SCHEMBL1747397

SCHEMBL1747397

c1ccc2cc3[nH]nnc3cc2c1

nearest known ligand 0.48

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
NQO2 P16083 1/20 0.44
KDM4E B2RXH2 7/20 0.43
LMNA P02545 4/20 0.43
HSD17B10 Q99714 2/20 0.43
KMT2A Q03164 4/20 0.41
MEN1 O00255 3/20 0.41
MAPT P10636 6/20 0.40
GRIN2D O15399 1/20 0.40
GRIN3B O60391 1/20 0.40
GRIN1 Q05586 1/20 0.40
GRIN2A Q12879 1/20 0.40
GRIN2B Q13224 1/20 0.40
GRIN2C Q14957 1/20 0.40
GRIN3A Q8TCU5 1/20 0.40
PDE3B Q13370 1/20 0.40
PDE3A Q14432 1/20 0.40
L3MBTL1 Q9Y468 1/20 0.40
NPC1 O15118 3/20 0.40
RAB9A P51151 3/20 0.40
SMN1; SMN2 Q16637 3/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL19651897 0.86
SCHEMBL4786564 0.79 NPC1 (0.44) KDM4ELMNAHSD17B10KMT2AMEN1
SCHEMBL4740032 0.79 NPC1 (0.48) KDM4EHSD17B10KMT2AMEN1MAPT
SCHEMBL19661363 0.78 DYRK1A (0.30)
SCHEMBL2568003 0.78 METAP2 (0.37) LMNARAB9ASMN1; SMN2HPGDPOLB
SCHEMBL2705071 0.76
Naphthalene SCHEMBL29039843 0.76 ALDH1A1 (0.41) NQO2KDM4EHSD17B10KMT2AMEN1
Benzotriazole SCHEMBL28258951 0.75 ALDH1A1 (0.39) NQO2KDM4EHSD17B10KMT2AMEN1
SCHEMBL366171 0.74 CLK2 (0.49) KDM4EKMT2AMEN1MAPTL3MBTL1
SCHEMBL20873828 0.74 FGFR1 (0.49) KDM4EKMT2AMEN1MAPTNPC1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 67 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-118534016-B Method for rapidly and quantitatively detecting NO content in plant body 北京大学现代农业研究院 2024-10-29 CN claimed
CN-118534016-A Method for rapidly and quantitatively detecting NO content in plant body 北京大学现代农业研究院 2024-08-23 CN claimed
US-20220389310-A1 LUMINESCENT MATERIALS AND METHODS THEREOF UNIVERSITY OF WASHINGTON (US) 2022-12-08 US claimed
WO-2021062035-A1 LUMINESCENT MATERIALS AND METHODS THEREOF UNIVERSITY OF WASHINGTON (US) 2021-04-01 WO claimed
EP-3492478-B1 METHOD FOR PRODUCING ORGANOSILICON COMPOUNDS USEFUL AS METAL SURFACE TREATMENT AGENTS SHINETSU CHEMICAL CO (JP) 2020-04-15 EP claimed
EP-1255797-B2 METHOD FOR ROUGHENING COPPER SURFACES FOR BONDING TO SUBSTRATES OMG ELECTRONIC CHEMICALS INC (US) 2016-10-12 EP claimed
EP-1255797-B1 METHOD FOR ROUGHENING COPPER SURFACES FOR BONDING TO SUBSTRATES OMG ELECTRONIC CHEMICALS INC (US) 2012-06-13 EP claimed
JP-4754752-B2 2011-08-24 JP claimed
EP-1255797-A4 METHOD FOR ROUGHENING COPPER SURFACES FOR BONDING TO SUBSTRATES ELECTROCHEMICALS INC (US) 2009-01-14 EP claimed
US-7351353-B1 Method for roughening copper surfaces for bonding to substrates ELECTROCHEMICALS, INC. (US) 2008-04-01 US claimed
CN-100340632-C Method for roughening copper surfaces for bonding to substrates ELECTROCHEMICALS INC (US) 2007-10-03 CN claimed
US-6946027-B2 Composition and method for preparing chemically-resistant roughened copper surfaces for bonding to substrates ELECTROCHEMICALS, INC. (US) 2005-09-20 US claimed
