Known targets — ChEMBL curated mechanism
ABCC9ABL1ACEACHEACVR1ADORA1ADORA2AADORA2BADORA3ADRA1AADRA1BADRA1DADRA2AADRA2BADRA2CADRB1ADRB2ADRB3AGTR1ALOX5ATP4AATP4BBCRBTKCACNA1ACACNA1BCACNA1CCACNA1DCACNA1ECACNA1FCACNA1GCACNA1HCACNA1ICACNA1SCACNA2D1CACNA2D2CACNA2D3CACNA2D4CACNB1CACNB2CACNB3CACNB4CACNG1CACNG2CACNG3CACNG4CACNG5CACNG6CACNG7CACNG8CALCRLCFBCHRM1CHRM2CHRM3CHRM4CHRM5CHRNA1CHRNB1CHRNDCHRNECHRNGCRBNCUL4ACXCR1CXCR2DDB1DDCDHFRDPP4DRD2DRD3DRD4EGFRERBB2ERBB4ESR1ESR2FDPSFKBP1AFLT1FLT3FLT4GARTGHSRGRIA1GRIA2GRIA3GRIA4GRIK1GRIK2GRIK3GRIK4GRIK5GRIN2AGSK3AGSK3BHDAC1HDAC10HDAC11HDAC2HDAC3HDAC4HDAC5HDAC6HDAC7HDAC8HDAC9HRH1HTR1AHTR1BHTR1DHTR1EHTR1FHTR2AHTR2BHTR2CHTR3AHTR3BHTR3CHTR3DHTR3EHTR4HTR5AHTR6HTR7IDH1IDH2IMPA1ITGA2BITGB3JAK1JAK2JAK3KCNJ11KCNK3KCNK9KDRKITMEN1METMMP1MMP13MMP7MMP8NANOD2NS5bODC1OPG057OPRD1OPRK1OPRM1PPARP1PARP2PDE3APDE3BPDE4APDE4BPDE4CPDE4DPDGFRBPIK3CAPIK3CBPIK3CDPIK3CGPIK3R1PIK3R2PIK3R3PIK3R5PKLRPPARDPPATPTGS1PTGS2RBX1ROCK1ROCK2RRM1RRM2RRM2BSCN10ASCN11ASCN1ASCN2ASCN3ASCN4ASCN5ASCN7ASCN8ASCN9ASCNN1ASCNN1BSCNN1GSIGMAR1SLC10A2SLC5A2SLC6A2SLC6A3SLC6A4SLC9A3SYKTACR1THRATHRBTOP1TUBA1ATUBA1BTUBA1CTUBA3CTUBA3ETUBA4ATUBBTUBB1TUBB2ATUBB2BTUBB3TUBB4ATUBB4BTUBB6TUBB8TYK2TYMSVDRampCblablaT-3blaT-4blaT-5blaT-6blaUOE-1dacAdacBdacCfolAfolPftsIgyrAgyrBileSmecAmrcAmrcBmrdAparCparEpbp2pbp4pbpApbpFrplArplBrplCrplDrplErplFrplIrplJrplKrplLrplMrplNrplOrplPrplQrplRrplSrplTrplUrplVrplWrplXrplYrpmArpmBrpmCrpmDrpmErpmE2rpmFrpmGrpmG1rpmG2rpmG3rpmHrpmIrpmJrpsArpsBrpsCrpsDrpsErpsFrpsGrpsHrpsIrpsJrpsKrpsLrpsMrpsNrpsOrpsPrpsQrpsRrpsSrpsTrpsUthyAykgMykgO
The experimentally established mechanism targets of Water. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Water SCHEMBL29450508 | 1.00 | — | — | |
| Water SCHEMBL8819989 | 1.00 | — | — | |
| Water SCHEMBL29450509 | 1.00 | — | — | |
| Water SCHEMBL24591 | 1.00 | — | — | |
| Water SCHEMBL9088259 | 1.00 | — | — | |
| Water SCHEMBL20838529 | 1.00 | — | — | |
| Water SCHEMBL2418009 | 1.00 | — | — | |
| Water SCHEMBL921065 | 1.00 | — | — | |
| Water SCHEMBL733305 | 1.00 | — | — | |
| Water SCHEMBL6510201 | 1.00 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 18 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-120603283-A | Fin-HEMT with gallium oxide gallium nitride heterojunction and manufacturing method thereof | 湖北九峰山实验室 | 2025-09-05 | — | — | CN | disclosed |
| CN-117393440-A | Manufacturing method of gallium oxide Schottky diode with excellent interface characteristics | 西安电子科技大学 | 2024-01-12 | — | — | CN | disclosed |
| WO-2021075495-A1 | CONDUCTIVE FILM, DISPERSION, MANUFACTURING METHODS FOR THESE, AND DEVICE INCLUDING CONDUCTIVE FILM | 国立大学法人京都大学 | 2021-04-22 | — | — | WO | disclosed |
| CN-102872844-A | Composite adsorption material for removing gallium ions from natural water and preparation method for adsorption material | UNIV CHANGZHOU | 2013-01-16 | — | — | CN | disclosed |
| US-8278470-B2 | Method for producing trialkyl gallium | NICHIA CORPORATION (JP) | 2012-10-02 | — | — | US | disclosed |
| US-8158316-B2 | Electrophotographic photoreceptor, process cartridge and image forming apparatus | FUJI XEROX CO., LTD. (JP) | 2012-04-17 | — | — | US | disclosed |
| EP-1903618-B1 | Method for producing trialkyl gallium | NICHIA CORP (JP) | 2012-01-04 | — | — | EP | disclosed |
| US-20110070536-A1 | OXIDE MATERIAL, ELECTROPHOTOGRAPHIC PHOTORECEPTOR, PROCESS CARTRIDGE, AND IMAGE FORMING DEVICE | FUJI XEROX CO., LTD. (JP) | 2011-03-24 | — | — | US | disclosed |
| EP-1705719-B1 | Methods for producing trialkyl gallium | NICHIA CORP (JP) | 2010-12-15 | — | — | EP | disclosed |
| US-7667063-B2 | Method for producing trialkyl gallium | NICHIA CORPORATION (JP) | 2010-02-23 | — | — | US | disclosed |
| US-20100013055-A1 | METHOD FOR PRODUCING TRIALKYL GALLIUM | NICHIA CORPORATION | 2010-01-21 | — | — | US | disclosed |
| EP-1755175-B1 | Methods for producing trialkyl gallium | NICHIA CORP (JP) | 2009-12-30 | — | — | EP | disclosed |
| EP-1903618-A1 | Method for producing trialkyl gallium | Nichia Corporation (JP) | 2008-03-26 | — | — | EP | disclosed |
| EP-1755175-A1 | Methods for producing trialkyl gallium | Nichia Corporation (JP) | 2007-02-21 | — | — | EP | disclosed |
| US-20060214161-A1 | Method for producing trialkyl gallium | NICHIA CORPORATION | 2006-09-28 | — | — | US | disclosed |
| EP-1705719-A1 | Methods for producing trialkyl gallium | Nichia Corporation (JP) | 2006-09-27 | — | — | EP | disclosed |
| EP-1592823-A1 | A METHOD OF MANUFACTURING A SPUTTER TARGET | N.V. BEKAERT S.A. (BE) | 2005-11-09 | — | — | EP | disclosed |
| WO-2004074541-A1 | A METHOD OF MANUFACTURING A SPUTTER TARGET | N.V. BEKAERT S.A. (BE) | 2004-09-02 | — | — | WO | disclosed |