SCHEMBL1901246

SCHEMBL1901246

C=Cc1ccc(C(=O)OC2(C)CCOC2=O)cc1

nearest known ligand 0.38

Predicted protein targets (top 11)

geneUniProtsupporting neighboursconfidence
RARB P10826 3/20 0.38
RARG P13631 3/20 0.38
RARA P10276 2/20 0.38
TAS1R3 Q7RTX0 2/20 0.36
TAS1R1 Q7RTX1 2/20 0.36
PIM1 P11309 1/20 0.34
POLB P06746 3/20 0.34
ALDH1A1 P00352 2/20 0.33
NPC1 O15118 1/20 0.32
RAB9A P51151 1/20 0.32
SMN1; SMN2 Q16637 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1897164 0.92 TAS1R3 (0.35) RARBRARGRARATAS1R3TAS1R1
SCHEMBL1898804 0.82 TAS1R3 (0.38) RARBRARGRARATAS1R3TAS1R1
SCHEMBL1900520 0.80 LMNA (0.38) RARBRARGRARATAS1R3TAS1R1
SCHEMBL1900931 0.78 TAS1R3 (0.36) RARBRARGRARATAS1R3TAS1R1
SCHEMBL24948267 0.77 ALDH1A1 (0.38) RARBRARGRARATAS1R3TAS1R1
SCHEMBL24948263 0.75 TAS1R3 (0.35) RARBRARGRARATAS1R3TAS1R1
SCHEMBL14527796 0.75 CYP19A1 (0.38) RARBRARGRARATAS1R3TAS1R1
SCHEMBL1901746 0.74 RARB (0.34) RARBRARGRARATAS1R3TAS1R1
SCHEMBL1901510 0.74 TAS1R3 (0.35) RARBRARGRARATAS1R3TAS1R1
SCHEMBL1901036 0.74 TAS1R3 (0.34) RARBRARGRARATAS1R3TAS1R1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20080160449-A1 Photoresist polymer having nano-smoothness and etching resistance, and resist composition LION CORPORATION (JP) 2008-07-03 US claimed
US-20110198730-A1 HYPERBRANCHED POLYMER SYNTHESIZING METHOD, HYPERBRANCHED POLYMER, RESIST COMPOSITION, SEMICONDUCTOR INTEGRATED CIRCUIT, AND SEMICONDUCTOR INTEGRATED CIRCUIT FABRICATION METHOD LION CORPORATION 2011-08-18 US disclosed
US-20110101503-A1 HYPERBRANCHED POLYMER SYNTHESIZING METHOD, HYPERBRANCHED POLYMER, RESIST COMPOSITION, SEMICONDUCTOR INTEGRATED CIRCUIT, AND SEMICONDUCTOR INTEGRATED CIRCUIT FABRICATION METHOD LION CORPORATION (JP) 2011-05-05 US disclosed
US-20080160449-A1 Photoresist polymer having nano-smoothness and etching resistance, and resist composition LION CORPORATION (JP) 2008-07-03 US disclosed