SCHEMBL17790002

SCHEMBL17790002

CC(C)OC(C)Oc1ccc(F)cc1

nearest known ligand 0.44

Predicted protein targets (top 13)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 2/20 0.44
NPSR1 Q6W5P4 1/20 0.39
SLC6A4 P31645 1/20 0.37
ALDH1A3 P47895 1/20 0.36
NFE2L2 Q16236 1/20 0.36
SMN1; SMN2 Q16637 2/20 0.36
KMT2A Q03164 2/20 0.36
MEN1 O00255 1/20 0.36
LMNA P02545 1/20 0.36
MAPT P10636 1/20 0.36
PPARG P37231 1/20 0.35
PPARA Q07869 1/20 0.35
PARP10 Q53GL7 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL105035 0.81 ALDH1A3 (0.52) ALDH1A1NPSR1ALDH1A3NFE2L2SMN1; SMN2
SCHEMBL17789965 0.80 ACHE (0.42) ALDH1A1NPSR1ALDH1A3KMT2AMEN1
SCHEMBL17789963 0.80 CA1 (0.50) ALDH1A1NPSR1SLC6A4SMN1; SMN2LMNA
SCHEMBL17790005 0.78 LDHA (0.44) ALDH1A1NPSR1SLC6A4ALDH1A3SMN1; SMN2
SCHEMBL17789998 0.78 L3MBTL1 (0.47) ALDH1A1NPSR1SLC6A4ALDH1A3PPARG
SCHEMBL17790000 0.78 KMT2A (0.37) ALDH1A3SMN1; SMN2KMT2AMEN1PARP10
SCHEMBL14701617 0.77 ALDH1A1 (0.47) ALDH1A1NPSR1SLC6A4ALDH1A3NFE2L2
SCHEMBL14094031 0.77 KDM4E (0.44) ALDH1A1SLC6A4KMT2AMEN1LMNA
SCHEMBL17807113 0.76 ALDH1A3 (0.47) ALDH1A1NPSR1ALDH1A3SMN1; SMN2KMT2A
SCHEMBL12164744 0.76 PTPN5 (0.50) ALDH1A1NPSR1ALDH1A3SMN1; SMN2KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9798242-B2 Rinse solution for pattern formation and pattern forming process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2017-10-24 US disclosed
US-9632416-B2 Rinse solution for pattern formation and pattern forming process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2017-04-25 US disclosed
US-20160154312-A1 RINSE SOLUTION FOR PATTERN FORMATION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2016-06-02 US disclosed
US-20160154314-A1 RINSE SOLUTION FOR PATTERN FORMATION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2016-06-02 US disclosed