SCHEMBL1635858

SCHEMBL1635858

CC(C)(c1ccc(C(=O)O)cc1)c1ccc(C(C)(C)c2ccc(C(=O)O)cc2)cc1

nearest known ligand 0.65

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
SRD5A2 P31213 3/20 0.65
TSHR P16473 2/20 0.60
TP53 P04637 1/20 0.60
RXRA P19793 4/20 0.59
RXRB P28702 3/20 0.59
RARB P10826 1/20 0.59
RARG P13631 1/20 0.59
NR1H4 Q96RI1 3/20 0.55
EPHX2 P34913 2/20 0.55
ALDH1A1 P00352 1/20 0.54
SMN1; SMN2 Q16637 1/20 0.54
RXRG P48443 1/20 0.53
MEN1 O00255 1/20 0.52
CYP1A2 P05177 1/20 0.52
KMT2A Q03164 1/20 0.52
TDP1 Q9NUW8 1/20 0.52
CA1 P00915 2/20 0.50
CA2 P00918 2/20 0.50
ESR1 P03372 1/20 0.50
CYP3A4 P08684 1/20 0.50

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL71433 1.00 SRD5A2 (0.65) SRD5A2TSHRTP53RXRARXRB
Hydrochloric Acid SCHEMBL25180291 0.98 SRD5A2 (0.63) SRD5A2TSHRTP53RXRARXRB
Hydrochloric Acid SCHEMBL31614202 0.98 SRD5A2 (0.63) SRD5A2TSHRTP53RXRARXRB
SCHEMBL5955919 0.93 ALDH1A1 (0.59) SRD5A2TSHRTP53RXRARXRB
SCHEMBL9789224 0.93 RXRA (0.63) SRD5A2TSHRTP53RXRARXRB
SCHEMBL4348947 0.91 ESR1 (0.67) SRD5A2TSHRTP53RXRARXRB
Bisphenol A SCHEMBL2854094 0.91 ESR1 (0.67) SRD5A2TSHRTP53RXRARXRB
SCHEMBL9003755 0.89 SRD5A2 (0.55) SRD5A2TSHRTP53RXRARXRB
SCHEMBL31424823 0.89 TSHR (0.68) SRD5A2TSHRTP53RXRARXRB
Bisphenol A SCHEMBL11427584 0.89 ESR1 (0.64) SRD5A2TSHRTP53RXRARXRB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 41 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230323030-A1 Polyamide, Polyamide-Imide, Derivatives of These, Optical Film, Display Device, and Production Methods Therefor CENTRAL GLASS COMPANY, LIMITED (JP) 2023-10-12 US disclosed
US-20230303480-A1 Polybenzoxazole, Polyamide, Polyamide Solution, Insulating Material for High-Frequency Electronic Component, High-Frequency Electronic Component, High-Frequency Equipment, Insulating Material for Producing High-Frequency Electronic Component, Method for Producing Polyamide, Method for Producing Polybenzoxazole, Method for Producing Insulating Material for High-Frequency Electronic Component, and Diamine or Salt Thereof CENTRAL GLASS COMPANY, LIMITED (JP) 2023-09-28 US disclosed
US-20230287178-A1 Fluorinated Diamine or Salt Thereof, Method for Producing Fluorinated Diamine or Salt Thereof, Polyamide, Method for Producing Polyamide, Polyamide Solution, Cyclized Polyamide, Method for Producing Cyclized Polyamide, Insulation for High-Frequency Electronic Component, Method for Producing Insulation for High-Frequency Electronic Component, High-Frequency Electronic Component, High-Frequency Appliance, and Insulating Material for Producing High-Frequency Electronic Component CENTRAL GLASS COMPANY, LIMITED (JP) 2023-09-14 US disclosed
EP-4194482-A1 POLYBENZOXAZOLE, POLYAMIDE, POLYAMIDE SOLUTION, INSULATION FOR HIGH-FREQUENCY ELECTRONIC COMPONENT, HIGH-FREQUENCY ELECTRONIC COMPONENT, HIGH-FREQUENCY EQUIPMENT, INSULATION MATERIAL FOR PRODUCING HIGH-FREQUENCY ELECTRONIC COMPONENT, METHOD FOR PRODUCING POLYAMIDE, METHOD FOR PRODUCING POLYBENZOXAZOLE, METHOD FOR PRODUCING INSULATION FOR HIGH-FREQUENCY ELECTRONIC COMPONENT, AND DIAMINE OR SALT THEREOF Central Glass Company, Limited (JP) 2023-06-14 EP disclosed
EP-4190768-A1 FLUORINATED DIAMINE OR SALT THEREOF, METHOD FOR PRODUCING FLUORINATED DIAMINE OR SALT THEREOF, POLYAMIDE, METHOD FOR PRODUCING POLYAMIDE, POLYAMIDE SOLUTION, CYCLIZED POLYAMIDE, METHOD FOR PRODUCING CYCLIZED POLYAMIDE, INSULATING MATERIAL FOR HIGH-FREQUENCY ELECTRONIC COMPONENT, METHOD FOR PRODUCING INSULATING MATERIAL FOR HIGH-FREQUENCY ELECTRONIC COMPONENT, HIGH-FREQUENCY ELECTRONIC COMPONENT, HIGH-FREQUENCY APPLIANCE, AND INSULATING MATERIAL FOR PRODUCING HIGH-FREQUENCY ELECTRONIC COMPONENT Central Glass Company, Limited (JP) 2023-06-07 EP disclosed
