⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2680750 | 0.82 | ALDH1A1 (0.45) | — | |
| SCHEMBL2680602 | 0.80 | CYP4F2 (0.35) | — | |
| SCHEMBL2680747 | 0.80 | NAAA (0.44) | — | |
| SCHEMBL13799360 | 0.80 | CYP4F2 (0.39) | — | |
| SCHEMBL2680865 | 0.79 | NAAA (0.47) | — | |
| SCHEMBL2680863 | 0.79 | NAAA (0.47) | — | |
| SCHEMBL17264847 | 0.78 | POLB (0.38) | — | |
| SCHEMBL2681600 | 0.78 | HCAR2 (0.34) | — | |
| SCHEMBL14748201 | 0.78 | — | — | |
| SCHEMBL9973346 | 0.76 | ALOX15 (0.32) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20160147156-A1 | PATTERN FORMATION METHOD, ACTIVE-LIGHT-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2016-05-26 | — | — | US | disclosed |