SCHEMBL1756151

SCHEMBL1756151

CC1Cc2c1ccc1c2C(=O)NC1=O

nearest known ligand 0.47

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
PARP1 P09874 4/20 0.47
ACHE P22303 4/20 0.38
KDM4E B2RXH2 2/20 0.37
ALDH1A1 P00352 2/20 0.37
HPGD P15428 2/20 0.37
HSD17B10 Q99714 2/20 0.37
GAA P10253 1/20 0.37
PPOX P50336 1/20 0.35
TYMS P04818 3/20 0.35
MAPK10 P53779 1/20 0.35
MAOA P21397 1/20 0.33
MAOB P27338 1/20 0.33
GSK3B P49841 1/20 0.33
CASP3 P42574 2/20 0.33
WEE1 P30291 2/20 0.33
CHEK1 O14757 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10607840 0.81 PARP1 (0.53) PARP1KDM4EALDH1A1HPGDHSD17B10
SCHEMBL4788432 0.72 ACHE (0.41) ACHEKDM4EALDH1A1HPGDHSD17B10
SCHEMBL29762371 0.71 PARP1 (0.50) PARP1KDM4EALDH1A1HPGDHSD17B10
SCHEMBL11763384 0.67 PARP1 (0.60) PARP1KDM4EALDH1A1HPGDHSD17B10
SCHEMBL2951374 0.67 PARP1 (0.53) PARP1KDM4EALDH1A1HPGDHSD17B10
SCHEMBL6340545 0.67 PARP1 (0.79) PARP1KDM4EALDH1A1HPGDHSD17B10
SCHEMBL28688565 0.67 PARP1 (0.45) PARP1KDM4EALDH1A1HPGDHSD17B10
SCHEMBL7192840 0.66 MAOA (0.40) ACHEKDM4EMAOAMAOB
SCHEMBL222518 0.66 TSHR (0.36) PARP1ACHEALDH1A1
SCHEMBL31485539 0.66 KDM4E (0.40) PARP1KDM4EALDH1A1HPGDHSD17B10

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 20 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2493991-B1 ANTIREFLECTIVE COMPOSITION FOR PHOTORESISTS MERCK PATENT GMBH (DE) 2016-03-02 EP claimed
US-8551686-B2 Antireflective composition for photoresists AZ ELECTRONIC MATERIALS USA CORP. (US) 2013-10-08 US claimed
EP-2493991-A1 ANTIFEFLECTIVE COMPOSITION FOR PHOTORESISTS AZ Electronic Materials USA Corp. (US) 2012-09-05 EP claimed
WO-2011055209-A1 ANTIFEFLECTIVE COMPOSITION FOR PHOTORESISTS AZ ELECTRONIC MATERIALS USA CORP. (US) 2011-05-12 WO claimed
US-20110104613-A1 Antireflective Composition for Photoresists MERCK PATENT GMBH (DE) 2011-05-05 US claimed
US-7638262-B2 Antireflective composition for photoresists AZ ELECTRONIC MATERIALS USA CORP. (US) 2009-12-29 US claimed
EP-2052293-A2 ANTIREFLECTIVE COMPOSITION FOR PHOTORESISTS AZ Electronic Materials USA Corp. (US) 2009-04-29 EP claimed
WO-2008017954-A2 ANTIREFLECTIVE COMPOSITION FOR PHOTORESISTS AZ ELECTRONIC MATERIALS USA CORP. (DE) 2008-02-14 WO claimed
US-20080038659-A1 Antireflective composition for photoresists MERCK PATENT GMBH (DE) 2008-02-14 US claimed
CN-115073294-A Method for synthesizing axial chiral aryl conjugated diene through asymmetric alfa-C-H olefination reaction and product thereof 杭州师范大学 2022-09-20 CN disclosed
EP-2493991-B1 ANTIREFLECTIVE COMPOSITION FOR PHOTORESISTS MERCK PATENT GMBH (DE) 2016-03-02 EP disclosed
US-8551686-B2 Antireflective composition for photoresists AZ ELECTRONIC MATERIALS USA CORP. (US) 2013-10-08 US disclosed
EP-2052293-B1 ANTIREFLECTIVE COMPOSITION FOR PHOTORESISTS AZ ELECTRONIC MATERIALS USA (US) 2013-03-13 EP disclosed
EP-2493991-A1 ANTIFEFLECTIVE COMPOSITION FOR PHOTORESISTS AZ Electronic Materials USA Corp. (US) 2012-09-05 EP disclosed
WO-2011055209-A1 ANTIFEFLECTIVE COMPOSITION FOR PHOTORESISTS AZ ELECTRONIC MATERIALS USA CORP. (US) 2011-05-12 WO disclosed
US-20110104613-A1 Antireflective Composition for Photoresists MERCK PATENT GMBH (DE) 2011-05-05 US disclosed
US-7638262-B2 Antireflective composition for photoresists AZ ELECTRONIC MATERIALS USA CORP. (US) 2009-12-29 US disclosed
EP-2052293-A2 ANTIREFLECTIVE COMPOSITION FOR PHOTORESISTS AZ Electronic Materials USA Corp. (US) 2009-04-29 EP disclosed
WO-2008017954-A2 ANTIREFLECTIVE COMPOSITION FOR PHOTORESISTS AZ ELECTRONIC MATERIALS USA CORP. (DE) 2008-02-14 WO disclosed
US-20080038659-A1 Antireflective composition for photoresists MERCK PATENT GMBH (DE) 2008-02-14 US disclosed