SCHEMBL1712875

SCHEMBL1712875

O=S(=O)(Oc1ccccc1OS(=O)(=O)C(F)(F)F)C(F)(F)F

nearest known ligand 0.43

Predicted protein targets (top 13)

geneUniProtsupporting neighboursconfidence
DRD2 P14416 11/20 0.43
DRD3 P35462 8/20 0.43
DRD4 P21917 6/20 0.43
DRD1 P21728 4/20 0.43
DRD5 P21918 4/20 0.43
ELANE P08246 1/20 0.42
CA1 P00915 2/20 0.40
CA2 P00918 2/20 0.40
CA9 Q16790 2/20 0.40
CA5A P35218 1/20 0.40
HTR1D P28221 2/20 0.40
HTR5A P47898 1/20 0.39
ALDH1A1 P00352 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29414143 0.90 CA1 (0.50) DRD2DRD3DRD4DRD1DRD5
SCHEMBL16396491 0.90 RXRA (0.43) DRD2DRD3DRD4DRD1DRD5
SCHEMBL5599606 0.90 CA1 (0.50) DRD2DRD3DRD4DRD1DRD5
SCHEMBL7023211 0.89 DRD2 (0.42) DRD2DRD3DRD4DRD1DRD5
SCHEMBL16926997 0.87 DRD2 (0.41) DRD2DRD3DRD4DRD1DRD5
SCHEMBL776669 0.87 DRD2 (0.40) DRD2DRD3DRD4DRD1DRD5
SCHEMBL6937413 0.87 HSD11B1 (0.50) DRD2DRD3DRD4DRD1DRD5
SCHEMBL2984151 0.86 DRD2 (0.42) DRD2DRD3DRD4DRD1DRD5
SCHEMBL5599136 0.86 DRD2 (0.39) DRD2DRD3DRD4DRD1DRD5
SCHEMBL4553113 0.86 ALDH1A1 (0.42) DRD2DRD3DRD4DRD1DRD5

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 24 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-110003166-A A method of four oxa- rings kind are synthesized using aryne and tetrahydrofuran 华南理工大学 2019-07-12 CN claimed
US-11500247-B2 Liquid crystal sensor PLATYPUS TECHNOLOGIES, LLC (US) 2022-11-15 US disclosed
US-20200409221-A1 LIQUID CRYSTAL SENSOR PLATYPUS TECHNOLOGIES, LLC 2020-12-31 US disclosed
CN-110003166-A A method of four oxa- rings kind are synthesized using aryne and tetrahydrofuran 华南理工大学 2019-07-12 CN disclosed
CN-110003166-A A method of four oxa- rings kind are synthesized using aryne and tetrahydrofuran 华南理工大学 2019-07-12 CN disclosed
US-20170212088-A1 DETECTION OF GAS-PHASE ANALYTES USING LIQUID CRYSTALS PLATYPUS TECHNOLOGIES, LLC 2017-07-27 US disclosed
US-9575037-B2 Detection of gas-phase analytes using liquid crystals PLATYPUS TECHNOLOGIES, LLC (US) 2017-02-21 US disclosed
US-20160274084-A1 DETECTION OF VAPOR PHASE COMPOUNDS BY CHANGES IN PHYSICAL PROPERTIES OF A LIQUID CRYSTAL PLATYPUS TECHNOLOGIES, LLC 2016-09-22 US disclosed
US-9341576-B2 Detection of vapor phase compounds by changes in physical properties of a liquid crystal PLATYPUS TECHNOLOGIES, LLC (US) 2016-05-17 US disclosed
US-20160018371-A1 DETECTION OF GAS-PHASE ANALYTES USING LIQUID CRYSTALS PLATYPUS TECHNOLOGIES, LLC 2016-01-21 US disclosed
US-20100093096-A1 DETECTION OF VAPOR PHASE COMPOUNDS BY CHANGES IN PHYSICAL PROPERTIES OF A LIQUID CRYSTAL PLATYPUS TECHNOLOGIES, LLC (US) 2010-04-15 US disclosed
WO-2010031047-A2 DETECTION OF VAPOR PHASE COMPOUNDS BY CHANGES IN PHYSICAL PROPERTIES OF A LIQUID CRYSTAL PLATYPUS TECHNOLOGIES, LLC (US) 2010-03-18 WO disclosed
EP-1188807-B1 Chemical mechanical polishing stopper film, process for producing the same, and method of chemical mechanical polishing JSR CORP (JP) 2007-10-17 EP disclosed
EP-1099719-B1 Diyne-containing (co) polymer, processes for producing the same, and cured film JSR CORP (JP) 2007-01-17 EP disclosed
US-7153767-B2 Chemical mechanical polishing stopper film, process for producing the same, and method of chemical mechanical polishing JSR CORPORATION (JP) 2006-12-26 US disclosed
US-20050003218-A1 Chemical mechanical polishing stopper film, process for producing the same, and method of chemical mechanical polishing JSR CORPORATION (JP) 2005-01-06 US disclosed
US-6528605-B1 Diyne-containing (co)polymer, processes for producing the same, and cured film JSR CORPORATION (JP) 2003-03-04 US disclosed
US-20020064953-A1 Chemical mechanical polishing stopper film, process for producing the same, and method of chemical mechanical polishing JSR CORPORATION (JP) 2002-05-30 US disclosed
EP-1188807-A2 Chemical mechanical polishing stopper film, process for producing the same, and method of chemical mechanical polishing JSR Corporation (JP) 2002-03-20 EP disclosed
EP-1099719-A1 Diyne-containing (co) polymer, processes for producing the same, and cured film JSR Corporation (JP) 2001-05-16 EP disclosed