Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.39 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.39 |
| ▸ | KCNA3 | P22001 | 1/20 | 0.37 |
| ▸ | THRB | P10828 | 1/20 | 0.36 |
| ▸ | SMN1; SMN2 | Q16637 | 3/20 | 0.36 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.36 |
| ▸ | MEN1 | O00255 | 1/20 | 0.36 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.36 |
| ▸ | RAB9A | P51151 | 2/20 | 0.34 |
| ▸ | GLA | P06280 | 1/20 | 0.34 |
| ▸ | GAA | P10253 | 1/20 | 0.34 |
| ▸ | HTT | P42858 | 1/20 | 0.34 |
| ▸ | TAAR1 | Q96RJ0 | 1/20 | 0.33 |
| ▸ | RECQL | P46063 | 1/20 | 0.33 |
| ▸ | AOC3 | Q16853 | 1/20 | 0.33 |
| ▸ | PKM | P14618 | 1/20 | 0.32 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.32 |
| ▸ | LTA4H | P09960 | 2/20 | 0.32 |
| ▸ | TSHR | P16473 | 1/20 | 0.32 |
| ▸ | CASP1 | P29466 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2168159 | 0.89 | ALDH1A1 (0.40) | ALDH1A1L3MBTL1KCNA3THRBSMN1; SMN2 | |
| SCHEMBL1782417 | 0.79 | THRB (0.38) | ALDH1A1L3MBTL1KCNA3THRBSMN1; SMN2 | |
| SCHEMBL2229313 | 0.77 | LTA4H (0.36) | ALDH1A1KCNA3SMN1; SMN2RAB9ATAAR1 | |
| SCHEMBL9496214 | 0.73 | ALDH1A1 (0.37) | ALDH1A1L3MBTL1KCNA3THRBSMN1; SMN2 | |
| SCHEMBL712986 | 0.72 | LTA4H (0.41) | L3MBTL1KCNA3LTA4HTSHR | |
| Allylanisole SCHEMBL4737421 | 0.72 | KCNA3 (0.58) | ALDH1A1L3MBTL1KCNA3THRBSMN1; SMN2 | |
| SCHEMBL4354693 | 0.72 | LTA4H (0.36) | ALDH1A1L3MBTL1KCNA3SMN1; SMN2RAB9A | |
| SCHEMBL4363258 | 0.72 | KCNA3 (0.37) | ALDH1A1KCNA3PKMLTA4HTSHR | |
| SCHEMBL704612 | 0.71 | ALDH1A1 (0.41) | ALDH1A1SMN1; SMN2RAB9AGAATAAR1 | |
| SCHEMBL7980722 | 0.71 | ALDH1A1 (0.62) | ALDH1A1L3MBTL1KCNA3THRBSMN1; SMN2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 17 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11912889-B2 | Silicon-containing polymer, film-forming composition, method for forming silicon-containing polymer coating, method for forming silica coating, and production method for silicon-containing polymer | TOKYO OHKA KOGYO CO., LTD. (JP) | 2024-02-27 | — | — | US | disclosed |
| US-20220220338-A1 | SILICON-CONTAINING POLYMER, FILM-FORMING COMPOSITION, METHOD FOR FORMING SILICON-CONTAINING POLYMER COATING, METHOD FOR FORMING SILICA COATING, AND PRODUCTION METHOD FOR SILICON-CONTAINING POLYMER | TOKYO OHKA KOGYO CO., LTD. (JP) | 2022-07-14 | — | — | US | disclosed |
| US-20220213348-A1 | SILICON-CONTAINING POLYMER, FILM-FORMING COMPOSITION, METHOD FOR SUPPORTING METAL COMPOUND ON SURFACE OF OBJECT TO BE TREATED, ARTICLE HAVING METAL COMPOUND-SUPPORTING COATING FILM, AND METHOD FOR PRODUCING SILICON-CONTAINING POLYMER | TOKYO OHKA KOGYO CO., LTD. (JP) | 2022-07-07 | — | — | US | disclosed |
| US-11377522-B2 | Silicon-containing polymer, film-forming composition, method for forming silicon-containing polymer coating, method for forming silica-based coating, and production method for silicon-containing polymer | TOKYO OHKA KOGYO CO., LTD. (JP) | 2022-07-05 | — | — | US | disclosed |
| EP-3971229-A1 | SILICON-CONTAINING POLYMER, FILM-FORMING COMPOSITION, METHOD FOR FORMING SILICON-CONTAINING POLYMER COATING, METHOD FOR FORMING SILICA COATING, AND PRODUCTION METHOD FOR SILICON-CONTAINING POLYMER | TOKYO OHKA KOGYO CO., LTD. (JP) | 2022-03-23 | — | — | EP | disclosed |
| EP-3957678-A1 | SILICON-CONTAINING POLYMER, FILM-FORMING COMPOSITION, METHOD FOR SUPPORTING METAL COMPOUND ON SURFACE OF OBJECT TO BE TREATED, ARTICLE HAVING METAL COMPOUND-SUPPORTING COATING FILM, AND METHOD FOR PRODUCING SILICON-CONTAINING POLYMER | Tokyo Ohka Kogyo Co., Ltd. (JP) | 2022-02-23 | — | — | EP | disclosed |
