SCHEMBL8137157

SCHEMBL8137157

O=[N+]([O-])c1cccc(C(F)(F)F)c1COS(=O)(=O)c1cccc(S(=O)(=O)OCc2c([N+](=O)[O-])cccc2C(F)(F)F)c1

nearest known ligand 0.43

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ATM Q13315 1/20 0.41
PRMT5 O14744 1/20 0.40
WDR77 Q9BQA1 1/20 0.40
LMNA P02545 1/20 0.37
MAPK1 P28482 1/20 0.37
ALDH1A1 P00352 3/20 0.36
KMT2A Q03164 2/20 0.35
MEN1 O00255 1/20 0.35
PKM P14618 1/20 0.35
ENPP2 Q13822 1/20 0.35
KIF11 P52732 1/20 0.34
PTGES O14684 2/20 0.34
CCR2 P41597 1/20 0.34
P2RX1 P51575 1/20 0.33
SIRT6 Q8N6T7 1/20 0.33
CYP1A2 P05177 1/20 0.33
CYP3A4 P08684 1/20 0.33
CYP2D6 P10635 1/20 0.33
CYP2C9 P11712 1/20 0.33
CYP2C19 P33261 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14509459 0.89 ATM (0.38) ATMLMNAALDH1A1KMT2AMEN1
SCHEMBL29516013 0.89 HSD11B1 (0.41) ATMPRMT5WDR77ALDH1A1KMT2A
SCHEMBL196874 0.89 HSD11B1 (0.41) ATMPRMT5WDR77ALDH1A1KMT2A
SCHEMBL197141 0.88 LMNA (0.40) ATMLMNAMAPK1ALDH1A1CCR2
SCHEMBL7788635 0.88 ALDH1A1 (0.40) ATMLMNAMAPK1ALDH1A1KMT2A
SCHEMBL28038938 0.87 LMNA (0.40) ATMLMNAMAPK1ALDH1A1CCR2
SCHEMBL7597216 0.86 KMT2A (0.44) ATMLMNAMAPK1KMT2APKM
SCHEMBL14509395 0.84 CA2 (0.41) ATMALDH1A1KMT2AMEN1ENPP2
SCHEMBL8138441 0.82 ATM (0.39) ATMLMNAALDH1A1KMT2AMEN1
SCHEMBL28285046 0.82 KMT2A (0.38) ATMLMNAMAPK1ALDH1A1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6159665-A Processes using photosensitive materials including a nitro benzyl ester photoacid generator LUCENT TECHNOLOGIES INC. (US) 2000-12-12 US disclosed
EP-0652488-B1 Resist materials and related processes AT & T CORP (US) 1999-05-19 EP disclosed
US-5830619-A BLEND OF POLYMER AND ACID GENERATING MATERIAL LUCENT TECHNOLOGIES INC. (US) 1998-11-03 US disclosed
US-5741629-A POLYMER CONTAINING SUBSTITUTED STYRENE MONOMERS LUCENT TECHNOLOGIES INC. (US) 1998-04-21 US disclosed
EP-0631188-B1 Resist materials AT & T CORP (US) 1997-09-10 EP disclosed
EP-0652488-A2 Resist materials and related processes AT&T Corp. (US) 1995-05-10 EP disclosed
EP-0631188-A1 Resist materials AT&T Corp. (US) 1994-12-28 EP disclosed
US-5366851-A Device fabrication process AT&T BELL LABORATORIES (US) 1994-11-22 US disclosed
EP-0524759-A1 Device fabrication process AT&T Corp. (US) 1993-01-27 EP disclosed