Predicted protein targets (top 13)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HPGD | P15428 | 5/20 | 0.38 |
| ▸ | HIF1A | Q16665 | 2/20 | 0.37 |
| ▸ | NR3C1 | P04150 | 1/20 | 0.36 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.36 |
| ▸ | LMNA | P02545 | 2/20 | 0.36 |
| ▸ | TP53 | P04637 | 1/20 | 0.36 |
| ▸ | MAPT | P10636 | 1/20 | 0.36 |
| ▸ | ALOX12 | P18054 | 1/20 | 0.36 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.35 |
| ▸ | PDGFRB | P09619 | 1/20 | 0.35 |
| ▸ | PDGFRA | P16234 | 1/20 | 0.35 |
| ▸ | PDE4B | Q07343 | 2/20 | 0.34 |
| ▸ | PPARG | P37231 | 1/20 | 0.34 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL10088186 | 0.88 | NR3C1 (0.38) | HPGDHIF1ANR3C1ALDH1A1LMNA | |
| SCHEMBL11922877 | 0.83 | ALDH1A1 (0.40) | HPGDALDH1A1NPSR1PPARG | |
| SCHEMBL13359730 | 0.79 | HPGD (0.42) | HPGDHIF1ANR3C1NPSR1PDGFRB | |
| SCHEMBL10138859 | 0.78 | LMNA (0.43) | HPGDALDH1A1LMNAMAPTPPARG | |
| SCHEMBL14219830 | 0.77 | HPGD (0.37) | HPGDHIF1ANR3C1ALDH1A1NPSR1 | |
| SCHEMBL10148404 | 0.76 | HPGD (0.36) | HPGDNR3C1LMNAPPARG | |
| SCHEMBL13920788 | 0.76 | NR3C1 (0.37) | HPGDNR3C1ALDH1A1NPSR1PDGFRB | |
| SCHEMBL17175347 | 0.74 | HPGD (0.35) | HPGDNR3C1LMNAPPARG | |
| SCHEMBL22762299 | 0.74 | NPSR1 (0.36) | HPGDHIF1ANR3C1TP53NPSR1 | |
| SCHEMBL12054784 | 0.73 | PDE4B (0.43) | HIF1AALDH1A1LMNATP53MAPT |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20150118628-A1 | ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY- OR RADIATION-SENSITIVE FILM THEREFROM, METHOD OF FORMING PATTERN, PROCESS FOR MANUFACTURING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE | FUJIFILM CORPORATION (JP) | 2015-04-30 | — | — | US | disclosed |