SCHEMBL1825537

SCHEMBL1825537

C=C(C(=O)O)c1ccc(CC(F)(F)F)cc1

nearest known ligand 0.41

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 3/20 0.41
THRB P10828 2/20 0.39
THRA P10827 1/20 0.39
SRD5A2 P31213 1/20 0.37
PTPN1 P18031 4/20 0.35
ABL1 P00519 1/20 0.35
EPHX2 P34913 1/20 0.34
NR1H4 Q96RI1 1/20 0.34
HSD17B2 P37059 1/20 0.33
HDAC3 O15379 1/20 0.33
RXRA P19793 2/20 0.33
RXRB P28702 2/20 0.33
RXRG P48443 2/20 0.33
GRB2 P62993 1/20 0.33
L3MBTL1 Q9Y468 1/20 0.33
BLM P54132 1/20 0.33
PTPRC P08575 1/20 0.33
PTPN2 P17706 1/20 0.33
F2 P00734 1/20 0.33
PLG P00747 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1824538 0.86 THRB (0.37) ALDH1A1THRBTHRASRD5A2PTPN1
SCHEMBL1505324 0.80 ALDH1A1 (0.59) ALDH1A1THRBSRD5A2PTPN1RXRA
SCHEMBL22868058 0.78 SRD5A2 (0.50) ALDH1A1THRBTHRASRD5A2ABL1
SCHEMBL713716 0.77 TSHR (0.47) ALDH1A1SRD5A2
SCHEMBL18103219 0.75 KMT2A (0.59) THRBTHRAEPHX2NR1H4L3MBTL1
SCHEMBL4020642 0.75 CES2 (0.59) SRD5A2PTPN1EPHX2
SCHEMBL15559816 0.75 ALDH1A1 (0.41) ALDH1A1THRBTHRASRD5A2PTPN1
SCHEMBL27988584 0.75 PLA2G10 (0.52) ALDH1A1EPHX2NR1H4L3MBTL1BLM
SCHEMBL10711912 0.75 ALDH1A1 (0.63) ALDH1A1THRBRXRARXRBL3MBTL1
SCHEMBL28138164 0.75 CES2 (0.57) ALDH1A1THRBPTPN1L3MBTL1PTPRC

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1818723-B1 COMPOSITION FOR FORMING ANTIREFLECTION FILM, LAYERED PRODUCT, AND METHOD OF FORMING RESIST PATTERN JSR CORP (JP) 2011-05-04 EP disclosed
US-7709182-B2 Composition for forming antireflection film, layered product, and method of forming resist pattern JSR CORPORATION (JP) 2010-05-04 US disclosed
US-20080124524-A1 Composition For Forming Antireflection Film, Layered Product, And Method Of Forming Resist Pattern JSR CORPORATION (JP) 2008-05-29 US disclosed
EP-1818723-A1 COMPOSITION FOR FORMING ANTIREFLECTION FILM, LAYERED PRODUCT, AND METHOD OF FORMING RESIST PATTERN JSR Corporation (JP) 2007-08-15 EP disclosed