SCHEMBL19603196

SCHEMBL19603196

Nc1ccc(NS(=O)(=O)c2cccc3c(S(=O)(=O)Nc4ccc(N)cc4)cccc23)cc1

nearest known ligand 0.58

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ KEAP1 Q14145 1/20 0.58
▸ EDNRA P25101 2/20 0.54
▸ KMT2A Q03164 4/20 0.53
▸ TSHR P16473 1/20 0.53
▸ PGR P06401 1/20 0.53
▸ CA1 P00915 1/20 0.51
▸ CA2 P00918 1/20 0.51
▸ HTT P42858 1/20 0.51
▸ CA9 Q16790 1/20 0.51
▸ MEN1 O00255 3/20 0.50
▸ ALDH1A1 P00352 1/20 0.50
▸ CYP1A2 P05177 1/20 0.50
▸ CYP3A4 P08684 1/20 0.50
▸ MAPT P10636 1/20 0.50
▸ CYP2C19 P33261 1/20 0.50
▸ HTR6 P50406 1/20 0.49
▸ RORA P35398 1/20 0.48
▸ RORC P51449 1/20 0.48
▸ NR1H2 P55055 1/20 0.48
▸ NR1H4 Q96RI1 1/20 0.48

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL19603058 0.87 TSHR (0.46) KEAP1EDNRATSHRPGRHTT
SCHEMBL19603055 0.85 CA2 (0.54) KEAP1EDNRAKMT2ATSHRPGR
SCHEMBL19603057 0.83 TSHR (0.59) KEAP1KMT2ATSHRHTTMEN1
SCHEMBL21914643 0.82 TSHR (0.61) KEAP1EDNRAKMT2ATSHRPGR
SCHEMBL20851311 0.81 EDNRA (0.54) EDNRATSHRPGRHTTALDH1A1
SCHEMBL20851111 0.81 ALDH1A1 (0.59) EDNRATSHRPGRCA1CA2
SCHEMBL14940241 0.81 KEAP1 (0.62) KEAP1KMT2ACA1CA2HTT
Hydrochloric Acid SCHEMBL4450885 0.80 NSD2 (0.62) EDNRATSHRPGRNSD2
SCHEMBL3653048 0.79 KEAP1 (0.59) KEAP1EDNRAKMT2ACA1CA2
SCHEMBL29118833 0.79 PGR (0.65) KEAP1KMT2APGRMEN1ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-10437149-B2 Photosensitive resin composition, planographic printing plate precursor, method for producing planographic printing plate, and polymer compound FUJIFILM CORPORATION (JP) 2019-10-08 — — US disclosed
US-20190176459-A1 POSITIVE TYPE PLANOGRAPHIC PRINTING PLATE PRECURSOR AND METHOD OF PRODUCING PLANOGRAPHIC PRINTING PLATE FUJIFILM CORPORATION (JP) 2019-06-13 — — US disclosed
US-20190094694-A1 POSITIVE TYPE PHOTOSENSITIVE RESIN COMPOSITION, POSITIVE TYPE PLANOGRAPHIC PRINTING PLATE PRECURSOR, AND METHOD OF PREPARING PLANOGRAPHIC PRINTING PLATE FUJIFILM CORPORATION (JP) 2019-03-28 — — US disclosed
US-20180149975-A1 NEGATIVE TYPE PHOTOSENSITIVE RESIN COMPOSITION, NEGATIVE TYPE PLANOGRAPHIC PRINTING PLATE PRECURSOR, AND METHOD OF PREPARING PLANOGRAPHIC PRINTING PLATE FUJIFILM CORPORATION (JP) 2018-05-31 — — US disclosed
US-20170329225-A1 PHOTOSENSITIVE RESIN COMPOSITION, PLANOGRAPHIC PRINTING PLATE PRECURSOR, METHOD FOR PRODUCING PLANOGRAPHIC PRINTING PLATE, AND POLYMER COMPOUND FUJIFILM CORPORATION (JP) 2017-11-16 — — US disclosed
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