Predicted protein targets (top 12)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MEN1 | O00255 | 2/20 | 0.38 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.38 |
| ▸ | TDP1 | Q9NUW8 | 3/20 | 0.38 |
| ▸ | HRH3 | Q9Y5N1 | 1/20 | 0.37 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.37 |
| ▸ | GAA | P10253 | 1/20 | 0.37 |
| ▸ | HTT | P42858 | 1/20 | 0.37 |
| ▸ | POLB | P06746 | 1/20 | 0.36 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.36 |
| ▸ | RARB | P10826 | 1/20 | 0.36 |
| ▸ | EPHX2 | P34913 | 1/20 | 0.36 |
| ▸ | HPGD | P15428 | 1/20 | 0.35 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL18905524 | 0.83 | LMNA (0.46) | MEN1KMT2ATDP1HRH3MAPK1 | |
| SCHEMBL18905369 | 0.83 | MEN1 (0.41) | MEN1KMT2ATDP1MAPK1POLB | |
| SCHEMBL18905429 | 0.81 | SLC2A1 (0.44) | MEN1KMT2ATDP1MAPK1 | |
| SCHEMBL28510777 | 0.80 | NQO1 (0.52) | MEN1KMT2ATDP1MAPK1L3MBTL1 | |
| SCHEMBL2180164 | 0.78 | L3MBTL1 (0.57) | MEN1KMT2ATDP1MAPK1GAA | |
| SCHEMBL18905363 | 0.77 | ADRB2 (0.39) | RARB | |
| SCHEMBL11251522 | 0.75 | AOC3 (0.58) | MEN1KMT2ATDP1MAPK1GAA | |
| SCHEMBL11530059 | 0.71 | AOC3 (0.53) | MEN1KMT2AGAA | |
| SCHEMBL25545401 | 0.71 | MEN1 (0.40) | MEN1KMT2AMAPK1GAAHTT | |
| SCHEMBL25549614 | 0.71 | AOC3 (0.40) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20170154766-A1 | SILICON-CONTAINING CONDENSATE, COMPOSITION FOR FORMING A SILICON-CONTAINING RESIST UNDER LAYER FILM, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-06-01 | — | — | US | disclosed |