SCHEMBL18844367

SCHEMBL18844367

COc1cc(OC)c(C2(c3c(OC)cc(OCCOc4ccc(C5(c6ccc(OC)c(OC)c6)OCCCO5)cc4OC)cc3OC)OCCCO2)c(OC)c1

nearest known ligand 0.37

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ADRA1B P35368 4/20 0.37
HTR1A P08908 3/20 0.37
CASP1 P29466 2/20 0.35
TSHR P16473 1/20 0.35
KMT2A Q03164 3/20 0.35
MEN1 O00255 1/20 0.35
CA12 O43570 1/20 0.35
CA1 P00915 1/20 0.35
CA2 P00918 1/20 0.35
CA7 P43166 1/20 0.35
CA9 Q16790 1/20 0.35
CA14 Q9ULX7 1/20 0.35
PDE4B Q07343 1/20 0.34
PDE4D Q08499 1/20 0.34
FDPS P14324 2/20 0.34
LMNA P02545 2/20 0.34
ALDH1A1 P00352 2/20 0.34
MAPT P10636 2/20 0.34
HPGD P15428 2/20 0.34
GAA P10253 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL18287909 0.80 MAOA (0.47) CASP1TSHRKMT2AMEN1CA12
SCHEMBL18287987 0.78 CA2 (0.36) KMT2AMEN1CA12CA1CA2
SCHEMBL18553101 0.74 MAPK1 (0.35) ADRA1BHTR1ATSHRKMT2AMEN1
SCHEMBL18287910 0.74 MAOA (0.50) CASP1TSHRKMT2AMEN1CA12
SCHEMBL18287935 0.72 CA2 (0.39) KMT2AMEN1CA12CA1CA2
SCHEMBL18552994 0.70 ADRA1B (0.45) ADRA1BHTR1ALMNAHTTADRA1D
SCHEMBL11820573 0.67 ALDH1A1 (0.37) CASP1TSHRKMT2AMEN1PDE4B
SCHEMBL16543025 0.66 CA1 (0.44) CA12CA1CA2CA7CA9
Benzene SCHEMBL11821265 0.65 KDM4E (0.37) CASP1TSHRKMT2APDE4BPDE4D
SCHEMBL18535734 0.64 MAOA (0.36) CASP1TSHRKMT2AMEN1PDE4B

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-10018911-B2 Chemically amplified resist material and resist pattern-forming method JSR CORPORATION (JP) 2018-07-10 US disclosed
US-20170131633-A1 CHEMICALLY AMPLIFIED RESIST MATERIAL AND RESIST PATTERN-FORMING METHOD JSR CORPORATION (JP) 2017-05-11 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-10018911-B2 Chemically amplified resist material and resist pattern-forming method SLC11A2, XRCC5, RAD54L ADRA1B 4392/4885HTR1A 4551/4885CASP1 2866/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.