US-20040159264-A1 Composition and method for preparing chemically-resistant roughened copper surfaces for bonding to substrates MACDERMID, INCORPORATED 2004-08-19 US claimed
US-6716281-B2 ADHESION PROMOTER COMPREISING OXIDIZER, PH ADJUSTER, TOPOGRAPHY MODIFIER; AND COATING STABILIZER COMPRISING 2-MERCAPTOTHIAZOLINE OR 2-MERCAPTOIMIDAZOLINE DERIVATIVE ELECTROCHEMICALS, INC. 2004-04-06 US claimed
US-20030213553-A1 Composition and method for preparing chemically-resistant roughened copper surfaces for bonding to substrates MACDERMID, INCORPORATED 2003-11-20 US claimed
CN-1451031-A Method for roughening copper surfaces for bonding to substrates ELECTROCHEMICALS INC (US) 2003-10-22 CN claimed
JP-2003519286-A 2003-06-17 JP claimed
EP-1255797-A1 METHOD FOR ROUGHENING COPPER SURFACES FOR BONDING TO SUBSTRATES ELECTROCHEMICALS INC. (US) 2002-11-13 EP claimed
WO-2001049805-A1 METHOD FOR ROUGHENING COPPER SURFACES FOR BONDING TO SUBSTRATES ELECTROCHEMICALS INC. (US) 2001-07-12 WO claimed
CN-118534016-B Method for rapidly and quantitatively detecting NO content in plant body 北京大学现代农业研究院 2024-10-29 CN disclosed
CN-118534016-B Method for rapidly and quantitatively detecting NO content in plant body 北京大学现代农业研究院 2024-10-29 CN disclosed
CN-118534016-A Method for rapidly and quantitatively detecting NO content in plant body 北京大学现代农业研究院 2024-08-23 CN disclosed
CN-118534016-A Method for rapidly and quantitatively detecting NO content in plant body 北京大学现代农业研究院 2024-08-23 CN disclosed
US-11732138-B2 Deep ultraviolet-excitable water-solvated polymeric dyes BECTON, DICKINSON AND COMPANY (US) 2023-08-22 US disclosed
US-20230235177-A1 Deep Ultraviolet-Excitable Water-Solvated Polymeric Dyes BECTON, DICKINSON AND COMPANY 2023-07-27 US disclosed
US-11643556-B2 Fluorescent conjugated polymers BECTON, DICKINSON AND COMPANY (US) 2023-05-09 US disclosed
US-20220389310-A1 LUMINESCENT MATERIALS AND METHODS THEREOF UNIVERSITY OF WASHINGTON (US) 2022-12-08 US disclosed
WO-2021062035-A1 LUMINESCENT MATERIALS AND METHODS THEREOF UNIVERSITY OF WASHINGTON (US) 2021-04-01 WO disclosed
EP-1255797-B2 METHOD FOR ROUGHENING COPPER SURFACES FOR BONDING TO SUBSTRATES OMG ELECTRONIC CHEMICALS INC (US) 2016-10-12 EP disclosed
EP-2051935-B1 USE OF NITROANILINE DERIVATIVES FOR THE PRODUCTION OF NITRIC OXIDE ST MICROELECTRONICS SRL (IT) 2016-09-07 EP disclosed
US-8766006-B2 Use of nitroaniline derivatives for the production of nitric oxide STMICROELECTRONICS S.R.L. (IT) 2014-07-01 US disclosed
US-8766006-B2 Use of nitroaniline derivatives for the production of nitric oxide STMICROELECTRONICS S.R.L. (IT) 2014-07-01 US disclosed
US-20130224083-A1 USE OF NITROANILINE DERIVATIVES FOR THE PRODUCTION OF NITRIC OXIDE STMICROELECTRONICS S.R.I. (IT) 2013-08-29 US disclosed
US-20130224083-A1 USE OF NITROANILINE DERIVATIVES FOR THE PRODUCTION OF NITRIC OXIDE STMICROELECTRONICS S.R.I. (IT) 2013-08-29 US disclosed
