SCHEMBL18159470

SCHEMBL18159470

CCc1ccc(Sc2ccc(Sc3ccc(CC)cc3)cc2)cc1

nearest known ligand 0.48

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TP53 P04637 2/20 0.48
TAAR1 Q96RJ0 1/20 0.46
CYP2A6 P11509 1/20 0.44
LPL P06858 1/20 0.44
LIPG Q9Y5X9 1/20 0.44
LMNA P02545 2/20 0.44
RXFP1 Q9HBX9 1/20 0.44
SLC6A4 P31645 1/20 0.43
IDO1 P14902 2/20 0.43
ALDH1A1 P00352 1/20 0.42
TSHR P16473 2/20 0.41
MAPK1 P28482 2/20 0.41
NR1H2 P55055 1/20 0.41
CYP3A4 P08684 1/20 0.41
ATM Q13315 2/20 0.41
SMN1; SMN2 Q16637 2/20 0.41
CA2 P00918 1/20 0.41
TDP1 Q9NUW8 1/20 0.41
L3MBTL1 Q9Y468 1/20 0.41
PLAU P00749 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL576175 1.00 TP53 (0.48) TP53TAAR1CYP2A6LPLLIPG
SCHEMBL16933906 0.92 EGFR (0.42) TP53TAAR1CYP2A6LPLLIPG
SCHEMBL415478 0.90 TP53 (0.59) TP53TAAR1CYP2A6LMNARXFP1
SCHEMBL15500070 0.90 MLYCD (0.42) TP53TAAR1CYP2A6LMNARXFP1
SCHEMBL8943740 0.88 LPL (0.41) TP53TAAR1CYP2A6LPLLIPG
SCHEMBL14390455 0.88 NR1H2 (0.64) TP53LPLLIPGLMNARXFP1
SCHEMBL22360078 0.88 TAAR1 (0.48) TP53TAAR1CYP2A6LPLLIPG
SCHEMBL12967061 0.88 LMNA (0.57) TP53TAAR1LMNARXFP1IDO1
SCHEMBL10031880 0.86 ALOX5 (0.52) TP53TAAR1LMNARXFP1SLC6A4
SCHEMBL5685255 0.86 CYP2A6 (0.40) TP53TAAR1CYP2A6LPLLIPG

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9908990-B2 Organic layer composition, organic layer, and method of forming patterns SAMSUNG SDI CO., LTD. (KR) 2018-03-06 US disclosed
US-9908990-B2 Organic layer composition, organic layer, and method of forming patterns SAMSUNG SDI CO., LTD. (KR) 2018-03-06 US disclosed
US-20160304700-A1 ORGANIC LAYER COMPOSITION, ORGANIC LAYER, AND METHOD OF FORMING PATTERNS SAMSUNG SDI CO., LTD. (KR) 2016-10-20 US disclosed