Predicted protein targets (top 14)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 3/20 | 0.41 |
| ▸ | KDM4E | B2RXH2 | 3/20 | 0.41 |
| ▸ | HTT | P42858 | 2/20 | 0.38 |
| ▸ | TP53 | P04637 | 2/20 | 0.38 |
| ▸ | EGLN1 | Q9GZT9 | 1/20 | 0.38 |
| ▸ | EGLN3 | Q9H6Z9 | 1/20 | 0.38 |
| ▸ | LMNA | P02545 | 1/20 | 0.35 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.33 |
| ▸ | POLB | P06746 | 2/20 | 0.32 |
| ▸ | MAPT | P10636 | 2/20 | 0.32 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.32 |
| ▸ | L3MBTL1 | Q9Y468 | 2/20 | 0.32 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.32 |
| ▸ | PKM | P14618 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL8846164 | 0.96 | TSHR (0.39) | TSHRKDM4EHTTTP53EGLN1 | |
| SCHEMBL269971 | 0.92 | TSHR (0.41) | TSHRKDM4EHTTTP53EGLN1 | |
| SCHEMBL8013 | 0.83 | TSHR (0.36) | TSHRKDM4EHTTTP53EGLN1 | |
| SCHEMBL28442624 | 0.83 | TSHR (0.36) | TSHRKDM4EHTTTP53EGLN1 | |
| SCHEMBL27902931 | 0.81 | LDHA (0.44) | TSHRKDM4EHTTTP53EGLN1 | |
| SCHEMBL11511298 | 0.81 | LMNA (0.35) | TSHRKDM4EHTTTP53EGLN1 | |
| SCHEMBL7779226 | 0.81 | LDHA (0.44) | TSHRKDM4EHTTTP53EGLN1 | |
| SCHEMBL11020165 | 0.81 | HTT (0.42) | TSHRKDM4EHTTTP53EGLN1 | |
| SCHEMBL11020169 | 0.81 | HTT (0.42) | TSHRKDM4EHTTTP53EGLN1 | |
| SCHEMBL29287334 | 0.78 | HTT (0.41) | TSHRKDM4EHTTKMT2APOLB |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-3229075-B1 | PHOTORESIST COMPOSITION, METHOD FOR MANUFACTURING SAME, AND METHOD FOR FORMING RESIST PATTERN | JSR CORP (JP) | 2021-01-06 | — | — | EP | disclosed |
| US-10725376-B2 | Pattern-forming method | JSR CORPORATION (JP) | 2020-07-28 | — | — | US | disclosed |
| US-20190094689-A1 | RADIATION-SENSITIVE COMPOSITION AND PATTERN-FORMING METHOD | JSR CORPORATION (JP) | 2019-03-28 | — | — | US | disclosed |
| US-10209619-B2 | Composition and method of forming pattern using composition | JSR CORPORATION (JP) | 2019-02-19 | — | — | US | disclosed |
| US-10090163-B2 | Inorganic film-forming composition for multilayer resist processes, and pattern-forming method | JSR CORPORATION (JP) | 2018-10-02 | — | — | US | disclosed |
| US-20170362412-A1 | COMPOSITION FOR FILM FORMATION, AND PATTERN-FORMING METHOD | JSR CORPORATION (JP) | 2017-12-21 | — | — | US | disclosed |
| EP-3229075-A1 | PHOTORESIST COMPOSITION, METHOD FOR MANUFACTURING SAME, AND METHOD FOR FORMING RESIST PATTERN | JSR Corporation (JP) | 2017-10-11 | — | — | EP | disclosed |
| US-20170269476-A1 | PHOTORESIST COMPOSITION, PRODUCTION METHOD OF PHOTORESIST COMPOSITION, AND RESIST PATTERN-FORMING METHOD | JSR CORPORATION (JP) | 2017-09-21 | — | — | US | disclosed |
| US-20170184961-A1 | PATTERN-FORMING METHOD | JSR CORPORATION (JP) | 2017-06-29 | — | — | US | disclosed |
| US-20160349616-A1 | SEMICONDUCTOR DEVICE PRODUCTION COMPOSITION AND PATTERN FORMATION METHOD | JSR CORPORATION (JP) | 2016-12-01 | — | — | US | disclosed |
| US-20150364332-A1 | INORGANIC FILM-FORMING COMPOSITION FOR MULTILAYER RESIST PROCESSES, AND PATTERN-FORMING METHOD | JSR CORPORATION (JP) | 2015-12-17 | — | — | US | disclosed |
| US-20150284539-A1 | COMPOSITION FOR FILM FORMATION, AND PATTERN-FORMING METHOD | JSR CORPORATION (JP) | 2015-10-08 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-10090163-B2 | Inorganic film-forming composition for multilayer resist processes, and pattern-forming method | HCAR1, HSD17B7, BMPR1A | TSHR 1437/4885KDM4E 1112/4885HTT 1631/4885 |
| US-20150364332-A1 | INORGANIC FILM-FORMING COMPOSITION FOR MULTILAYER RESIST PROCESSES, AND PATTERN-FORMING METHOD | HCAR1, HSD17B7, BMPR1A | TSHR 1437/4885KDM4E 1112/4885HTT 1631/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.