Water

Water

SCHEMBL3190735

Cc1cccc(C(C)(N)c2ccccc2)c1C.O

nearest known ligand 0.41

Full drug profile on Sugi Atlas →

Known targets — ChEMBL curated mechanism

ABCC9ABL1ACEACHEACVR1ADORA1ADORA2AADORA2BADORA3ADRA1AADRA1BADRA1DADRA2AADRA2BADRA2CADRB1ADRB2ADRB3AGTR1ALOX5ATP4AATP4BBCRBTKCACNA1ACACNA1BCACNA1CCACNA1DCACNA1ECACNA1FCACNA1GCACNA1HCACNA1ICACNA1SCACNA2D1CACNA2D2CACNA2D3CACNA2D4CACNB1CACNB2CACNB3CACNB4CACNG1CACNG2CACNG3CACNG4CACNG5CACNG6CACNG7CACNG8CALCRLCFBCHRM1CHRM2CHRM3CHRM4CHRM5CHRNA1CHRNB1CHRNDCHRNECHRNGCRBNCUL4ACXCR1CXCR2DDB1DDCDHFRDPP4DRD2DRD3DRD4EGFRERBB2ERBB4ESR1ESR2FDPSFKBP1AFLT1FLT3FLT4GARTGHSRGRIA1GRIA2GRIA3GRIA4GRIK1GRIK2GRIK3GRIK4GRIK5GRIN2AGSK3AGSK3BHDAC1HDAC10HDAC11HDAC2HDAC3HDAC4HDAC5HDAC6HDAC7HDAC8HDAC9HRH1HTR1AHTR1BHTR1DHTR1EHTR1FHTR2AHTR2BHTR2CHTR3AHTR3BHTR3CHTR3DHTR3EHTR4HTR5AHTR6HTR7IDH1IDH2IMPA1ITGA2BITGB3JAK1JAK2JAK3KCNJ11KCNK3KCNK9KDRKITMEN1METMMP1MMP13MMP7MMP8NANOD2NS5bODC1OPG057OPRD1OPRK1OPRM1PPARP1PARP2PDE3APDE3BPDE4APDE4BPDE4CPDE4DPDGFRBPIK3CAPIK3CBPIK3CDPIK3CGPIK3R1PIK3R2PIK3R3PIK3R5PKLRPPARDPPATPTGS1PTGS2RBX1ROCK1ROCK2RRM1RRM2RRM2BSCN10ASCN11ASCN1ASCN2ASCN3ASCN4ASCN5ASCN7ASCN8ASCN9ASCNN1ASCNN1BSCNN1GSIGMAR1SLC10A2SLC5A2SLC6A2SLC6A3SLC6A4SLC9A3SYKTACR1THRATHRBTOP1TUBA1ATUBA1BTUBA1CTUBA3CTUBA3ETUBA4ATUBBTUBB1TUBB2ATUBB2BTUBB3TUBB4ATUBB4BTUBB6TUBB8TYK2TYMSVDRampCblablaT-3blaT-4blaT-5blaT-6blaUOE-1dacAdacBdacCfolAfolPftsIgyrAgyrBileSmecAmrcAmrcBmrdAparCparEpbp2pbp4pbpApbpFrplArplBrplCrplDrplErplFrplIrplJrplKrplLrplMrplNrplOrplPrplQrplRrplSrplTrplUrplVrplWrplXrplYrpmArpmBrpmCrpmDrpmErpmE2rpmFrpmGrpmG1rpmG2rpmG3rpmHrpmIrpmJrpsArpsBrpsCrpsDrpsErpsFrpsGrpsHrpsIrpsJrpsKrpsLrpsMrpsNrpsOrpsPrpsQrpsRrpsSrpsTrpsUthyAykgMykgO

