SCHEMBL17359261

SCHEMBL17359261

CN(CC1CO1)c1ccc(N(CC2CO2)CC2CO2)cc1

nearest known ligand 0.41

Predicted protein targets (top 8)

geneUniProtsupporting neighboursconfidence
MEN1 O00255 1/20 0.41
KMT2A Q03164 1/20 0.41
LMNA P02545 2/20 0.36
ALDH1A1 P00352 2/20 0.31
POLB P06746 1/20 0.31
L3MBTL1 Q9Y468 1/20 0.31
TAAR1 Q96RJ0 1/20 0.30
GLA P06280 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL17354956 0.92 MEN1 (0.45) MEN1KMT2ALMNAALDH1A1POLB
SCHEMBL12961267 0.92 ALDH1A1 (0.41) MEN1KMT2ALMNAALDH1A1
SCHEMBL132721 0.88 MEN1 (0.43) MEN1KMT2ALMNAALDH1A1POLB
SCHEMBL7157640 0.86 MEN1 (0.41) MEN1KMT2ALMNAALDH1A1POLB
SCHEMBL21401692 0.86 MEN1 (0.41) MEN1KMT2ALMNAALDH1A1POLB
SCHEMBL1665729 0.85 MEN1 (0.55) MEN1KMT2ALMNAALDH1A1POLB
SCHEMBL10749521 0.83 MEN1 (0.40) MEN1KMT2ALMNAALDH1A1TAAR1
SCHEMBL187220 0.83 ALDH1A1 (0.47) MEN1KMT2ALMNAALDH1A1POLB
SCHEMBL232952 0.82 MEN1 (0.57) MEN1KMT2ALMNAALDH1A1L3MBTL1
SCHEMBL1030304 0.82 LMNA (0.51) MEN1KMT2ALMNAALDH1A1POLB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3002308-B1 SILICONE SKELETON-CONTAINING POLYMER COMPOUND AND METHOD FOR PRODUCING SAME, CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION, PHOTO-CURABLE DRY FILM AND METHOD FOR PRODUCING SAME, PATTERNING PROCESS, LAYERED PRODUCT, AND SUBSTRATE SHINETSU CHEMICAL CO (JP) 2017-02-08 EP disclosed
US-9557645-B2 Positive photosensitive resin composition, photo-curable dry film and method for producing same, layered product, patterning process, and substrate SHIN-ETSU CHEMICAL CO., LTD. (JP) 2017-01-31 US disclosed
US-9377689-B2 Silicone structure-bearing polymer, negative resist composition, photo-curable dry film, patterning process, and electric/electronic part-protecting film SHIN-ETSU CHEMICAL CO., LTD. (JP) 2016-06-28 US disclosed
US-20160097973-A1 SILICONE SKELETON-CONTAINING POLYMER COMPOUND AND METHOD FOR PRODUCING SAME, CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION, PHOTO-CURABLE DRY FILM AND METHOD FOR PRODUCING SAME, PATTERNING PROCESS, LAYERED PRODUCT, AND SUBSTRATE SHIN-ETSU CHEMICAL CO., LTD. (JP) 2016-04-07 US disclosed
EP-3002308-A1 SILICONE SKELETON-CONTAINING POLYMER COMPOUND AND METHOD FOR PRODUCING SAME, CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION, PHOTO-CURABLE DRY FILM AND METHOD FOR PRODUCING SAME, PATTERNING PROCESS, LAYERED PRODUCT, AND SUBSTRATE Shin-Etsu Chemical Co., Ltd. (JP) 2016-04-06 EP disclosed
US-20160033865-A1 SILICONE STRUCTURE-BEARING POLYMER, NEGATIVE RESIST COMPOSITION, PHOTO-CURABLE DRY FILM, PATTERNING PROCESS, AND ELECTRIC/ELECTRONIC PART-PROTECTING FILM SHIN-ETSU CHEMICAL CO., LTD. (JP) 2016-02-04 US disclosed
US-20150370166-A1 POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, PHOTO-CURABLE DRY FILM AND METHOD FOR PRODUCING SAME, LAYERED PRODUCT, PATTERNING PROCESS, AND SUBSTRATE SHIN-ETSU CHEMICAL CO., LTD. (JP) 2015-12-24 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20160033865-A1 SILICONE STRUCTURE-BEARING POLYMER, NEGATIVE RESIST COMPOSITION, PHOTO-CURABLE DRY FILM, PATTERNING PROCESS, AND ELECTRIC/ELECTRONIC PART-PROTECTING FILM SMC4, SMC3, PUF60 MEN1 2333/4885KMT2A 342/4885LMNA 2066/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.