EP-4163319-A1 POLYAMIDE, POLYAMIDE-IMIDE, DERIVATIVES OF THESE, OPTICAL FILM, DISPLAY DEVICE, AND PRODUCTION METHODS THEREFOR Central Glass Company, Limited (JP) 2023-04-12 EP disclosed
US-9793483-B2 Hexafluoroisopropanol group-containing diamine, polyimide and polyamide using same, cyclized product thereof, and method for producing same CENTRAL GLASS COMPANY, LIMITED (JP) 2017-10-17 US disclosed
US-9550711-B2 Fluorine-containing polymerizable monomer and polymer compound using same CENTRAL GLASS COMPANY, LIMITED (JP) 2017-01-24 US disclosed
EP-2716351-B1 GAS SEPARATION MEMBRANE CENTRAL GLASS CO LTD (JP) 2016-06-29 EP disclosed
US-9321017-B2 Gas-separation membrane NAGOYA INDUSTRIAL SCIENCE RESEARCH INSTITUTE (JP) 2016-04-26 US disclosed
US-20090023886-A1 Waterproofing; oil repellents; heat resistance; weatherproofing; corrosion resistance; radiation transparent; photosensitivity; low refractive index, dielectrics CENTRAL GLASS COMPANY, LIMITED (JP) 2009-01-22 US disclosed
EP-1810963-B1 FLUORINE-CONTAINING POLYMERIZABLE MONOMER AND POLYMER COMPOUND USING SAME CENTRAL GLASS CO LTD (JP) 2008-10-15 EP disclosed
US-20080234460-A1 Fluorine-Containing Polymerizable Monomer and Polymer Compound Using Same CENTRAL GLASS CO., LTD. (JP) 2008-09-25 US disclosed
US-20080221298-A1 Fluorinated Diamine and Polymer Made from the Same CENTRAL GLASS COMPANY, LIMITED (JP) 2008-09-11 US disclosed
EP-1557440-B1 Article formed of polybenzazole and production method for the same POLYMATECH CO LTD (JP) 2008-07-16 EP disclosed
EP-1832618-A1 FLUORINATED DIAMINE AND POLYMER MADE FROM THE SAME Central Glass Company, Limited (JP) 2007-09-12 EP disclosed
EP-1810963-A1 FLUORINE-CONTAINING POLYMERIZABLE MONOMER AND POLYMER COMPOUND USING SAME Central Glass Company, Limited (JP) 2007-07-25 EP disclosed
EP-1783158-A1 FLUORINE-CONTAINING POLYMERIZABLE MONOMER AND POLYMER COMPOUND USING SAME Central Glass Company, Limited (JP) 2007-05-09 EP disclosed
US-20050156356-A1 Article formed of polybenzazole and production method for the same POLYMATECH CO., LTD 2005-07-21 US disclosed
US-5243019-A Heat resistant polymers HITACHI CHEMICAL COMPANY, LTD. (JP) 1993-09-07 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (4 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20080234460-A1 Fluorine-Containing Polymerizable Monomer and Polymer Compound Using Same AFF2, FRG1, PFAS SRD5A2 1632/4885TSHR 4117/4885TP53 2659/4885
US-20080221298-A1 Fluorinated Diamine and Polymer Made from the Same AFF1, AFF2, SAT1 SRD5A2 4265/4885TSHR 2583/4885TP53 2292/4885
US-20230303480-A1 Polybenzoxazole, Polyamide, Polyamide Solution, Insulating Material for High-Frequency Electronic Component, High-Frequency Electronic Component, High-Frequency Equipment, Insulating Material for Producing High-Frequency Electronic Component, Method for Producing Polyamide, Method for Producing Polybenzoxazole, Method for Producing Insulating Material for High-Frequency Electronic Component, and Diamine or Salt Thereof PUF60, TET1, PBRM1 SRD5A2 2160/4885TSHR 3712/4885TP53 4329/4885
US-20090023886-A1 Waterproofing; oil repellents; heat resistance; weatherproofing; corrosion resistance; radiation transparent; photosensitivity; low refractive index, dielectrics PFN1, PFAS, FRG1 SRD5A2 3385/4885TSHR 1376/4885TP53 3606/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.