Predicted protein targets (top 10)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.48 |
| ▸ | AKR1B1 | P15121 | 5/20 | 0.44 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.36 |
| ▸ | MAPT | P10636 | 1/20 | 0.33 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.33 |
| ▸ | POLB | P06746 | 2/20 | 0.33 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.31 |
| ▸ | PPARG | P37231 | 1/20 | 0.31 |
| ▸ | PPARD | Q03181 | 1/20 | 0.31 |
| ▸ | PPARA | Q07869 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL28294117 | 0.74 | XDH (0.38) | AKR1B1ALOX15MAPTNPSR1POLB | |
| SCHEMBL6317714 | 0.69 | CA2 (0.32) | POLB | |
| SCHEMBL11276170 | 0.67 | GAA (0.35) | ALDH1A1 | |
| SCHEMBL1624908 | 0.67 | TDP1 (0.45) | TDP1ALOX15POLBALDH1A1PPARG | |
| SCHEMBL943471 | 0.67 | TDP1 (1.00) | TDP1AKR1B1ALOX15MAPTNPSR1 | |
| SCHEMBL29389799 | 0.67 | TDP1 (1.00) | TDP1AKR1B1ALOX15MAPTNPSR1 | |
| SCHEMBL11575822 | 0.66 | XDH (0.31) | AKR1B1MAPTNPSR1POLBALDH1A1 | |
| SCHEMBL7077104 | 0.66 | XDH (0.40) | AKR1B1ALOX15MAPTNPSR1POLB | |
| SCHEMBL7489147 | 0.65 | POLB (0.33) | POLBALDH1A1PPARGPPARDPPARA | |
| SCHEMBL728363 | 0.61 | ALDH1A1 (0.37) | POLBALDH1A1PPARGPPARDPPARA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 23 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-107544208-B | Negative photosensitive resin composition, spacer, protective film and liquid crystal display element | 奇美实业股份有限公司 | 2022-05-31 | — | — | CN | disclosed |
| CN-108700835-B | Resist pattern forming method and resist | 日本瑞翁株式会社 | 2022-05-27 | — | — | CN | disclosed |
| CN-104238270-B | Composition, method for forming pattern, crystal grain and method for manufacturing display device | 奇美实业股份有限公司 | 2018-11-09 | — | — | CN | disclosed |
| CN-104345557-B | Negative photosensitive resin composition, pattern, crystal grain and device manufacturing method | 奇美实业股份有限公司 | 2018-06-22 | — | — | CN | disclosed |
| CN-107544208-A | Negative photosensitive resin composition, spacer, protective film and liquid crystal display element | 奇美实业股份有限公司 | 2018-01-05 | — | — | CN | disclosed |
| CN-107544210-A | Negative photosensitive resin composition, method for producing spacer, method for producing protective film, and liquid crystal display element | 奇美实业股份有限公司 | 2018-01-05 | — | — | CN | disclosed |
| US-20180004086-A1 | NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, PRODUCTION METHOD OF SPACER, PRODUCTION METHOD OF PROTECTION FILM, AND LIQUID CRYSTAL DISPLAY DEVICE | CHI MEI CORPORATION (TW) | 2018-01-04 | — | — | US | disclosed |
| US-9366959-B2 | Negative photosensitive resin composition and application thereof | CHI MEI CORPORATION (TW) | 2016-06-14 | — | — | US | disclosed |
| US-20150044790-A1 | NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION AND APPLICATION THEREOF | CHI MEI CORPORATION (TW) | 2015-02-12 | — | — | US | disclosed |
| CN-104345557-A | Negative photosensitive resin composition, pattern, crystal grain and device manufacturing method | CHI MEI CORP | 2015-02-11 | — | — | CN | disclosed |
| US-20110294243-A1 | PHOTORESIST COMPOSITION AND METHOD OF FORMING PHOTORESIST PATTERN USING THE SAME | SAMSUNG DISPLAY CO., LTD. (KR) | 2011-12-01 | — | — | US | disclosed |
| US-7989136-B2 | Photoresist composition and method of forming a photoresist pattern using the same | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2011-08-02 | — | — | US | disclosed |
| US-20110171581-A1 | PHOTORESIST COMPOSTION AND METHOD OF MANUFACTURING ARRAY SUBSTRATE USING THE SAME | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2011-07-14 | — | — | US | disclosed |
| US-7927897-B2 | Photoresist composition and method of manufacturing array substrate using the same | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2011-04-19 | — | — | US | disclosed |
| US-7638253-B2 | Photoresist composition and method of manufacturing a thin-film transistor substrate using the same | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2009-12-29 | — | — | US | disclosed |
| US-20090215233-A1 | PHOTORESIST COMPOSITION AND METHOD OF MANUFACTURING ARRAY SUBSTRATE USING THE SAME | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2009-08-27 | — | — | US | disclosed |
| US-20090042127-A1 | PHOTORESIST COMPOSITION AND METHOD OF FORMING A PHOTORESIST PATTERN USING THE SAME | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2009-02-12 | — | — | US | disclosed |
| US-20080254634-A1 | Photoresist composition and method of manufacturing a thin-film transistor substrate using the same | SAMSUNG ELECTRONICS CO., LTD. | 2008-10-16 | — | — | US | disclosed |
| US-4950826-A | Process for adjusting the cis-trans-double bond configuration in polyalkenamers | HUELS AKTIENGESELLSCHAFT (DE) | 1990-08-21 | — | — | US | disclosed |
| US-4048262-A | CYCLODODECENE, CYCLODODECADIENE, VULCANIZATION | CHEMISCHE WERKE HULS AKTIENGESELLSCHAFT (DT) | 1977-09-13 | — | — | US | disclosed |