Known targets — ChEMBL curated mechanism
ABCC9ABL1ACEACHEACVR1ADORA1ADORA2AADORA2BADORA3ADRA1AADRA1BADRA1DADRA2AADRA2BADRA2CADRB1ADRB2ADRB3AGTR1ALOX5ATP4AATP4BBCRBTKCACNA1ACACNA1BCACNA1CCACNA1DCACNA1ECACNA1FCACNA1GCACNA1HCACNA1ICACNA1SCACNA2D1CACNA2D2CACNA2D3CACNA2D4CACNB1CACNB2CACNB3CACNB4CACNG1CACNG2CACNG3CACNG4CACNG5CACNG6CACNG7CACNG8CALCRLCFBCHRM1CHRM2CHRM3CHRM4CHRM5CHRNA1CHRNB1CHRNDCHRNECHRNGCRBNCUL4ACXCR1CXCR2DDB1DDCDHFRDPP4DRD2DRD3DRD4EGFRERBB2ERBB4ESR1ESR2FDPSFKBP1AFLT1FLT3FLT4GARTGHSRGRIA1GRIA2GRIA3GRIA4GRIK1GRIK2GRIK3GRIK4GRIK5GRIN2AGSK3AGSK3BHDAC1HDAC10HDAC11HDAC2HDAC3HDAC4HDAC5HDAC6HDAC7HDAC8HDAC9HRH1HTR1AHTR1BHTR1DHTR1EHTR1FHTR2AHTR2BHTR2CHTR3AHTR3BHTR3CHTR3DHTR3EHTR4HTR5AHTR6HTR7IDH1IDH2IMPA1ITGA2BITGB3JAK1JAK2JAK3KCNJ11KCNK3KCNK9KDRKITMEN1METMMP1MMP13MMP7MMP8NANOD2NS5bODC1OPG057OPRD1OPRK1OPRM1PPARP1PARP2PDE3APDE3BPDE4APDE4BPDE4CPDE4DPDGFRBPIK3CAPIK3CBPIK3CDPIK3CGPIK3R1PIK3R2PIK3R3PIK3R5PKLRPPARDPPATPTGS1PTGS2RBX1ROCK1ROCK2RRM1RRM2RRM2BSCN10ASCN11ASCN1ASCN2ASCN3ASCN4ASCN5ASCN7ASCN8ASCN9ASCNN1ASCNN1BSCNN1GSIGMAR1SLC10A2SLC5A2SLC6A2SLC6A3SLC6A4SLC9A3SYKTACR1THRATHRBTOP1TUBA1ATUBA1BTUBA1CTUBA3CTUBA3ETUBA4ATUBBTUBB1TUBB2ATUBB2BTUBB3TUBB4ATUBB4BTUBB6TUBB8TYK2TYMSVDRampCblablaT-3blaT-4blaT-5blaT-6blaUOE-1dacAdacBdacCfolAfolPftsIgyrAgyrBileSmecAmrcAmrcBmrdAparCparEpbp2pbp4pbpApbpFrplArplBrplCrplDrplErplFrplIrplJrplKrplLrplMrplNrplOrplPrplQrplRrplSrplTrplUrplVrplWrplXrplYrpmArpmBrpmCrpmDrpmErpmE2rpmFrpmGrpmG1rpmG2rpmG3rpmHrpmIrpmJrpsArpsBrpsCrpsDrpsErpsFrpsGrpsHrpsIrpsJrpsKrpsLrpsMrpsNrpsOrpsPrpsQrpsRrpsSrpsTrpsUthyAykgMykgO
The experimentally established mechanism targets of Tetramethylammonium Ion. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 3)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CHRNB2 | P17787 | 1/20 | 0.67 |
| ▸ | CHRNA7 | P36544 | 1/20 | 0.67 |
| ▸ | CHRNA4 | P43681 | 1/20 | 0.67 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Tetramethylammonium Ion SCHEMBL988502 | 1.00 | — | — | |
| Tetramethylammonium Ion SCHEMBL27571963 | 1.00 | CHRNB2 (0.67) | CHRNB2CHRNA7CHRNA4 | |
| Tetramethylammonium Ion SCHEMBL28549790 | 1.00 | CHRNB2 (0.67) | CHRNB2CHRNA7CHRNA4 | |
| Tetramethylammonium Ion SCHEMBL2367571 | 1.00 | — | — | |
| Tetramethylammonium Ion SCHEMBL8185035 | 1.00 | CHRNB2 (0.67) | CHRNB2CHRNA7CHRNA4 | |
| Tetramethylammonium Ion SCHEMBL3199241 | 1.00 | CHRNB2 (0.67) | CHRNB2CHRNA7CHRNA4 | |
| Tetramethylammonium Ion SCHEMBL7166906 | 1.00 | CHRNB2 (0.67) | CHRNB2CHRNA7CHRNA4 | |
| Tetramethylammonium Ion SCHEMBL28824270 | 1.00 | CHRNB2 (0.67) | CHRNB2CHRNA7CHRNA4 | |
| Tetramethylammonium Ion SCHEMBL4388942 | 1.00 | CHRNB2 (0.67) | CHRNB2CHRNA7CHRNA4 | |
| Tetramethylammonium Ion SCHEMBL9114017 | 1.00 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Appears in 2118 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-120759101-B | Strong-sun-proof high-air-permeability moisture-absorption quick-drying pleated fabric and preparation method thereof | 无锡市世纪风服饰有限公司 | 2026-05-15 | — | — | CN | claimed |
| EP-4198016-B1 | NIMESULIDE SALTS AND METHOD OF OBTAINING NIMESULIDE SALT CRYSTALS | UNIV GDANSKI (PL) | 2025-06-04 | — | — | EP | claimed |
