Predicted protein targets (top 14)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.41 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.34 |
| ▸ | NPC1 | O15118 | 1/20 | 0.34 |
| ▸ | POLB | P06746 | 1/20 | 0.34 |
| ▸ | MAPT | P10636 | 1/20 | 0.34 |
| ▸ | PKM | P14618 | 1/20 | 0.34 |
| ▸ | HTT | P42858 | 1/20 | 0.34 |
| ▸ | RECQL | P46063 | 1/20 | 0.34 |
| ▸ | RAB9A | P51151 | 1/20 | 0.34 |
| ▸ | ATM | Q13315 | 1/20 | 0.34 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.34 |
| ▸ | GPX4 | P36969 | 1/20 | 0.32 |
| ▸ | THRB | P10828 | 1/20 | 0.32 |
| ▸ | TSHR | P16473 | 2/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL16787498 | 0.88 | ALDH1A1 (0.46) | ALDH1A1KDM4ENPC1POLBMAPT | |
| SCHEMBL24486022 | 0.88 | ALDH1A1 (0.46) | ALDH1A1KDM4ENPC1POLBMAPT | |
| SCHEMBL4261488 | 0.88 | ALDH1A1 (0.46) | ALDH1A1KDM4ENPC1POLBMAPT | |
| SCHEMBL17829495 | 0.84 | ALDH1A1 (0.38) | ALDH1A1KDM4ENPC1POLBMAPT | |
| SCHEMBL10040871 | 0.83 | ALDH1A1 (0.42) | ALDH1A1KDM4ENPC1POLBMAPT | |
| SCHEMBL8544746 | 0.80 | CHRM2 (0.37) | TSHR | |
| SCHEMBL24658759 | 0.80 | — | — | |
| SCHEMBL8567305 | 0.80 | CHRM2 (0.37) | TSHR | |
| SCHEMBL18646229 | 0.77 | ALDH1A1 (0.38) | ALDH1A1THRBTSHR | |
| SCHEMBL4855700 | 0.76 | ALDH1A1 (0.46) | ALDH1A1THRBTSHR |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 35 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7939243-B2 | Resin, resist composition and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2011-05-10 | — | — | US | claimed |
| US-20100159389-A1 | RESIN, RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2010-06-24 | — | — | US | claimed |
| US-20090076201-A1 | (METH) ACRYLOYLOXYTETRAHYDROFURANS AND PROCESS FOR PRODUCTION THEREOF | MITSUBISHI CHEMICAL CORPORATION (JP) | 2009-03-19 | — | — | US | claimed |
| US-20230036031-A1 | PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING RESIST PATTERN FILM, METHOD FOR PRODUCING PLATED FORMED PRODUCT, AND METHOD FOR PRODUCING TIN-SILVER PLATED-FORMED PRODUCT | JSR CORPORATION (JP) | 2023-02-02 | — | — | US | disclosed |
| US-20220057714-A1 | PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING RESIST PATTERN FILM, AND METHOD FOR PRODUCING PLATED FORMED PRODUCT | JSR CORPORATION (JP) | 2022-02-24 | — | — | US | disclosed |
| US-20220035246-A1 | METHOD FOR PRODUCING PLATED FORMED PRODUCT | JSR CORPORATION (JP) | 2022-02-03 | — | — | US | disclosed |
| US-20220026802-A1 | PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING RESIST PATTERN FILM, AND METHOD FOR PRODUCING PLATED FORMED PRODUCT | JSR CORPORATION (JP) | 2022-01-27 | — | — | US | disclosed |
| US-20210325783-A1 | PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN, METHOD FOR MANUFACTURING PLATED MOLDED ARTICLE, AND SEMICONDUCTOR APPARATUS | JSR CORPORATION (JP) | 2021-10-21 | — | — | US | disclosed |
| US-20210311391-A1 | PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN, METHOD FOR MANUFACTURING PLATED FORMED BODY, AND SEMICONDUCTOR DEVICE | JSR CORPORATION (JP) | 2021-10-07 | — | — | US | disclosed |
| US-10457761-B2 | Polymer, resist composition, and pattern forming process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2019-10-29 | — | — | US | disclosed |
| US-10191373-B2 | Method for producing polymer | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2019-01-29 | — | — | US | disclosed |
| US-20100159389-A1 | RESIN, RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2010-06-24 | — | — | US | disclosed |
| US-20100159389-A1 | RESIN, RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2010-06-24 | — | — | US | disclosed |
| US-20100047724-A1 | POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2010-02-25 | — | — | US | disclosed |
| US-20100047724-A1 | POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2010-02-25 | — | — | US | disclosed |
| US-20100047724-A1 | POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2010-02-25 | — | — | US | disclosed |
| US-20090076201-A1 | (METH) ACRYLOYLOXYTETRAHYDROFURANS AND PROCESS FOR PRODUCTION THEREOF | MITSUBISHI CHEMICAL CORPORATION (JP) | 2009-03-19 | — | — | US | disclosed |
| US-20090076201-A1 | (METH) ACRYLOYLOXYTETRAHYDROFURANS AND PROCESS FOR PRODUCTION THEREOF | MITSUBISHI CHEMICAL CORPORATION (JP) | 2009-03-19 | — | — | US | disclosed |
| US-20090076201-A1 | (METH) ACRYLOYLOXYTETRAHYDROFURANS AND PROCESS FOR PRODUCTION THEREOF | MITSUBISHI CHEMICAL CORPORATION (JP) | 2009-03-19 | — | — | US | disclosed |
| JP-2006321767-A | 3-(METH)ACRYLOYLOXY-4-HYDROXYTETRAHYDROFURAN AND METHOD FOR PRODUCING THE SAME | MITSUBISHI CHEMICALS CORP | 2006-11-30 | — | — | JP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20090076201-A1 | (METH) ACRYLOYLOXYTETRAHYDROFURANS AND PROCESS FOR PRODUCTION THEREOF | MTHFD2, MTR, MTHFD1 | ALDH1A1 41/4885KDM4E 2895/4885NPC1 4449/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.