SCHEMBL16229111

SCHEMBL16229111

COC(=O)C1C2CC(C1C(=O)O)C1C3C=CC(C3)C21

nearest known ligand 0.41

Predicted protein targets (top 12)

geneUniProtsupporting neighboursconfidence
▸ PPM1B O75688 1/20 0.41
▸ PTPN1 P18031 1/20 0.41
▸ PPP1CC P36873 1/20 0.41
▸ POLB P06746 5/20 0.40
▸ TDP1 Q9NUW8 2/20 0.40
▸ KDM4E B2RXH2 1/20 0.40
▸ ALDH1A1 P00352 2/20 0.39
▸ SMN1; SMN2 Q16637 1/20 0.39
▸ MEN1 O00255 2/20 0.39
▸ KMT2A Q03164 2/20 0.39
▸ APEX1 P27695 1/20 0.38
▸ HTT P42858 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13346320 0.93 ALDH1A1 (0.37) PPM1BPTPN1PPP1CCPOLBTDP1
SCHEMBL9223251 0.86 POLB (0.52) POLBTDP1ALDH1A1SMN1; SMN2APEX1
SCHEMBL13346313 0.83 ALDH1A1 (0.34) PPM1BPTPN1PPP1CCKDM4EALDH1A1
SCHEMBL12732743 0.82 PPM1B (0.52) PPM1BPTPN1PPP1CCPOLBTDP1
SCHEMBL6737297 0.80 POLB (0.56) PPM1BPTPN1PPP1CCPOLBTDP1
SCHEMBL12268152 0.80 POLB (0.56) PPM1BPTPN1PPP1CCPOLBTDP1
SCHEMBL12268155 0.80 POLB (0.56) PPM1BPTPN1PPP1CCPOLBTDP1
SCHEMBL390569 0.80 POLB (0.56) PPM1BPTPN1PPP1CCPOLBTDP1
SCHEMBL390785 0.80 POLB (0.56) PPM1BPTPN1PPP1CCPOLBTDP1
SCHEMBL3344598 0.80 POLB (0.56) PPM1BPTPN1PPP1CCPOLBTDP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-119371641-A Cyclic olefin ring-opening polymer and hydride thereof 杭州睿丰融创科技有限公司 2025-01-28 — — CN disclosed
US-11834419-B2 Compound, photoresist composition comprising same, photoresist pattern comprising same, and method for manufacturing photoresist pattern LG CHEM, LTD. (KR) 2023-12-05 — — US disclosed
US-11834419-B2 Compound, photoresist composition comprising same, photoresist pattern comprising same, and method for manufacturing photoresist pattern LG CHEM, LTD. (KR) 2023-12-05 — — US disclosed
US-20210032208-A1 COMPOUND, PHOTORESIST COMPOSITION COMPRISING SAME, PHOTORESIST PATTERN COMPRISING SAME, AND METHOD FOR MANUFACTURING PHOTORESIST PATTERN LG CHEM, LTD. (KR) 2021-02-04 — — US disclosed
US-9896537-B2 Norbornanyl rosin resin and process for preparing same YU HUI (US) 2018-02-20 — — US disclosed
US-9896537-B2 Norbornanyl rosin resin and process for preparing same YU HUI (US) 2018-02-20 — — US disclosed
US-9353213-B2 Functional norbornanyl ester derivatives, polymers and process for preparing same YU HUI (US) 2016-05-31 — — US disclosed
US-9353213-B2 Functional norbornanyl ester derivatives, polymers and process for preparing same YU HUI (US) 2016-05-31 — — US disclosed
US-20160122469-A1 Functional norbornanyl ester derivatives, polymers and process for preparing same YU HUI (US) 2016-05-05 — — US disclosed
US-20160122469-A1 Functional norbornanyl ester derivatives, polymers and process for preparing same YU HUI (US) 2016-05-05 — — US disclosed
US-8883897-B2 Functional norbornanyl ester derivatives, polymers and process for preparing same New Functional Polymers LLC (US) 2014-11-11 — — US disclosed
US-8883897-B2 Functional norbornanyl ester derivatives, polymers and process for preparing same New Functional Polymers LLC (US) 2014-11-11 — — US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20210032208-A1 COMPOUND, PHOTORESIST COMPOSITION COMPRISING SAME, PHOTORESIST PATTERN COMPRISING SAME, AND METHOD FOR MANUFACTURING PHOTORESIST PATTERN PPOX, SETD7, CRY1 PPM1B 744/4885PTPN1 814/4885PPP1CC 189/4885
US-11834419-B2 Compound, photoresist composition comprising same, photoresist pattern comprising same, and method for manufacturing photoresist pattern PPOX, SETD7, CRY1 PPM1B 744/4885PTPN1 814/4885PPP1CC 189/4885
US-20160122469-A1 Functional norbornanyl ester derivatives, polymers and process for preparing same CYP1B1, DECR1, CAD PPM1B 2343/4885PTPN1 3658/4885PPP1CC 2362/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.

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