The experimentally established mechanism targets of Water. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ESR1 known ✓ P03372 2/20 0.33
ESR2 known ✓ Q92731 2/20 0.33
ACHE known ✓ P22303 1/20 0.32
SLC6A2 known ✓ P23975 1/20 0.31
KCNN4 O15554 2/20 0.41
KIF11 P52732 1/20 0.41
TRPA1 O75762 1/20 0.38
ATM Q13315 1/20 0.38
GABRA1 P14867 1/20 0.37
GABRB2 P47870 1/20 0.37
TAAR1 Q96RJ0 2/20 0.35
MAPK1 P28482 1/20 0.33
MAPT P10636 1/20 0.33
KMT2A Q03164 1/20 0.33
TSHR P16473 1/20 0.32
ALDH1A1 P00352 2/20 0.31
ALOX15 P16050 1/20 0.31
CYP1A2 P05177 1/20 0.31
CYP2D6 P10635 1/20 0.31
CYP3A4 P08684 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1618598 0.98 KCNN4 (0.43) KCNN4KIF11TRPA1ATMGABRA1
Iodide SCHEMBL1618290 0.96 KCNN4 (0.41) KCNN4KIF11TRPA1ATMGABRA1
SCHEMBL7437441 0.84 KCNN4 (0.42) KCNN4KIF11GABRA1GABRB2TAAR1
Trifluoromethanesulfonic Acid SCHEMBL1618856 0.83 PTPN1 (0.38) KCNN4KIF11TRPA1ATMGABRA1
Hydrochloric Acid SCHEMBL2967639 0.82 KCNN4 (0.41) KCNN4KIF11GABRA1GABRB2TAAR1
SCHEMBL4615965 0.82 KCNN4 (0.46) KCNN4KIF11TRPA1ATMGABRA1
Bromide SCHEMBL9346402 0.82 KCNN4 (0.41) KCNN4KIF11GABRA1GABRB2TAAR1
SCHEMBL5598485 0.79 ESR1 (0.44) KCNN4KIF11TRPA1ATMGABRA1
SCHEMBL3740131 0.79 ESR1 (0.42) KCNN4KIF11TRPA1ATMGABRA1
Water SCHEMBL10401166 0.78 TRPA1 (0.44) TRPA1ATMGABRA1GABRB2MAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7662541-B2 Photosensitive resin composition and photosensitive dry film by the use thereof TOKYO OHKA KOGYO CO., LTD. (JP) 2010-02-16 US disclosed
EP-1825328-B1 PHOTOSENSITIVE RESIN COMPOSITION AND PHOTOSENSITIVE DRY FILM BY THE USE THEREOF TOKYO OHKA KOGYO CO LTD (JP) 2009-04-15 EP disclosed
US-20070292804-A1 Photosensitive Resin Composition and Photosensitive Dry Film by the Use Thereof TOKYO OHKA KOGYO CO., LTD. (JP) 2007-12-20 US disclosed
EP-1825328-A2 PHOTOSENSITIVE RESIN COMPOSITION AND PHOTOSENSITIVE DRY FILM BY THE USE THEREOF TOKYO OHKA KOGYO CO., LTD. (JP) 2007-08-29 EP disclosed
EP-1810083-A1 PHOTOSENSITIVE RESIN COMPOSITION AND PHOTOSENSITIVE DRY FILM BY THE USE THEREOF TOKYO OHKA KOGYO CO., LTD. (JP) 2007-07-25 EP disclosed
WO-2006057423-A2 PHOTOSENSITIVE RESIN COMPOSITION AND PHOTOSENSITIVE DRY FILM BY THE USE THEREOF TOKYO OHKA KOGYO CO., LTD. (JP) 2006-06-01 WO disclosed
WO-2006049049-A1 PHOTOSENSITIVE RESIN COMPOSITION AND PHOTOSENSITIVE DRY FILM BY THE USE THEREOF TOKYO OHKA KOGYO CO., LTD. (JP) 2006-05-11 WO disclosed
US-5908720-A CARBON BLACK COATED WITH A RESIN OBTAINED FROM ONE OR MORE POLYMERIZABLE MONOMERS HAVING AT LEAST ONE REACTIVE GROUP SELECTED FROM THE GROUP CONSISTING OF EPOXY, THIOEPOXY, OXAZOLINE, AZILIDINE AND HYDROXYALKYL AMIDE GROUPS TOKYO OHKA KOGYO CO., LTD. (JP) 1999-06-01 US disclosed