US-8440849-B2 Use of nitroaniline derivatives for the production of nitric oxide STMICROELECTRONICS S.R.L. (IT) 2013-05-14 US disclosed
US-8440849-B2 Use of nitroaniline derivatives for the production of nitric oxide STMICROELECTRONICS S.R.L. (IT) 2013-05-14 US disclosed
EP-1255797-B1 METHOD FOR ROUGHENING COPPER SURFACES FOR BONDING TO SUBSTRATES OMG ELECTRONIC CHEMICALS INC (US) 2012-06-13 EP disclosed
US-20100291698-A1 DETECTION OF NITRO- AND NITRATE-CONTAINING COMPOUNDS THE REGENTS OF THE UNIVERSITY OF CALIFORNIA (US) 2010-11-18 US disclosed
US-20100291698-A1 DETECTION OF NITRO- AND NITRATE-CONTAINING COMPOUNDS THE REGENTS OF THE UNIVERSITY OF CALIFORNIA (US) 2010-11-18 US disclosed
US-20090191284-A1 USE OF NITROANILINE DERIVATIVES FOR THE PRODUCTION OF NITRIC OXIDE STMICROELECTRONICS S.R.I. (IT) 2009-07-30 US disclosed
US-20090191284-A1 USE OF NITROANILINE DERIVATIVES FOR THE PRODUCTION OF NITRIC OXIDE STMICROELECTRONICS S.R.I. (IT) 2009-07-30 US disclosed
US-7563315-B2 Composition and method for preparing chemically-resistant roughened copper surfaces for bonding to substrates OMG Electronic Chemicals, Inc. (US) 2009-07-21 US disclosed
EP-2051935-A1 USE OF NITROANILINE DERIVATIVES FOR THE PRODUCTION OF NITRIC OXIDE STMicroelectronics S.r.l. (IT) 2009-04-29 EP disclosed
EP-1255797-A4 METHOD FOR ROUGHENING COPPER SURFACES FOR BONDING TO SUBSTRATES ELECTROCHEMICALS INC (US) 2009-01-14 EP disclosed
US-7351353-B1 Method for roughening copper surfaces for bonding to substrates ELECTROCHEMICALS, INC. (US) 2008-04-01 US disclosed
WO-2008021250-A2 COMPOSITIONS AND METHODS FOR MODULATING APOPTOSIS IN CELLS OVER-EXPRESSING BCL-2 FAMILY MEMBER PROTEINS FRED HUTCHINSON CANCER RESEARCH CENTER (US) 2008-02-21 WO disclosed
WO-2008012845-A1 USE OF NITROANILINE DERIVATIVES FOR THE PRODUCTION OF NITRIC OXIDE STMICROELECTRONICS S.R.L. (IT) 2008-01-31 WO disclosed
WO-2008012845-A1 USE OF NITROANILINE DERIVATIVES FOR THE PRODUCTION OF NITRIC OXIDE STMICROELECTRONICS S.R.L. (IT) 2008-01-31 WO disclosed
CN-100340632-C Method for roughening copper surfaces for bonding to substrates ELECTROCHEMICALS INC (US) 2007-10-03 CN disclosed
US-7153445-B2 Method for roughening copper surfaces for bonding to substrates ELECTROCHEMICALS INC. (US) 2006-12-26 US disclosed
US-20060226115-A1 Composition and method for preparing chemically-resistant roughened copper surfaces for bonding to substrates MACDERMID, INCORPORATED 2006-10-12 US disclosed
US-7108795-B2 Composition and method for preparing chemically-resistant roughened copper surfaces for bonding to substrates ELECTROCHEMICALS, INC. (US) 2006-09-19 US disclosed
US-20060191869-A1 Method for roughening copper surfaces for bonding to substrates BERNARDS ROGER 2006-08-31 US disclosed
