SCHEMBL19253947

SCHEMBL19253947

C=C(C)C(=O)Oc1cccc(F)c1O

nearest known ligand 0.43

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KMT2A Q03164 5/20 0.43
ERN1 O75460 2/20 0.42
ALB P02768 1/20 0.42
ELANE P08246 1/20 0.41
SLC2A1 P11166 1/20 0.38
SLC2A4 P14672 1/20 0.38
MEN1 O00255 2/20 0.38
HSD17B10 Q99714 2/20 0.38
MAPT P10636 2/20 0.36
ATM Q13315 1/20 0.36
CES2 O00748 1/20 0.35
CES1 P23141 1/20 0.35
TLR2 O60603 1/20 0.35
TLR1 Q15399 1/20 0.35
TLR6 Q9Y2C9 1/20 0.35
SERPINE1 P05121 1/20 0.35
SMN1; SMN2 Q16637 2/20 0.35
ALDH1A1 P00352 1/20 0.35
LMNA P02545 1/20 0.35
HPGD P15428 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15836535 0.84 KMT2A (0.44) KMT2AELANESLC2A1SLC2A4ATM
SCHEMBL31097941 0.84 ALOX15 (0.50) KMT2AERN1ELANEMEN1HSD17B10
SCHEMBL6200625 0.84 MAPK1 (0.47) KMT2AERN1ALBSLC2A1SLC2A4
SCHEMBL1520783 0.84 ALOX15 (0.50) KMT2AERN1ELANEMEN1HSD17B10
SCHEMBL6903312 0.84 ELANE (0.49) KMT2AELANEHSD17B10MAPTATM
SCHEMBL15496053 0.82 ELANE (0.47) KMT2AELANEHSD17B10MAPTALDH1A1
SCHEMBL15495997 0.81 ALDH1A1 (0.45) KMT2AERN1ELANEMEN1HSD17B10
SCHEMBL15495901 0.81 LMNA (0.52) KMT2AERN1ELANEMEN1HSD17B10
SCHEMBL15496050 0.79 KMT2A (0.43) KMT2AERN1ELANEHSD17B10MAPT
SCHEMBL15496005 0.78 GABRA1 (0.52) KMT2AERN1ELANEMAPTATM

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20260029716-A1 POLYMER COMPOUND FOR FORMING RESIST UNDERLAYER FILM, AND COMPOSITION FOR FORMING RESIST UNDERLAYER FILM COMPRISING SAME DONGJIN SEMICHEM CO LTD (KR) 2026-01-29 US disclosed
US-10012902-B2 Positive resist composition and pattern forming process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2018-07-03 US disclosed
US-20170242339-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2017-08-24 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20260029716-A1 POLYMER COMPOUND FOR FORMING RESIST UNDERLAYER FILM, AND COMPOSITION FOR FORMING RESIST UNDERLAYER FILM COMPRISING SAME RIF1, MACF1, ARF1 KMT2A 761/4885ERN1 445/4885ALB 2066/4885
US-10012902-B2 Positive resist composition and pattern forming process EWSR1, SRPRA, SRPRB KMT2A 1054/4885ERN1 648/4885ALB 2113/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.