| WO-2020235325-A1 | SILICON-CONTAINING POLYMER, FILM-FORMING COMPOSITION, METHOD FOR SUPPORTING METAL COMPOUND ON SURFACE OF OBJECT TO BE TREATED, ARTICLE HAVING METAL COMPOUND-SUPPORTING COATING FILM, AND METHOD FOR PRODUCING SILICON-CONTAINING POLYMER | 東京応化工業株式会社 (JP) | 2020-11-26 | — | — | WO | disclosed |
| US-20200362115-A1 | SILICON-CONTAINING POLYMER, FILM-FORMING COMPOSITION, METHOD FOR FORMING SILICON-CONTAINING POLYMER COATING, METHOD FOR FORMING SILICA-BASED COATING, AND PRODUCTION METHOD FOR SILICON-CONTAINING POLYMER | TOKYO OHKA KOGYO CO., LTD. (JP) | 2020-11-19 | — | — | US | disclosed |
| WO-2020230828-A1 | SILICON-CONTAINING POLYMER, FILM-FORMING COMPOSITION, METHOD FOR FORMING SILICON-CONTAINING POLYMER COATING, METHOD FOR FORMING SILICA COATING, AND PRODUCTION METHOD FOR SILICON-CONTAINING POLYMER | 東京応化工業株式会社 | 2020-11-19 | — | — | WO | disclosed |
| EP-1950239-B1 | TRANSPARENT INORGANIC-OXIDE DISPERSION, RESIN COMPOSITION CONTAINING INORGANIC OXIDE PARTICLES, COMPOSITION FOR ENCAPSULATING LUMINESCENT ELEMENT, LUMINESCENT ELEMENT, HARD COAT, OPTICAL FUNCTIONAL FILM, OPTICAL PART, AND PROCESS FOR PRODUCING RESIN COMPOSITION CONTAINING INORGANIC OXIDE PARTICLES | SUMITOMO OSAKA CEMENT CO LTD (JP) | 2017-01-04 | — | — | EP | disclosed |
| US-8247590-B2 | Method for preventing polymerization of unsaturated organosilicon compounds | WACKER CHEMIE AG (DE) | 2012-08-21 | — | — | US | disclosed |
| US-7985476-B2 | Transparent zirconia dispersion and zirconia particle-containing resin composition, composition for sealing light emitting element and light emitting element, hard coat film and optical functional film and optical component, and method for producing zirconia particle-containing resin | SUMITOMO OSAKA CEMENT CO., LTD. (JP) | 2011-07-26 | — | — | US | disclosed |
| US-20110118493-A1 | METHOD FOR PREVENTING POLYMERIZATION OF UNSATURATED ORGANOSILICON COMPOUNDS | WACKER CHEMIE AG (DE) | 2011-05-19 | — | — | US | disclosed |
| US-20090140284-A1 | Transparent Inorganic Oxide Dispersion and Iorganic Oxide Particle-Containing Resin Composition, Composition for Sealing Light Emitting Element and Light Emitting element, Hard Coat Film and Optical Functional Film and Optical Component, and Method for Producing Inorganic Oxide Pariticle-Containing Resin | SUMITOMO OSAKA CEMENT CO., LTD. (JP) | 2009-06-04 | — | — | US | disclosed |
| EP-1950239-A1 | TRANSPARENT INORGANIC-OXIDE DISPERSION, RESIN COMPOSITION CONTAINING INORGANIC OXIDE PARTICLES, COMPOSITION FOR ENCAPSULATING LUMINESCENT ELEMENT, LUMINESCENT ELEMENT, HARD COAT, OPTICAL FUNCTIONAL FILM, OPTICAL PART, AND PROCESS FOR PRODUCING RESIN COMPOSITION CONTAINING INORGANIC OXIDE PARTICLES | SUMITOMO OSAKA CEMENT CO., LTD. (JP) | 2008-07-30 | — | — | EP | disclosed |
| US-7291567-B2 | Silica-based film, method of forming the same, composition for forming insulating film for semiconductor device, interconnect structure, and semiconductor device | JSR CORPORATION (JP) | 2007-11-06 | — | — | US | disclosed |
| EP-1619226-A1 | Silica-based film, method of forming the same, composition for forming insulating film for semiconductor device, interconnect structure, and semiconductor device | JSR Corporation (JP) | 2006-01-25 | — | — | EP | disclosed |