Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CTSB | P07858 | 3/20 | 0.42 |
| ▸ | DNMT1 | P26358 | 1/20 | 0.37 |
| ▸ | DNMT3A | Q9Y6K1 | 1/20 | 0.37 |
| ▸ | VCAM1 | P19320 | 2/20 | 0.37 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.36 |
| ▸ | MAPK1 | P28482 | 3/20 | 0.35 |
| ▸ | TSHR | P16473 | 2/20 | 0.35 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.35 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.35 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.35 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.35 |
| ▸ | CA12 | O43570 | 1/20 | 0.35 |
| ▸ | CA1 | P00915 | 1/20 | 0.35 |
| ▸ | CA2 | P00918 | 1/20 | 0.35 |
| ▸ | CA9 | Q16790 | 1/20 | 0.35 |
| ▸ | LMNA | P02545 | 3/20 | 0.35 |
| ▸ | MAPT | P10636 | 3/20 | 0.35 |
| ▸ | MEN1 | O00255 | 3/20 | 0.35 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.35 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.35 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL28978906 | 0.76 | CTSB (0.68) | CTSBTDP1MAPK1TSHRALDH1A1 | |
| SCHEMBL17341735 | 0.69 | CTSB (0.51) | CTSBTDP1TSHRALDH1A1CYP3A4 | |
| SCHEMBL27895855 | 0.68 | CTSB (0.61) | CTSBVCAM1TDP1MAPK1TSHR | |
| SCHEMBL11058082 | 0.66 | CTSB (0.68) | CTSBTDP1MAPK1TSHRALDH1A1 | |
| SCHEMBL10163668 | 0.64 | CTSB (0.54) | CTSBTDP1MAPK1TSHRALDH1A1 | |
| SCHEMBL423560 | 0.62 | CTSB (0.53) | CTSBTDP1MAPK1TSHRCYP1A2 | |
| SCHEMBL8372589 | 0.62 | ALDH1A1 (0.42) | VCAM1TDP1MAPK1TSHRCYP1A2 | |
| SCHEMBL17341738 | 0.62 | HSD17B1 (0.44) | TSHRCYP1A2CYP3A4MAPTMEN1 | |
| SCHEMBL3550072 | 0.62 | TDP1 (0.47) | VCAM1TDP1MAPK1TSHRALDH1A1 | |
| SCHEMBL1023324 | 0.62 | ALDH1A1 (0.47) | VCAM1TDP1MAPK1TSHRCYP1A2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-10042258-B2 | Composition for forming a resist upper-layer film and method for producing a semiconductor device using the composition | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2018-08-07 | — | — | US | disclosed |
| US-20170293227-A1 | COATING LIQUID FOR RESIST PATTERN COATING | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2017-10-12 | — | — | US | disclosed |
| US-20170293227-A1 | COATING LIQUID FOR RESIST PATTERN COATING | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2017-10-12 | — | — | US | disclosed |
| US-9746768-B2 | Resist overlayer film forming composition for lithography and method for producing semiconductor device using the same | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2017-08-29 | — | — | US | disclosed |
| US-9746768-B2 | Resist overlayer film forming composition for lithography and method for producing semiconductor device using the same | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2017-08-29 | — | — | US | disclosed |
| US-20170205711-A1 | COMPOSITION FOR FORMING A RESIST UPPER-LAYER FILM AND METHOD FOR PRODUCING A SEMICONDUCTOR DEVICE USING THE COMPOSITION | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2017-07-20 | — | — | US | disclosed |
| US-20170205711-A1 | COMPOSITION FOR FORMING A RESIST UPPER-LAYER FILM AND METHOD FOR PRODUCING A SEMICONDUCTOR DEVICE USING THE COMPOSITION | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2017-07-20 | — | — | US | disclosed |
| US-9494864-B2 | Resist overlayer film forming composition for lithography and method for manufacturing semiconductor device using the same | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2016-11-15 | — | — | US | disclosed |
| US-9494864-B2 | Resist overlayer film forming composition for lithography and method for manufacturing semiconductor device using the same | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2016-11-15 | — | — | US | disclosed |
| US-20150362835-A1 | RESIST OVERLAYER FILM FORMING COMPOSITION FOR LITHOGRAPHY AND METHOD FOR PRODUCING SEMICONDUCTOR DEVICE USING THE SAME | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2015-12-17 | — | — | US | disclosed |
| US-20150362835-A1 | RESIST OVERLAYER FILM FORMING COMPOSITION FOR LITHOGRAPHY AND METHOD FOR PRODUCING SEMICONDUCTOR DEVICE USING THE SAME | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2015-12-17 | — | — | US | disclosed |
| US-20150248057-A1 | RESIST OVERLAYER FILM FORMING COMPOSITION FOR LITHOGRAPHY AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE USING THE SAME | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2015-09-03 | — | — | US | disclosed |
| US-20150248057-A1 | RESIST OVERLAYER FILM FORMING COMPOSITION FOR LITHOGRAPHY AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE USING THE SAME | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2015-09-03 | — | — | US | disclosed |