Predicted protein targets (top 18)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 8/20 | 0.39 |
| ▸ | NPSR1 | Q6W5P4 | 3/20 | 0.39 |
| ▸ | MAPT | P10636 | 3/20 | 0.39 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.39 |
| ▸ | MEN1 | O00255 | 2/20 | 0.39 |
| ▸ | PRKCA | P17252 | 1/20 | 0.36 |
| ▸ | CYP17A1 | P05093 | 2/20 | 0.34 |
| ▸ | CYP19A1 | P11511 | 2/20 | 0.34 |
| ▸ | EPHX1 | P07099 | 1/20 | 0.33 |
| ▸ | RECQL | P46063 | 1/20 | 0.33 |
| ▸ | PKM | P14618 | 1/20 | 0.33 |
| ▸ | ATM | Q13315 | 1/20 | 0.32 |
| ▸ | LMNA | P02545 | 1/20 | 0.32 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.32 |
| ▸ | POLB | P06746 | 1/20 | 0.32 |
| ▸ | GAA | P10253 | 1/20 | 0.32 |
| ▸ | TSHR | P16473 | 1/20 | 0.32 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL19719269 | 0.83 | — | — | |
| SCHEMBL9924188 | 0.81 | ALDH1A1 (0.40) | ALDH1A1NPSR1MAPTKMT2AMEN1 | |
| SCHEMBL9925524 | 0.80 | ALDH1A1 (0.39) | ALDH1A1NPSR1MAPTKMT2AMEN1 | |
| SCHEMBL15747090 | 0.77 | ALDH1A1 (0.39) | ALDH1A1NPSR1MAPTKMT2AMEN1 | |
| SCHEMBL18924230 | 0.77 | ALDH1A1 (0.44) | ALDH1A1NPSR1MAPTKMT2AMEN1 | |
| SCHEMBL25658053 | 0.76 | ALDH1A1 (0.35) | ALDH1A1NPSR1MAPTKMT2AMEN1 | |
| SCHEMBL14791001 | 0.76 | PKM (0.46) | ALDH1A1NPSR1MAPTKMT2AMEN1 | |
| SCHEMBL22985782 | 0.75 | ALDH1A1 (0.32) | ALDH1A1MAPTKMT2AMEN1ATM | |
| SCHEMBL19961030 | 0.74 | ALDH1A1 (0.43) | ALDH1A1NPSR1MAPTKMT2AMEN1 | |
| SCHEMBL22333537 | 0.74 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 35 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11829068-B2 | Resist composition, method of forming resist pattern, compound, and resin | TOKYO OHKA KOGYO CO., LTD. (JP) | 2023-11-28 | — | — | US | disclosed |
| US-20230314945-A1 | NEGATIVE-TONE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2023-10-05 | — | — | US | disclosed |
| US-11709425-B2 | Resist composition and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2023-07-25 | — | — | US | disclosed |
| US-11693316-B2 | Resist composition and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2023-07-04 | — | — | US | disclosed |
| US-11693313-B2 | Resist composition and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2023-07-04 | — | — | US | disclosed |
| US-11656549-B2 | Resist composition and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2023-05-23 | — | — | US | disclosed |
| US-11333973-B2 | Resist composition and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2022-05-17 | — | — | US | disclosed |
| US-20220121117-A1 | RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, COMPOUND, AND RESIN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2022-04-21 | — | — | US | disclosed |
| US-20220107565-A1 | RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2022-04-07 | — | — | US | disclosed |
| US-20220011666-A1 | RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, COMPOUND, AND RESIN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2022-01-13 | — | — | US | disclosed |
| US-20190285984-A1 | RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2019-09-19 | — | — | US | disclosed |
| US-10414918-B2 | Method of preparing polymer compound | TOKYO OHKA KOGYO CO., LTD. (JP) | 2019-09-17 | — | — | US | disclosed |
| US-10394122-B2 | Resist composition, method for forming resist pattern, compound, and acid generator | TOYKO OHKA KOGYO CO., LTD. (JP) | 2019-08-27 | — | — | US | disclosed |
| US-20190196329-A1 | RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2019-06-27 | — | — | US | disclosed |
| US-10261416-B2 | Resist composition and method for forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2019-04-16 | — | — | US | disclosed |
| US-20180067394-A1 | RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2018-03-08 | — | — | US | disclosed |
| US-20180022916-A1 | METHOD OF PREPARING POLYMER COMPOUND | TOKYO OHKA KOGYO CO., LTD. (JP) | 2018-01-25 | — | — | US | disclosed |
| US-9690194-B2 | Method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2017-06-27 | — | — | US | disclosed |
| US-9682951-B2 | Resist composition, method of forming resist pattern, acid generator, photoreactive quencher, and compound | TOKYO OHKA KOGYO CO., LTD. (JP) | 2017-06-20 | — | — | US | disclosed |
| US-9671690-B2 | Resist composition, method for forming resist pattern, photo-reactive quencher and compound | TOKYO OHKA KOGYO CO., LTD. (JP) | 2017-06-06 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-11709425-B2 | Resist composition and method of forming resist pattern | RER1, RRS1, RXFP4 | ALDH1A1 3475/4885NPSR1 1311/4885MAPT 4059/4885 |
| US-11693313-B2 | Resist composition and method of forming resist pattern | C1R, C1S, C9 | ALDH1A1 1921/4885NPSR1 1322/4885MAPT 3206/4885 |
| US-10394122-B2 | Resist composition, method for forming resist pattern, compound, and acid generator | RB1, FXR1, CCNA1 | ALDH1A1 1415/4885NPSR1 3096/4885MAPT 3580/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.