube patterned film or carbon nanotube composite using carbon nanotubes surface-modified with polymerizable moieties | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2008-06-26 | — | — | US | disclosed |
| US-20080020317-A1 | Novel metal nanoparticle and formation of conductive pattern using the same | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2008-01-24 | — | — | US | disclosed |
| US-7229747-B2 | Surface treatment of interpenetrating polymer networkcarbon tubes; photolithography; heat curing; negative patterns | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2007-06-12 | — | — | US | disclosed |
| US-20040265755-A1 | Surface treatment of interpenetrating polymer networkcarbon tubes; photolithography; heat curing; negative patterns | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2004-12-30 | — | — | US | disclosed |
| EP-1457821-A1 | Method of making carbon nanotube patterned film or carbon nanotube composite material using a composition comprising carbon nanotubes surface-modified with polymerizable moieties | Samsung Electronics Co., Ltd. (KR) | 2004-09-15 | — | — | EP | disclosed |
| US-20030064307-A1 | Process for forming latent image, process for detecting latent image, process and device for exposure, exposure apparatus, resist and substrate | NIKON CORPORATION (JP) | 2003-04-03 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20100159219-A1 | Negative pattern of carbon nanotubes and carbon nanotube composite comprising surface-modified carbon nanotubes | ACTN4, NCDN, PNN | ACHE 3404/4885KCNN4 78/4885KIF11 2822/4885 |
| US-20080153991-A1 | Method of making carbon nanotube patterned film or carbon nanotube composite using carbon nanotubes surface-modified with polymerizable moieties | FSCN1, NCDN, ACTN1 | ACHE 3370/4885KCNN4 261/4885KIF11 2843/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.