⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL18476389 | 0.81 | — | — | |
| SCHEMBL21786273 | 0.71 | — | — | |
| SCHEMBL18470637 | 0.71 | PER2 (0.30) | — | |
| SCHEMBL23963453 | 0.70 | ALDH1A1 (0.30) | — | |
| SCHEMBL18476386 | 0.70 | — | — | |
| SCHEMBL20052927 | 0.69 | — | — | |
| SCHEMBL18476390 | 0.66 | ALDH1A1 (0.34) | — | |
| SCHEMBL4155564 | 0.64 | TSHR (0.36) | — | |
| SCHEMBL18470622 | 0.64 | TSHR (0.32) | — | |
| SCHEMBL18470626 | 0.63 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9897916-B2 | Compound, polymer compound, resist composition, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2018-02-20 | — | — | US | disclosed |
| US-20170038683-A1 | COMPOUND, POLYMER COMPOUND, RESIST COMPOSITION, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-02-09 | — | — | US | disclosed |