Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HSD11B1 | P28845 | 3/20 | 0.41 |
| ▸ | FFAR4 | Q5NUL3 | 1/20 | 0.39 |
| ▸ | ATM | Q13315 | 1/20 | 0.38 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.37 |
| ▸ | MEN1 | O00255 | 2/20 | 0.37 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.37 |
| ▸ | PKM | P14618 | 1/20 | 0.37 |
| ▸ | ENPP2 | Q13822 | 2/20 | 0.37 |
| ▸ | PRMT5 | O14744 | 1/20 | 0.37 |
| ▸ | WDR77 | Q9BQA1 | 1/20 | 0.37 |
| ▸ | CA1 | P00915 | 3/20 | 0.36 |
| ▸ | CA2 | P00918 | 3/20 | 0.36 |
| ▸ | CA9 | Q16790 | 3/20 | 0.36 |
| ▸ | CA5A | P35218 | 2/20 | 0.36 |
| ▸ | CYP19A1 | P11511 | 1/20 | 0.35 |
| ▸ | HSP90AA1 | P07900 | 1/20 | 0.35 |
| ▸ | CXCR5 | P32302 | 1/20 | 0.35 |
| ▸ | APLNR | P35414 | 1/20 | 0.35 |
| ▸ | CCR6 | P51684 | 1/20 | 0.35 |
| ▸ | CA12 | O43570 | 2/20 | 0.35 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29516013 | 1.00 | HSD11B1 (0.41) | HSD11B1FFAR4ATMALDH1A1MEN1 | |
| SCHEMBL14509459 | 0.90 | ATM (0.38) | HSD11B1ATMALDH1A1MEN1KMT2A | |
| SCHEMBL197141 | 0.89 | LMNA (0.40) | HSD11B1ATMALDH1A1 | |
| SCHEMBL7788635 | 0.89 | ALDH1A1 (0.40) | HSD11B1ATMALDH1A1MEN1KMT2A | |
| SCHEMBL8137157 | 0.89 | ATM (0.41) | ATMALDH1A1MEN1KMT2APKM | |
| SCHEMBL28038938 | 0.88 | LMNA (0.40) | HSD11B1ATMALDH1A1 | |
| SCHEMBL7597216 | 0.87 | KMT2A (0.44) | HSD11B1ATMKMT2APKMCA2 | |
| SCHEMBL7602645 | 0.87 | PRMT5 (0.43) | ALDH1A1MEN1KMT2APRMT5WDR77 | |
| SCHEMBL29052299 | 0.86 | HTT (0.42) | HSD11B1FFAR4ALDH1A1MEN1KMT2A | |
| SCHEMBL14509395 | 0.83 | CA2 (0.41) | ATMALDH1A1MEN1KMT2AENPP2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 445 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8557144-B2 | Material for forming conductive antireflection film, method for forming conductive antireflection film, method for forming resist pattern, semiconductor device, and magnetic head | FUJITSU LIMITED (JP) | 2013-10-15 | — | — | US | claimed |
| CN-122072438-A | Underlayer composition for manufacturing electronic devices | 杜邦电子材料国际有限责任公司 | 2026-05-22 | — | — | CN | disclosed |
| CN-113412533-B | Spin-on composition comprising an inorganic oxide component and an alkynyloxy-substituted spin-on carbon component | 默克专利股份有限公司 | 2026-05-22 | — | — | CN | disclosed |
| EP-3928348-B1 | SPIN-ON COMPOSITIONS COMPRISING AN INORGANIC OXIDE COMPONENT AND AN ALKYNYLOXY SUBSTITUTED SPIN-ON CARBON COMPONENT USEFUL AS HARD MASKS AND FILLING MATERIALS WITH IMPROVED SHELF LIFE | MERCK PATENT GMBH (DE) | 2025-10-29 | — | — | EP | disclosed |
| US-12441822-B2 | Polymer, semiconductor composition comprising polymer, and method for manufacturing film using semiconductor composition | MERCK PATENT GMBH (DE) | 2025-10-14 | — | — | US | disclosed |
| CN-118955829-A | Ethynyl-derived complexes, compositions comprising the same, methods of making coatings therefrom, and methods of making devices comprising the coatings | 默克专利有限公司 | 2024-11-15 | — | — | CN | disclosed |
| CN-113454131-B | Polymer, semiconductor composition containing polymer, and method for producing film using semiconductor composition | 默克专利有限公司 | 2024-10-29 | — | — | CN | disclosed |
| CN-111492310-B | Ethynyl-derived complexes, compositions comprising the same, methods of making coatings therefrom, and methods of making devices comprising the coatings | 默克专利有限公司 | 2024-08-23 | — | — | CN | disclosed |
| CN-118401896-A | Composition for forming thick film and method for producing cured film using the same | 默克专利有限公司 | 2024-07-26 | — | — | CN | disclosed |
| US-20240210832-A1 | PHOTORESIST TOPCOAT COMPOSITION, AND METHOD OF FORMING PATTERNS USING THE COMPOSITION | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2024-06-27 | — | — | US | disclosed |
| EP-1563343-A1 | ANTIREFLECTIVE COMPOSITIONS FOR PHOTORESISTS | Clariant International Ltd. (CH) | 2005-08-17 | — | — | EP | disclosed |
| CN-1215381-C | Antireflective composition for deep ultraviolet photoresist | AZ ELECTRONIC MATERIAL CO LTD (JP) | 2005-08-17 | — | — | CN | disclosed |
| WO-2005052016-A2 | BOTTOM ANTIREFLECTIVE COATINGS | AZ ELECTRONIC MATERIALS USA CORP. (DE) | 2005-06-09 | — | — | WO | disclosed |
| US-20050112494-A1 | Bottom antireflective coatings | AZ ELECTRONIC MATERIALS USA CORP. | 2005-05-26 | — | — | US | disclosed |
| WO-2004046828-A1 | ANTIREFLECTIVE COMPOSITIONS FOR PHOTORESISTS | AZ ELECTRONIC MATERIALS USA CORP. (US) | 2004-06-03 | — | — | WO | disclosed |
| US-20040101779-A1 | Antireflective compositions for photoresists | MERCK PATENT GMBH (DE) | 2004-05-27 | — | — | US | disclosed |
| CN-1330779-A | Antireflective composition for deep ultraviolet photoresist | CLARIANT INT LTD (CH) | 2002-01-09 | — | — | CN | disclosed |
| EP-1131678-A2 | ANTIREFLECTIVE COMPOSITION FOR A DEEP ULTRAVIOLET PHOTORESIST | CLARIANT INTERNATIONAL LTD. (CH) | 2001-09-12 | — | — | EP | disclosed |
| US-6114085-A | Antireflective composition for a deep ultraviolet photoresist | CLARIANT FINANCE (BVI) LIMITED (VG) | 2000-09-05 | — | — | US | disclosed |
| WO-2000029906-A2 | ANTIREFLECTIVE COMPOSITION FOR A DEEP ULTRAVIOLET PHOTORESIST | CLARIANT INTERNATIONAL LTD. (CH) | 2000-05-25 | — | — | WO | disclosed |