SCHEMBL17899100

SCHEMBL17899100

CC(F)(F)C(=O)OCC(F)(F)C(F)(F)COC(=O)C12CC3CC(CC(C3)C1)C2

nearest known ligand 0.44

Predicted protein targets (top 14)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 7/20 0.42
NPSR1 Q6W5P4 3/20 0.42
MAPT P10636 3/20 0.42
MEN1 O00255 2/20 0.42
KMT2A Q03164 2/20 0.42
PRKCA P17252 1/20 0.41
CYP17A1 P05093 4/20 0.40
CYP19A1 P11511 4/20 0.40
ATM Q13315 1/20 0.39
PKM P14618 1/20 0.37
LMNA P02545 2/20 0.36
SCN1A P35498 1/20 0.35
SCN2A Q99250 1/20 0.35
SCN3A Q9NY46 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL17899091 0.88 NPSR1 (0.38) ALDH1A1NPSR1MAPTMEN1KMT2A
SCHEMBL17899103 0.87 ALDH1A1 (0.48) ALDH1A1NPSR1LMNA
SCHEMBL17899090 0.85 MEN1 (0.35) ALDH1A1NPSR1MAPTMEN1KMT2A
SCHEMBL6357099 0.85 ALDH1A1 (0.47) ALDH1A1NPSR1MAPTMEN1KMT2A
SCHEMBL17899089 0.83 ALDH1A1 (0.34) ALDH1A1NPSR1MAPTMEN1KMT2A
SCHEMBL17899099 0.83 MEN1 (0.34) ALDH1A1NPSR1MAPTMEN1KMT2A
SCHEMBL18031822 0.83 PRKCA (0.48) ALDH1A1NPSR1MAPTMEN1KMT2A
SCHEMBL17281550 0.83 ALDH1A1 (0.47) ALDH1A1NPSR1MAPTMEN1KMT2A
SCHEMBL2601744 0.83 ALDH1A1 (0.47) ALDH1A1NPSR1MAPTMEN1KMT2A
SCHEMBL17902874 0.82 ALDH1A1 (0.40) ALDH1A1NPSR1MAPTMEN1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9575408-B2 Photoresist composition and method for producing photoresist pattern SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2017-02-21 US disclosed
US-20160195809-A1 PHOTORESIST COMPOSITION AND METHOD FOR PRODUCING PHOTORESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2016-07-07 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20160195809-A1 PHOTORESIST COMPOSITION AND METHOD FOR PRODUCING PHOTORESIST PATTERN RER1, LCP1, COL1A1 ALDH1A1 914/4885NPSR1 1042/4885MAPT 286/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.