Water

Water

SCHEMBL16321963

CCC(O)(C[N+](C)(C)C)C(=O)c1ccccc1.[OH-]

nearest known ligand 0.41

Full drug profile on Sugi Atlas →

Known targets — ChEMBL curated mechanism

GABRA1GABRA2GABRA3GABRA4GABRA5GABRA6GABRB1GABRB2GABRB3GABRDGABREGABRG1GABRG2GABRG3GABRPGABRQ

The experimentally established mechanism targets of Water. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
SRC P12931 1/20 0.41
CES1 P23141 6/20 0.40
KMT2A Q03164 4/20 0.38
HPGD P15428 4/20 0.38
MEN1 O00255 3/20 0.38
KDM4E B2RXH2 1/20 0.38
CYP3A4 P08684 1/20 0.38
MAPT P10636 1/20 0.38
ALOX15 P16050 1/20 0.38
MAPK1 P28482 1/20 0.38
SMN1; SMN2 Q16637 1/20 0.38
TDP1 Q9NUW8 1/20 0.38
CES2 O00748 3/20 0.38
CTNNB1 P35222 1/20 0.38
RAB9A P51151 2/20 0.36
NPC1 O15118 1/20 0.36
LMNA P02545 4/20 0.35
ALDH1A1 P00352 4/20 0.35
HTT P42858 1/20 0.35
CYP1A2 P05177 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Water SCHEMBL16340898 0.84 GAA (0.43) SRCCES1KMT2AMAPTTDP1
SCHEMBL4556750 0.84 CES1 (0.50) SRCCES1KMT2AHPGDMEN1
SCHEMBL10943300 0.77 CES2 (0.56) SRCCES1KMT2AHPGDMEN1
SCHEMBL10941976 0.77 ALDH1A1 (0.52) SRCCES1KMT2AHPGDMEN1
SCHEMBL6692640 0.75 GAA (0.48) SRCCES1KMT2AHPGDMEN1
SCHEMBL6698931 0.73 GAA (0.54) SRCCES1KMT2AMAPTTDP1
SCHEMBL31506638 0.73 ALDH1A1 (0.45) SRCCES1KMT2AHPGDMEN1
SCHEMBL10458191 0.73 GAA (0.53) SRCCES1KMT2AHPGDMEN1
SCHEMBL195379 0.72 CES1 (0.50) SRCCES1KMT2AHPGDMEN1
SCHEMBL6927987 0.72 GAA (0.52) CES1CES2GAA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9057959-B2 Developer for photosensitive resist material and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2015-06-16 US disclosed
US-20140377706-A1 DEVELOPER FOR PHOTOSENSITIVE RESIST MATERIAL AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-12-25 US disclosed