SCHEMBL1901510

SCHEMBL1901510

C=Cc1ccc(C(=O)OC2(C)CCCC(=O)O2)cc1

nearest known ligand 0.35

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
TAS1R3 Q7RTX0 3/20 0.35
TAS1R1 Q7RTX1 3/20 0.35
PIM1 P11309 1/20 0.33
PRKCA P17252 1/20 0.31
PRKCE Q02156 1/20 0.31
RASGRP3 Q8IV61 1/20 0.31
ALDH1A1 P00352 2/20 0.31
RARA P10276 3/20 0.31
RARB P10826 3/20 0.31
RARG P13631 3/20 0.31
POLB P06746 2/20 0.31
NPC1 O15118 1/20 0.30
RAB9A P51151 1/20 0.30
SMN1; SMN2 Q16637 1/20 0.30
MAPT P10636 1/20 0.30
MAPK1 P28482 1/20 0.30
KMT2A Q03164 1/20 0.30
KDM4E B2RXH2 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1898289 0.92 PIM1 (0.34) TAS1R3TAS1R1PIM1PRKCAPRKCE
SCHEMBL1900731 0.82 TAS1R3 (0.34) TAS1R3TAS1R1PIM1PRKCAPRKCE
SCHEMBL1898983 0.77 TAS1R3 (0.35) TAS1R3TAS1R1PIM1PRKCAPRKCE
SCHEMBL14527796 0.76 CYP19A1 (0.38) TAS1R3TAS1R1PIM1ALDH1A1RARA
SCHEMBL1898752 0.76 SIRT2 (0.33) PRKCA
SCHEMBL1901746 0.75 RARB (0.34) TAS1R3TAS1R1PIM1ALDH1A1RARA
SCHEMBL1897164 0.75 TAS1R3 (0.35) TAS1R3TAS1R1PIM1ALDH1A1RARA
SCHEMBL1901246 0.74 RARB (0.38) TAS1R3TAS1R1PIM1ALDH1A1RARA
SCHEMBL17247256 0.74 CYP19A1 (0.40) TAS1R3TAS1R1PIM1ALDH1A1RARA
SCHEMBL1900520 0.72 LMNA (0.38) TAS1R3TAS1R1PIM1PRKCAPRKCE

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20080160449-A1 Photoresist polymer having nano-smoothness and etching resistance, and resist composition LION CORPORATION (JP) 2008-07-03 US claimed
US-20110198730-A1 HYPERBRANCHED POLYMER SYNTHESIZING METHOD, HYPERBRANCHED POLYMER, RESIST COMPOSITION, SEMICONDUCTOR INTEGRATED CIRCUIT, AND SEMICONDUCTOR INTEGRATED CIRCUIT FABRICATION METHOD LION CORPORATION 2011-08-18 US disclosed
US-20110101503-A1 HYPERBRANCHED POLYMER SYNTHESIZING METHOD, HYPERBRANCHED POLYMER, RESIST COMPOSITION, SEMICONDUCTOR INTEGRATED CIRCUIT, AND SEMICONDUCTOR INTEGRATED CIRCUIT FABRICATION METHOD LION CORPORATION (JP) 2011-05-05 US disclosed
US-20080160449-A1 Photoresist polymer having nano-smoothness and etching resistance, and resist composition LION CORPORATION (JP) 2008-07-03 US disclosed