Predicted protein targets (top 15)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | XDH | P47989 | 10/20 | 0.37 |
| ▸ | HSF1 | Q00613 | 4/20 | 0.37 |
| ▸ | ENPP3 | O14638 | 1/20 | 0.36 |
| ▸ | ENPP1 | P22413 | 1/20 | 0.36 |
| ▸ | PIK3CD | O00329 | 1/20 | 0.35 |
| ▸ | PIK3CA | P42336 | 1/20 | 0.35 |
| ▸ | PIK3CB | P42338 | 1/20 | 0.35 |
| ▸ | PIK3CG | P48736 | 1/20 | 0.35 |
| ▸ | SOAT1 | P35610 | 1/20 | 0.35 |
| ▸ | NPC1 | O15118 | 1/20 | 0.35 |
| ▸ | TNF | P01375 | 1/20 | 0.35 |
| ▸ | RAB9A | P51151 | 1/20 | 0.35 |
| ▸ | NLRP3 | Q96P20 | 2/20 | 0.35 |
| ▸ | TLR4 | O00206 | 1/20 | 0.35 |
| ▸ | FAAH | O00519 | 1/20 | 0.34 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL17736509 | 0.92 | XDH (0.37) | XDHHSF1ENPP3ENPP1PIK3CD | |
| SCHEMBL17736501 | 0.91 | ENPP3 (0.39) | ENPP3ENPP1PIK3CDPIK3CAPIK3CB | |
| SCHEMBL17736511 | 0.90 | LIPG (0.34) | XDHENPP3ENPP1PIK3CDPIK3CA | |
| SCHEMBL17736510 | 0.88 | ENPP3 (0.32) | ENPP3ENPP1 | |
| SCHEMBL17736487 | 0.86 | ENPP3 (0.38) | ENPP3ENPP1PIK3CDPIK3CAPIK3CB | |
| SCHEMBL17736515 | 0.83 | HDAC4 (0.31) | NPC1 | |
| SCHEMBL17736488 | 0.80 | TSHR (0.44) | ENPP3ENPP1SOAT1NPC1RAB9A | |
| SCHEMBL16381780 | 0.79 | XDH (0.50) | XDHHSF1NPC1TNFRAB9A | |
| SCHEMBL17736498 | 0.77 | FAAH (0.39) | XDHHSF1NPC1TNFRAB9A | |
| SCHEMBL17736486 | 0.74 | ENPP3 (0.38) | ENPP3ENPP1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20160131976-A1 | RESIST COMPOSITION FOR SEMICONDUCTOR MANUFACTURING PROCESS; RESIST FILM, RESIST-COATED MASK BLANKS, PHOTOMASK, AND RESIST PATTERNING METHOD USING SAID RESIST COMPOSITION; ELECTRONIC-DEVICE MANUFACTURING METHOD; AND ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2016-05-12 | — | — | US | disclosed |
| US-20160131976-A1 | RESIST COMPOSITION FOR SEMICONDUCTOR MANUFACTURING PROCESS; RESIST FILM, RESIST-COATED MASK BLANKS, PHOTOMASK, AND RESIST PATTERNING METHOD USING SAID RESIST COMPOSITION; ELECTRONIC-DEVICE MANUFACTURING METHOD; AND ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2016-05-12 | — | — | US | disclosed |