SCHEMBL18012777

SCHEMBL18012777

CCC1(CC)c2cc(/C(=N/OC(C)=O)c3ccccc3)ccc2-c2ccc(/C(=N/OC(C)=O)c3ccccc3)cc21

nearest known ligand 0.39

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
▸ ALDH1A1 P00352 7/20 0.39
▸ KMT2A Q03164 5/20 0.39
▸ POLB P06746 2/20 0.39
▸ MAPT P10636 3/20 0.38
▸ MAPK1 P28482 1/20 0.38
▸ RXRA P19793 1/20 0.38
▸ RXRB P28702 1/20 0.38
▸ RXRG P48443 1/20 0.38
▸ MEN1 O00255 1/20 0.36
▸ PDK2 Q15119 4/20 0.35
▸ PPARG P37231 2/20 0.34
▸ PPARA Q07869 2/20 0.34
▸ KDM4E B2RXH2 1/20 0.34
▸ PKM P14618 1/20 0.33
▸ CDK5 Q00535 1/20 0.33
▸ CDK5R1 Q15078 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL18351201 0.93 HPGD (0.39) ALDH1A1KMT2APOLBMAPTMAPK1
SCHEMBL17877640 0.90 ALDH1A1 (0.33) ALDH1A1KMT2APOLBMAPTMAPK1
SCHEMBL18012819 0.88 CYP2C19 (0.36) ALDH1A1KMT2APOLBMAPTMAPK1
SCHEMBL18012772 0.86 RXRA (0.42) ALDH1A1KMT2APOLBMAPTMAPK1
SCHEMBL18012625 0.85 MAPT (0.39) ALDH1A1KMT2APOLBMAPTMAPK1
SCHEMBL17953240 0.84 PDK2 (0.45) ALDH1A1MAPTMAPK1PDK2PPARG
SCHEMBL18012642 0.83 RAB9A (0.39) KMT2APOLBMAPTMEN1PDK2
SCHEMBL17056225 0.81 KMT2A (0.38) ALDH1A1KMT2APOLBMAPTMEN1
SCHEMBL18012776 0.81 PKM (0.40) KMT2AMAPTMEN1PDK2PKM
SCHEMBL18012814 0.81 MAPT (0.38) KMT2APOLBMAPTPDK2PKM

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2016126070-A1 NOVEL OXIMESTER DERIVATIVE COMPOUND, AND PHOTOPOLYMERIZATION INITIATOR AND PHOTORESIST COMPOSITION CONTAINING SAME 한국화학연구원 2016-08-11 — — WO disclosed
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