Predicted protein targets (top 1)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALOX5AP | P20292 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL13088077 | 0.82 | ALOX5AP (0.33) | ALOX5AP | |
| SCHEMBL23057303 | 0.82 | — | — | |
| SCHEMBL24133969 | 0.82 | — | — | |
| SCHEMBL13641774 | 0.79 | — | — | |
| SCHEMBL4903162 | 0.78 | ALOX5AP (0.31) | ALOX5AP | |
| SCHEMBL4903157 | 0.78 | — | — | |
| SCHEMBL31695340 | 0.78 | — | — | |
| SCHEMBL31695342 | 0.78 | — | — | |
| SCHEMBL19929339 | 0.78 | ALDH1A1 (0.35) | — | |
| SCHEMBL439022 | 0.77 | HSD11B1 (0.32) | ALOX5AP |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 81 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1812542-B1 | FRAGRANCE COMBINATION COMPRISING 3,7-DIMETHYLOCT-6-ENE NITRILE (CITRONELLYL NITRILE) AS GERANONITRILE SUBSTITUTE | HENKEL AG & CO KGAA (DE) | 2011-06-08 | — | — | EP | claimed |
| US-20240210824-A1 | CARBOXYLATE, CARBOXYLIC ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2024-06-27 | — | — | US | disclosed |
| US-11815813-B2 | Compound, resin, resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2023-11-14 | — | — | US | disclosed |
| US-20230305392-A1 | SALT, ACID GENERATOR, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2023-09-28 | — | — | US | disclosed |
| US-20230305391-A1 | SALT, ACID GENERATOR, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2023-09-28 | — | — | US | disclosed |
| US-20230305391-A1 | SALT, ACID GENERATOR, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2023-09-28 | — | — | US | disclosed |
| US-20230305395-A1 | SALT, ACID GENERATOR, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2023-09-28 | — | — | US | disclosed |
| US-11762287-B2 | Onium salt compound, chemically amplified resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-09-19 | — | — | US | disclosed |
| US-11739056-B2 | Carboxylate, carboxylic acid generator, resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2023-08-29 | — | — | US | disclosed |
| US-11681224-B2 | Resin, resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2023-06-20 | — | — | US | disclosed |
| US-7498393-B2 | Fluorinated compound, fluoropolymer, resist composition, and composition for resist protective film | ASAHI GLASS COMPANY, LIMITED (JP) | 2009-03-03 | — | — | US | disclosed |
| US-20070265183-A1 | fragrance mixture for laundering, care and/or cleaning component; producing a citrus odor; 3,7-dimethyloct-6-enenitrile mixtures; stability; nontoxic | HENKEL AG & CO. KGAA (DE) | 2007-11-15 | — | — | US | disclosed |
| US-20070207409-A1 | FLUORINATED COMPOUND, AND FLUOROPOLYMER, PROCESS FOR ITS PRODUCTION AND RESIST COMPOSITION CONTAINING IT | ASAHI GLASS COMPANY, LIMITED (JP) | 2007-09-06 | — | — | US | disclosed |
| US-20070207409-A1 | FLUORINATED COMPOUND, AND FLUOROPOLYMER, PROCESS FOR ITS PRODUCTION AND RESIST COMPOSITION CONTAINING IT | ASAHI GLASS COMPANY, LIMITED (JP) | 2007-09-06 | — | — | US | disclosed |
| US-20070154844-A1 | FLUORINATED COMPOUND, FLUOROPOLYMER, RESIST COMPOSITION, AND COMPOSITION FOR RESIST PROTECTIVE FILM | ASAHI GLASS COMPANY, LIMITED (JP) | 2007-07-05 | — | — | US | disclosed |
| US-20070154844-A1 | FLUORINATED COMPOUND, FLUOROPOLYMER, RESIST COMPOSITION, AND COMPOSITION FOR RESIST PROTECTIVE FILM | ASAHI GLASS COMPANY, LIMITED (JP) | 2007-07-05 | — | — | US | disclosed |
| US-20070099114-A1 | Polymer, resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-05-03 | — | — | US | disclosed |
| US-20070099114-A1 | Polymer, resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-05-03 | — | — | US | disclosed |
| EP-1772468-A1 | FLUORINE-CONTAINING COMPOUND, FLUORINE-CONTAINING POLYMER, RESIST COMPOSITION AND RESIST PROTECTIVE FILM COMPOSITION | Asahi Glass Company, Limited (JP) | 2007-04-11 | — | — | EP | disclosed |
| US-4772411-A | ETHYL TRICYCLOHEPTYL ALKYL ETHERS, BLEACHES | INTERNATIONAL FLAVORS & FRAGRANCES INC. (US) | 1988-09-20 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (6 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20240210824-A1 | CARBOXYLATE, CARBOXYLIC ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SCO2, CBR1, OXGR1 | ALOX5AP 2042/4885 |
| US-11762287-B2 | Onium salt compound, chemically amplified resist composition and patterning process | IDUA, SLC6A5, SLC6A9 | ALOX5AP 954/4885 |
| US-20230305391-A1 | SALT, ACID GENERATOR, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | RER1, H1-0, BET1 | ALOX5AP 3531/4885 |
| US-11739056-B2 | Carboxylate, carboxylic acid generator, resist composition and method for producing resist pattern | CHRM1, CHRM2, SCO2 | ALOX5AP 3153/4885 |
| US-20070154844-A1 | FLUORINATED COMPOUND, FLUOROPOLYMER, RESIST COMPOSITION, AND COMPOSITION FOR RESIST PROTECTIVE FILM | AFF1, AFF4, AFF2 | ALOX5AP 1791/4885 |
| US-20070207409-A1 | FLUORINATED COMPOUND, AND FLUOROPOLYMER, PROCESS FOR ITS PRODUCTION AND RESIST COMPOSITION CONTAINING IT | AFF4, AFF1, Q6ZSR9 | ALOX5AP 2018/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.