US-20050238811-A1 Composition and method for preparing chemically-resistant roughened copper surfaces for bonding to substrates MACDERMID, INCORPORATED 2005-10-27 US disclosed
US-6946027-B2 Composition and method for preparing chemically-resistant roughened copper surfaces for bonding to substrates ELECTROCHEMICALS, INC. (US) 2005-09-20 US disclosed
US-20040159264-A1 Composition and method for preparing chemically-resistant roughened copper surfaces for bonding to substrates MACDERMID, INCORPORATED 2004-08-19 US disclosed
US-6716281-B2 ADHESION PROMOTER COMPREISING OXIDIZER, PH ADJUSTER, TOPOGRAPHY MODIFIER; AND COATING STABILIZER COMPRISING 2-MERCAPTOTHIAZOLINE OR 2-MERCAPTOIMIDAZOLINE DERIVATIVE ELECTROCHEMICALS, INC. 2004-04-06 US disclosed
US-20040048486-A1 Method for roughening copper surfaces for bonding to substrates BERNARDS ROGER (US) 2004-03-11 US disclosed
US-20030213553-A1 Composition and method for preparing chemically-resistant roughened copper surfaces for bonding to substrates MACDERMID, INCORPORATED 2003-11-20 US disclosed
CN-1451031-A Method for roughening copper surfaces for bonding to substrates ELECTROCHEMICALS INC (US) 2003-10-22 CN disclosed
EP-1255797-A1 METHOD FOR ROUGHENING COPPER SURFACES FOR BONDING TO SUBSTRATES ELECTROCHEMICALS INC. (US) 2002-11-13 EP disclosed
US-6464901-B1 IN AQUEOUS SYSTEMS BEING TREATED WITH A HALOGEN BIOCIDE; NONHALOGENATED, NITROGEN CONTAINING, AROMATIC COMPOUNDS; PROVIDING SUBSTITUTION FOR THE HYDROGENS OF THE BENZENE RING OF A BENZOTRIAZOLE BL TECHNOLOGIES, INC. 2002-10-15 US disclosed
US-20020084441-A1 Method for roughening copper surfaces for bonding to substrates MACDERMID, INCORPORATED 2002-07-04 US disclosed
WO-2001049805-A1 METHOD FOR ROUGHENING COPPER SURFACES FOR BONDING TO SUBSTRATES ELECTROCHEMICALS INC. (US) 2001-07-12 WO disclosed
US-4284704-A Photographic elements with incorporated hydrogen source photoreductant and tetrazolium salt EASTMAN KODAK COMPANY (US) 1981-08-18 US disclosed
US-4220694-A TRIAZOLE-COATED NEGATIVE ELECTRODE COLLECTOR HITACHI MAXELL, LTD. (JP) 1980-09-02 US disclosed
EP-0005823-A1 Leak-proof alkaline cell and its production Hitachi Maxell Ltd. (JP) 1979-12-12 EP disclosed
EP-0005823-A1 Leak-proof alkaline cell and its production Hitachi Maxell Ltd. (JP) 1979-12-12 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20090191284-A1 USE OF NITROANILINE DERIVATIVES FOR THE PRODUCTION OF NITRIC OXIDE NOS2, NOS1, NOS3 NQO2 4/4885KDM4E 3323/4885LMNA 2929/4885
US-20130224083-A1 USE OF NITROANILINE DERIVATIVES FOR THE PRODUCTION OF NITRIC OXIDE NOS2, NOS1, NOS3 NQO2 4/4885KDM4E 2972/4885LMNA 2667/4885
US-20220389310-A1 LUMINESCENT MATERIALS AND METHODS THEREOF TYR, GSTA2, CYBA NQO2 85/4885KDM4E 3167/4885LMNA 1420/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.