Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MAPT | P10636 | 6/20 | 0.48 |
| ▸ | HSD17B10 | Q99714 | 3/20 | 0.48 |
| ▸ | HTT | P42858 | 2/20 | 0.48 |
| ▸ | GFER | P55789 | 1/20 | 0.48 |
| ▸ | GPR55 | Q9Y2T6 | 1/20 | 0.48 |
| ▸ | KMT2A | Q03164 | 5/20 | 0.42 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.42 |
| ▸ | CA12 | O43570 | 2/20 | 0.41 |
| ▸ | CA1 | P00915 | 2/20 | 0.41 |
| ▸ | CA2 | P00918 | 2/20 | 0.41 |
| ▸ | CA3 | P07451 | 2/20 | 0.41 |
| ▸ | TYR | P14679 | 2/20 | 0.41 |
| ▸ | CA4 | P22748 | 2/20 | 0.41 |
| ▸ | CA5A | P35218 | 2/20 | 0.41 |
| ▸ | CA9 | Q16790 | 2/20 | 0.41 |
| ▸ | CA14 | Q9ULX7 | 2/20 | 0.41 |
| ▸ | CA5B | Q9Y2D0 | 2/20 | 0.41 |
| ▸ | DRD1 | P21728 | 1/20 | 0.41 |
| ▸ | CA6 | P23280 | 1/20 | 0.41 |
| ▸ | CA7 | P43166 | 1/20 | 0.41 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL12087611 | 0.77 | MAPT (0.50) | MAPTHSD17B10HTTGFERGPR55 | |
| SCHEMBL12453517 | 0.76 | F3 (0.59) | MAPTKMT2AALDH1A1CA12CA1 | |
| SCHEMBL14340575 | 0.76 | MAPT (0.46) | MAPTHSD17B10HTTGFERGPR55 | |
| SCHEMBL29323625 | 0.75 | ESR1 (0.43) | MAPTHSD17B10HTTGFERGPR55 | |
| SCHEMBL6368627 | 0.75 | CYP1B1 (0.62) | MAPTHSD17B10KMT2AALDH1A1CA12 | |
| SCHEMBL11295640 | 0.73 | ALDH5A1 (0.56) | MAPTHSD17B10HTTGFERGPR55 | |
| SCHEMBL3628327 | 0.71 | MAPT (0.52) | MAPTHSD17B10HTTGFERGPR55 | |
| SCHEMBL19596826 | 0.71 | CPT1B (0.47) | MAPTHSD17B10HTTGFERGPR55 | |
| SCHEMBL16067308 | 0.70 | TYR (0.61) | MAPTHSD17B10HTTGFERKMT2A | |
| SCHEMBL5612054 | 0.69 | MAPT (0.63) | MAPTHSD17B10HTTGFERGPR55 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11697770-B2 | Liquid crystal composition, method for producing high-molecular weight liquid crystal compound, light absorption anisotropic film, laminate, and image display device | FUJIFILM CORPORATION (JP) | 2023-07-11 | — | — | US | disclosed |
| US-20210324272-A1 | LIQUID CRYSTAL COMPOSITION, METHOD FOR PRODUCING HIGH-MOLECULAR WEIGHT LIQUID CRYSTAL COMPOUND, LIGHT ABSORPTION ANISOTROPIC FILM, LAMINATE, AND IMAGE DISPLAY DEVICE | FUJIFILM CORPORATION (JP) | 2021-10-21 | — | — | US | disclosed |
| US-10303055-B2 | Resist composition and method for forming resist pattern | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2019-05-28 | — | — | US | disclosed |
| US-10294183-B2 | Compound, resin, material for forming underlayer film for lithography, underlayer film for lithography, pattern forming method, and method for purifying the compound or resin | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2019-05-21 | — | — | US | disclosed |
| EP-3279730-A1 | RADIATION-SENSITIVE COMPOSITION, AMORPHOUS FILM, AND RESIST PATTERN-FORMATION METHOD | Mitsubishi Gas Chemical Company, Inc. (JP) | 2018-02-07 | — | — | EP | disclosed |
| US-20170075220-A1 | RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2017-03-16 | — | — | US | disclosed |
| US-20170073288-A1 | COMPOUND, RESIN, MATERIAL FOR FORMING UNDERLAYER FILM FOR LITHOGRAPHY, UNDERLAYER FILM FOR LITHOGRAPHY, PATTERN FORMING METHOD, AND METHOD FOR PURIFYING THE COMPOUND OR RESIN | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2017-03-16 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (4 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-10303055-B2 | Resist composition and method for forming resist pattern | HEATR1, ABCC1, HEATR6 | MAPT 2111/4885HSD17B10 741/4885HTT 1585/4885 |
| US-20170073288-A1 | COMPOUND, RESIN, MATERIAL FOR FORMING UNDERLAYER FILM FOR LITHOGRAPHY, UNDERLAYER FILM FOR LITHOGRAPHY, PATTERN FORMING METHOD, AND METHOD FOR PURIFYING THE COMPOUND OR RESIN | PRDM9, EBPL, CDH1 | MAPT 1516/4885HSD17B10 2333/4885HTT 4053/4885 |
| US-10294183-B2 | Compound, resin, material for forming underlayer film for lithography, underlayer film for lithography, pattern forming method, and method for purifying the compound or resin | PRDM9, EBPL, CDH1 | MAPT 1516/4885HSD17B10 2333/4885HTT 4053/4885 |
| US-20170075220-A1 | RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN | HEATR1, ABCC1, HEATR6 | MAPT 2111/4885HSD17B10 741/4885HTT 1585/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.