| CN-116554694-B | Preparation method of heat-conducting organic silicon rubber containing POSS structure | 常州大学 | 2025-05-30 | — | — | CN | claimed |
| CN-119978378-A | Hydroxyl-terminated siloxane oligomer, copolymerized PC and preparation method thereof | 浙大宁波理工学院 | 2025-05-13 | — | — | CN | claimed |
| CN-119931629-A | Ratio fluorescent carbon dot microneedle patch for detecting pesticide residues on fruits and vegetables | 四川农业大学 | 2025-05-06 | — | — | CN | claimed |
| CN-119708428-A | Recyclable self-repairing polyurethane organic silicon resin with excellent photocuring and photoresponsive properties and preparation method thereof | 南昌航空大学 | 2025-03-28 | — | — | CN | claimed |
| CN-119463498-A | Organic modified phenyl silicone resin and preparation method thereof | 江西华昊化工有限公司 | 2025-02-18 | — | — | CN | claimed |
| CN-119431794-A | Organosilicon tackifier and preparation method and application thereof | 杭州之江有机硅化工有限公司 | 2025-02-14 | — | — | CN | claimed |
| CN-119351049-A | Modified organic silicon resin, preparation method thereof, organic silicon optical adhesive and application thereof | 皇冠新材料科技股份有限公司 | 2025-01-24 | — | — | CN | claimed |
| CN-119236971-A | Preparation method and application of sulfur-cadmium-zinc quantum dot/mesoporous silica composite photocatalyst | 江苏大学 | 2025-01-03 | — | — | CN | claimed |
| US-6540970-B1 | Providing a source of alumina and of phosphorus, water, and a template suitable for forming a metal aluminophosphate (MAPO) molecular sieve, adding metal nanoparticles and solubilizing in a water soluble organic solvent, forming said MAPO | EXXON MOBIL CHEMICAL PATENTS, INC. | 2003-04-01 | — | — | US | claimed |
| US-20010003030-A1 | Over-coating composition for photoresist, and processes for forming photoresist patterns using the same | HYUNDAI ELECTRONICS INDUSTRIES CO. LTD. (KR) | 2001-06-07 | — | — | US | claimed |
| CN-1276541-A | Topcoating composition and method for forming fine pattern using said composition | HYUNDAI ELECTRONICS IND (KR) | 2000-12-13 | — | — | CN | claimed |
| EP-0595608-B1 | Redistribution of organic polycarbonate compositions | GEN ELECTRIC (US) | 1997-07-16 | — | — | EP | claimed |
| US-5414057-A | Redistribution of organic polycarbonate compositions | GENERAL ELECTRIC COMPANY (US) | 1995-05-09 | — | — | US | claimed |
| US-5407788-A | Photoresist stripping method | AT&T CORP. (US) | 1995-04-18 | — | — | US | claimed |
| EP-0595608-A1 | Redistribution of organic polycarbonate compositions | GENERAL ELECTRIC COMPANY (US) | 1994-05-04 | — | — | EP | claimed |
| US-5008345-A | Two-Part Curing System Containing A Metallic Acid Salt And An Ammonium Or Phosphonium Quaternary Salt | ZEON CHEMICAL USA, INC. (US) | 1991-04-16 | — | — | US | claimed |
| EP-0309794-A2 | No-post-cure method of curing polyacrylate polymers | Zeon Chemicals USA, Inc. (US) | 1989-04-05 | — | — | EP | claimed |
| US-4029567-A | HYDROPHILIC AGGLOMERANT | CANADIAN PATENTS AND DEVELOPMENT LIMITED (CA) | 1977-06-14 | — | — | US | claimed |