SCHEMBL17792425

SCHEMBL17792425

CC(F)(F)COC(=O)COC12CC3CC(CC(O)(C3)C1)C2

nearest known ligand 0.36

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 3/20 0.36
DPP4 P27487 2/20 0.33
MDH1 P40925 1/20 0.33
MDH2 P40926 1/20 0.33
THRB P10828 1/20 0.33
L3MBTL1 Q9Y468 1/20 0.32
HSD11B1 P28845 1/20 0.32
NPSR1 Q6W5P4 1/20 0.32
NPC1 O15118 2/20 0.31
RAB9A P51151 2/20 0.31
ABL1 P00519 1/20 0.31
TSHR P16473 1/20 0.31
RIN1 Q13671 1/20 0.31
LMNA P02545 1/20 0.30
PKM P14618 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL12608521 0.85 ALDH1A1 (0.42) ALDH1A1L3MBTL1NPSR1NPC1RAB9A
SCHEMBL17795901 0.84 ALDH1A1 (0.34) ALDH1A1MDH1MDH2
SCHEMBL12093464 0.82 ALDH1A1 (0.34) ALDH1A1DPP4MDH1MDH2THRB
SCHEMBL12608520 0.81 ALDH1A1 (0.38) ALDH1A1L3MBTL1NPSR1NPC1RAB9A
SCHEMBL17548774 0.81 ALDH1A1 (0.36) ALDH1A1DPP4MDH1MDH2L3MBTL1
SCHEMBL17828626 0.81 ALDH1A1 (0.54) ALDH1A1L3MBTL1HSD11B1NPSR1NPC1
SCHEMBL12608515 0.79 MDH1 (0.34) ALDH1A1MDH1MDH2HSD11B1
SCHEMBL12608514 0.79 MDH1 (0.34) ALDH1A1MDH1MDH2HSD11B1
SCHEMBL13554478 0.79 HSD11B1 (0.31) ALDH1A1DPP4MDH1MDH2HSD11B1
SCHEMBL13554282 0.79 MDH1 (0.32) ALDH1A1MDH1MDH2ABL1TSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9771346-B2 Salt, acid generator, resist composition and method for producing resist pattern SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2017-09-26 US disclosed
US-20160168115-A1 SALT, ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2016-06-16 US disclosed
US-20160154304-A1 SALT, ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2016-06-02 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20160168115-A1 SALT, ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN FGFR1, RER1, FRG1 ALDH1A1 1201/4885DPP4 4834/4885MDH1 2061/4885
US-20160154304-A1 SALT, ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN CLIC1, OXSR1, RER1 ALDH1A1 1211/4885DPP4 4856/4885MDH1 2166/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.