Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 5/20 | 0.44 |
| ▸ | CYP3A4 | P08684 | 3/20 | 0.44 |
| ▸ | CA2 | P00918 | 1/20 | 0.44 |
| ▸ | TSHR | P16473 | 3/20 | 0.43 |
| ▸ | LMNA | P02545 | 3/20 | 0.43 |
| ▸ | MAPK1 | P28482 | 3/20 | 0.43 |
| ▸ | KCNMA1 | Q12791 | 1/20 | 0.43 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.43 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.40 |
| ▸ | ATM | Q13315 | 1/20 | 0.40 |
| ▸ | PRSS1 | P07477 | 1/20 | 0.40 |
| ▸ | PRSS2 | P07478 | 1/20 | 0.40 |
| ▸ | PRSS3 | P35030 | 1/20 | 0.40 |
| ▸ | HCAR3 | P49019 | 2/20 | 0.37 |
| ▸ | MGAM | O43451 | 2/20 | 0.36 |
| ▸ | AMY1A | P0DUB6 | 2/20 | 0.36 |
| ▸ | GAA | P10253 | 2/20 | 0.36 |
| ▸ | SI | P14410 | 2/20 | 0.36 |
| ▸ | MGAM2 | Q2M2H8 | 2/20 | 0.36 |
| ▸ | CETP | P11597 | 1/20 | 0.36 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL18033713 | 0.87 | HCAR3 (0.53) | ALDH1A1CYP3A4CA2TSHRLMNA | |
| SCHEMBL20473730 | 0.81 | CYP3A4 (0.48) | ALDH1A1CYP3A4CA2TSHRLMNA | |
| SCHEMBL18031565 | 0.80 | ALDH1A1 (0.44) | ALDH1A1CYP3A4CA2TSHRLMNA | |
| SCHEMBL18031569 | 0.72 | KCNMA1 (0.53) | ALDH1A1TSHRLMNAKCNMA1HCAR3 | |
| SCHEMBL6818371 | 0.72 | KCNMA1 (0.50) | ALDH1A1CYP3A4LMNAMAPK1KCNMA1 | |
| SCHEMBL729724 | 0.70 | ALDH1A1 (0.45) | ALDH1A1CYP3A4TSHRLMNAHSD17B10 | |
| P-Xylene SCHEMBL8440149 | 0.70 | ALDH1A1 (0.60) | ALDH1A1CYP3A4CA2TSHRLMNA | |
| SCHEMBL6009118 | 0.70 | ALDH1A1 (0.76) | ALDH1A1CYP3A4CA2TSHRLMNA | |
| SCHEMBL31666989 | 0.70 | KCNMA1 (0.53) | ALDH1A1TSHRLMNAKCNMA1HCAR3 | |
| SCHEMBL1161338 | 0.70 | KCNMA1 (0.53) | ALDH1A1TSHRLMNAKCNMA1HCAR3 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230367214-A1 | CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND RESIST PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-11-16 | — | — | US | disclosed |
| US-20230194986-A1 | CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND RESIST PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-06-22 | — | — | US | disclosed |
| US-9740098-B2 | Chemically amplified negative resist composition using novel onium salt and resist pattern forming process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-08-22 | — | — | US | disclosed |
| US-9720323-B2 | Chemically amplified positive resist composition and pattern forming process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-08-01 | — | — | US | disclosed |
| US-20160299428-A1 | CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION USING NOVEL ONIUM SALT AND RESIST PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-10-13 | — | — | US | disclosed |
| US-20160246175-A1 | CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-08-25 | — | — | US | disclosed |