Predicted protein targets (top 10)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA1 | P00915 | 13/20 | 0.53 |
| ▸ | CA2 | P00918 | 13/20 | 0.53 |
| ▸ | RORC | P51449 | 1/20 | 0.33 |
| ▸ | F2 | P00734 | 2/20 | 0.32 |
| ▸ | TMPRSS4 | Q9NRS4 | 2/20 | 0.32 |
| ▸ | AOC2 | O75106 | 1/20 | 0.32 |
| ▸ | TP53 | P04637 | 1/20 | 0.30 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.30 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.30 |
| ▸ | TSHR | P16473 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL8514115 | 0.86 | AOC2 (0.41) | CA1CA2RORCAOC2TSHR | |
| SCHEMBL454991 | 0.75 | HSD11B1 (0.48) | CA1CA2TP53 | |
| SCHEMBL3183463 | 0.75 | CA2 (0.47) | CA1CA2RORCF2 | |
| SCHEMBL271339 | 0.75 | CA1 (0.44) | CA1CA2 | |
| SCHEMBL503836 | 0.74 | HSD11B1 (0.47) | CA1CA2TP53 | |
| SCHEMBL562808 | 0.74 | CA1 (0.46) | CA1CA2 | |
| SCHEMBL1802639 | 0.73 | CA1 (0.46) | CA1CA2 | |
| SCHEMBL1593302 | 0.73 | CA2 (0.40) | CA1CA2RORC | |
| SCHEMBL6310046 | 0.73 | CA1 (0.49) | CA1CA2CYP1A2CYP2D6TSHR | |
| SCHEMBL51946 | 0.72 | CA1 (0.43) | CA1CA2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9354523-B2 | Composition for resist pattern-refinement, and fine pattern-forming method | JSR CORPORATION (JP) | 2016-05-31 | — | — | US | disclosed |
| US-20160011513-A1 | COMPOSITION FOR FORMING FINE RESIST PATTERN, AND FINE PATTERN-FORMING METHOD | JSR CORPORATION (JP) | 2016-01-14 | — | — | US | disclosed |