Known targets — ChEMBL curated mechanism
ACEADRA1AADRA1BADRA1DADRA2AADRA2BADRA2CADRB1ADRB2ATP4AATP4BAXLBTKCACNA1CCACNA1DCACNA1FCACNA1SCCR5CHRM2CHRM3CPT1BCPT2DPP4DRD1DRD2EGFRERBB2ERBB4FLT3HRH1HRH3HTR1AHTR2AHTR2BHTR2CHTR4JAK1JAK2JAK3KCNH2KMT2AMAP2K1MAP2K2MEN1MLNRMPLMTORPPIK3CAPIK3CBPIK3CDPIK3CGPIK3R1PIK3R2PIK3R3PIK3R5PLK4PPARGRENS1PR1SLC6A2SLC6A3SLC6A4SMOTYK2atpAatpBatpCatpDatpEatpFatpFHatpGpol
The experimentally established mechanism targets of Fumaric Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MEN1 known ✓ | O00255 | 1/20 | 0.37 |
| ▸ | KMT2A known ✓ | Q03164 | 1/20 | 0.37 |
| ▸ | GABRP | O00591 | 4/20 | 0.62 |
| ▸ | GABRD | O14764 | 4/20 | 0.62 |
| ▸ | GABRA1 | P14867 | 4/20 | 0.62 |
| ▸ | GABRB1 | P18505 | 4/20 | 0.62 |
| ▸ | GABRG2 | P18507 | 4/20 | 0.62 |
| ▸ | GABRB3 | P28472 | 4/20 | 0.62 |
| ▸ | GABRA5 | P31644 | 4/20 | 0.62 |
| ▸ | GABRA3 | P34903 | 4/20 | 0.62 |
| ▸ | GABRA2 | P47869 | 4/20 | 0.62 |
| ▸ | GABRB2 | P47870 | 4/20 | 0.62 |
| ▸ | GABRA4 | P48169 | 4/20 | 0.62 |
| ▸ | GABRE | P78334 | 4/20 | 0.62 |
| ▸ | GABRA6 | Q16445 | 4/20 | 0.62 |
| ▸ | GABRG1 | Q8N1C3 | 4/20 | 0.62 |
| ▸ | GABRG3 | Q99928 | 4/20 | 0.62 |
| ▸ | GABRQ | Q9UN88 | 4/20 | 0.62 |
| ▸ | TSHR | P16473 | 4/20 | 0.56 |
| ▸ | TP53 | P04637 | 2/20 | 0.56 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Fumaric Acid SCHEMBL1835364 | 1.00 | GABRP (0.62) | GABRPGABRDGABRA1GABRB1GABRG2 | |
| Maleic Acid SCHEMBL3118041 | 1.00 | GABRP (0.62) | GABRPGABRDGABRA1GABRB1GABRG2 | |
| Fumaric Acid SCHEMBL21145282 | 0.90 | GABRP (0.65) | GABRPGABRDGABRA1GABRB1GABRG2 | |
| Maleic Acid SCHEMBL8957408 | 0.90 | GABRP (0.65) | GABRPGABRDGABRA1GABRB1GABRG2 | |
| Fumaric Acid SCHEMBL21145284 | 0.90 | GABRP (0.65) | GABRPGABRDGABRA1GABRB1GABRG2 | |
| Fumaric Acid SCHEMBL7489586 | 0.87 | TSHR (0.64) | GABRPGABRDGABRA1GABRB1GABRG2 | |
| Maleic Acid SCHEMBL27875534 | 0.87 | TSHR (0.64) | GABRPGABRDGABRA1GABRB1GABRG2 | |
| Maleic Acid SCHEMBL27659186 | 0.87 | TSHR (0.64) | GABRPGABRDGABRA1GABRB1GABRG2 | |
| Crotonic Acid SCHEMBL1833418 | 0.86 | GABRP (0.54) | GABRPGABRDGABRA1GABRB1GABRG2 | |
| Crotonic Acid SCHEMBL1833420 | 0.86 | GABRP (0.54) | GABRPGABRDGABRA1GABRB1GABRG2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9328220-B2 | Liquids | INNOVIA FILMS LIMITED (GB) | 2016-05-03 | — | — | US | disclosed |
| US-8992798-B2 | Liquids | INNOVIA FILMS LIMITED (GB) | 2015-03-31 | — | — | US | disclosed |
| US-8784686-B2 | Liquids | INNOVIA FILMS LIMITED (GB) | 2014-07-22 | — | — | US | disclosed |
| US-20140187684-A1 | LIQUIDS | INNOVIA FILMS LIMITED (GB) | 2014-07-03 | — | — | US | disclosed |
| US-20110257433-A1 | LIQUIDS | THE UNIVERSITY OF YORK (GB) | 2011-10-20 | — | — | US | disclosed |
| EP-2322497-A1 | Ionic liquids comprising nitrogen containing cations | Innovia Films Limited (GB) | 2011-05-18 | — | — | EP | disclosed |
| US-20070185330-A1 | Liquids | THE UNIVERSITY OF YORK (GB) | 2007-08-09 | — | — | US | disclosed |
| US-7128976-B2 | Composition for film formation, method of film formation, and silica-based film | JSR CORPORATION (JP) | 2006-10-31 | — | — | US | disclosed |
| US-20030091838-A1 | Composition for film formation, method of film formation, and silica-based film | JSR CORPORATION (JP) | 2003-05-15 | — | — | US | disclosed |