Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MAPT | P10636 | 6/20 | 0.73 |
| ▸ | HPGD | P15428 | 3/20 | 0.73 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.73 |
| ▸ | LMNA | P02545 | 3/20 | 0.67 |
| ▸ | MEN1 | O00255 | 2/20 | 0.67 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.67 |
| ▸ | CYP1A2 | P05177 | 2/20 | 0.67 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.67 |
| ▸ | TSHR | P16473 | 1/20 | 0.67 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.67 |
| ▸ | RAB9A | P51151 | 4/20 | 0.63 |
| ▸ | NPC1 | O15118 | 3/20 | 0.63 |
| ▸ | MAOB | P27338 | 1/20 | 0.62 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.62 |
| ▸ | TP53 | P04637 | 1/20 | 0.62 |
| ▸ | ESR2 | Q92731 | 1/20 | 0.62 |
| ▸ | NOX1 | Q9Y5S8 | 1/20 | 0.62 |
| ▸ | NPSR1 | Q6W5P4 | 2/20 | 0.61 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.61 |
| ▸ | RXFP1 | Q9HBX9 | 1/20 | 0.61 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL19409872 | 1.00 | MAPT (0.73) | MAPTHPGDALDH1A1LMNAMEN1 | |
| Benzoquinone SCHEMBL1535494 | 0.92 | MAPT (0.61) | MAPTHPGDALDH1A1LMNAMEN1 | |
| Anisole SCHEMBL27591330 | 0.90 | RAB9A (0.77) | MAPTHPGDALDH1A1LMNAMEN1 | |
| SCHEMBL11469683 | 0.89 | CES2 (0.73) | MAPTHPGDALDH1A1LMNAMEN1 | |
| SCHEMBL12757138 | 0.86 | HPGD (0.76) | MAPTHPGDALDH1A1LMNAMEN1 | |
| SCHEMBL19879308 | 0.86 | KMT2A (0.63) | MAPTHPGDALDH1A1LMNAMEN1 | |
| SCHEMBL22325651 | 0.86 | HPGD (0.69) | MAPTHPGDALDH1A1LMNAMEN1 | |
| SCHEMBL274966 | 0.85 | ALDH1A1 (1.00) | MAPTHPGDALDH1A1LMNAMEN1 | |
| Michler'S Ketone SCHEMBL36517 | 0.85 | ALDH1A1 (1.00) | MAPTHPGDALDH1A1LMNAMEN1 | |
| SCHEMBL51509 | 0.85 | RXFP1 (0.79) | MAPTHPGDALDH1A1LMNAMEN1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Appears in 2022 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-119842269-A | Black pigment liquid and preparation method thereof, photoresist composition, photosensitive glass and liquid crystal display device | 阜阳欣奕华新材料科技股份有限公司 | 2025-04-18 | — | — | CN | claimed |
| CN-119799077-A | Pigment dispersion liquid, photoresist composition, photosensitive glass and liquid crystal display device | 阜阳欣奕华新材料科技股份有限公司 | 2025-04-11 | — | — | CN | claimed |
| CN-119529165-A | Polyacrylate alkali-soluble resin and preparation method and application thereof | 盛虹(上海)新材料科技有限公司 | 2025-02-28 | — | — | CN | claimed |
| CN-119024642-A | Photocurable resin composition, application thereof and photosensitive dry film resist laminate | 杭州福斯特电子材料有限公司 | 2024-11-26 | — | — | CN | claimed |
| CN-118871861-A | Dry film resist, photosensitive dry film and copper-clad plate | 杭州福斯特电子材料有限公司 | 2024-10-29 | — | — | CN | claimed |
| CN-112947001-B | Photosensitive resin composition, dry film resist and manufacturing method of PCB | 杭州福斯特电子材料有限公司 | 2024-05-28 | — | — | CN | claimed |
| CN-117687268-B | Photosensitive resin composition, photosensitive dry film and copper-clad plate | 湖南初源新材料股份有限公司 | 2024-04-19 | — | — | CN | claimed |
| CN-117687268-A | Photosensitive resin composition, photosensitive dry film and copper-clad plate | 湖南初源新材料股份有限公司 | 2024-03-12 | — | — | CN | claimed |
| CN-117008417-A | Photosensitive resin composition, resist material and application | 杭州福斯特电子材料有限公司 | 2023-11-07 | — | — | CN | claimed |
| WO-2023185530-A1 | DRY FILM RESIST, PHOTOSENSITIVE DRY FILM, AND COPPER CLAD LAMINATE | 杭州福斯特电子材料有限公司 | 2023-10-05 | — | — | WO | claimed |
| US-6818375-B2 | FOR MANUFACTURING PRINTED WIRING BOARDS | ETERNAL TECHNOLOGY CORPORATION | 2004-11-16 | — | — | US | claimed |
| US-6555595-B1 | Ethylenically-unsaturated monomer, a photoinitiator and poly-3,4-epoxy-1-butene | RENSSELAER POLYTECHNIC INSTITUTE | 2003-04-29 | — | — | US | claimed |
| EP-1302519-A1 | Photopolymerizable compositions | RENSSELAER POLYTECHNIC INSTITUTE (US) | 2003-04-16 | — | — | EP | claimed |
| US-20030059709-A1 | Photoresist composition | SHIPLEY COMPANY, L.L.C. | 2003-03-27 | — | — | US | claimed |
| US-20030022098-A1 | Photoresist composition | SHIPLEY COMPANY, L.L.C. | 2003-01-30 | — | — | US | claimed |
| EP-1251399-A2 | Photoresist composition | Shipley Company LLC (US) | 2002-10-23 | — | — | EP | claimed |
| US-20020132180-A1 | Photoresist composition | SHIPLEY COMPANY, L.L.C. (US) | 2002-09-19 | — | — | US | claimed |
| US-6207347-B1 | URETHANE BIURET OLIGOMER. | NICHIGO-MORTON CO. LTD. (JP) | 2001-03-27 | — | — | US | claimed |
| US-6060216-A | USING AS AN ETHYLENICALLY UNSATURATED COMPOUND A COMPOUND IN WHICH AN ISOCYANURATE RING AND AN ACRYLATE (OR METHACRYLATE) ARE BONDED BY A FLEXIBLE ALKYLENE OXIDE GROUP (SUCH AS POLYETHYLENE OR POLYPROPYLENE OXIDE AND AN ALKYLENE GROUP | HITACHI CHEMICAL CO., LTD. (JP) | 2000-05-09 | — | — | US | claimed |
| US-4562142-A | PRINTED CIRCUITS | HITACHI CHEMICAL COMPANY, LTD. (JP) | 1985-12-31 | — | — | US | claimed |