Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LMNA | P02545 | 3/20 | 0.40 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.40 |
| ▸ | MAPT | P10636 | 4/20 | 0.39 |
| ▸ | CCR2 | P41597 | 3/20 | 0.39 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.39 |
| ▸ | L3MBTL1 | Q9Y468 | 3/20 | 0.39 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.39 |
| ▸ | ATM | Q13315 | 1/20 | 0.38 |
| ▸ | FLT1 | P17948 | 1/20 | 0.37 |
| ▸ | FLT4 | P35916 | 1/20 | 0.37 |
| ▸ | KDR | P35968 | 1/20 | 0.37 |
| ▸ | HSD11B1 | P28845 | 1/20 | 0.35 |
| ▸ | IDO1 | P14902 | 1/20 | 0.35 |
| ▸ | HTT | P42858 | 1/20 | 0.35 |
| ▸ | KIF18A | Q8NI77 | 1/20 | 0.34 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.34 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.34 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.34 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.34 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.34 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL28038938 | 0.99 | LMNA (0.40) | LMNAALDH1A1MAPTCCR2SMN1; SMN2 | |
| SCHEMBL29516013 | 0.89 | HSD11B1 (0.41) | ALDH1A1ATMHSD11B1 | |
| SCHEMBL196874 | 0.89 | HSD11B1 (0.41) | ALDH1A1ATMHSD11B1 | |
| SCHEMBL14509459 | 0.89 | ATM (0.38) | LMNAALDH1A1MAPTL3MBTL1ATM | |
| SCHEMBL7788635 | 0.88 | ALDH1A1 (0.40) | LMNAALDH1A1MAPTSMN1; SMN2MAPK1 | |
| SCHEMBL8137157 | 0.88 | ATM (0.41) | LMNAALDH1A1CCR2MAPK1ATM | |
| SCHEMBL7597216 | 0.86 | KMT2A (0.44) | LMNAMAPTSMN1; SMN2MAPK1ATM | |
| SCHEMBL28285046 | 0.85 | KMT2A (0.38) | LMNAALDH1A1MAPTSMN1; SMN2L3MBTL1 | |
| SCHEMBL14509395 | 0.82 | CA2 (0.41) | ALDH1A1ATMCYP1A2CYP3A4CYP2D6 | |
| SCHEMBL3253710 | 0.81 | PTGS2 (0.42) | LMNAMAPTSMN1; SMN2MAPK1HTT |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 416 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12638775-B2 | Methods and compositions for improved patterning of photoresist | TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. (TW) | 2026-05-26 | — | — | US | disclosed |
| CN-113412533-B | Spin-on composition comprising an inorganic oxide component and an alkynyloxy-substituted spin-on carbon component | 默克专利股份有限公司 | 2026-05-22 | — | — | CN | disclosed |
| US-20260140448-A1 | UNDERLAYER COMPOSITION FOR USE IN MANUFACTURING ELECTRONIC DEVICES | DUPONT ELECTRONIC MAT INTERNATIONAL LLC (US) | 2026-05-21 | — | — | US | disclosed |
| EP-3928348-B1 | SPIN-ON COMPOSITIONS COMPRISING AN INORGANIC OXIDE COMPONENT AND AN ALKYNYLOXY SUBSTITUTED SPIN-ON CARBON COMPONENT USEFUL AS HARD MASKS AND FILLING MATERIALS WITH IMPROVED SHELF LIFE | MERCK PATENT GMBH (DE) | 2025-10-29 | — | — | EP | disclosed |
| US-12441822-B2 | Polymer, semiconductor composition comprising polymer, and method for manufacturing film using semiconductor composition | MERCK PATENT GMBH (DE) | 2025-10-14 | — | — | US | disclosed |
| US-20250246528-A1 | SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURE | TAIWAN SEMICONDUCTOR MFG CO LTD (TW) | 2025-07-31 | — | — | US | disclosed |
| US-12313971-B2 | Coated underlayer for overcoated photoresist | DUPONT ELECTRONIC MATERIALS INTERNATIONAL, LLC (US) | 2025-05-27 | — | — | US | disclosed |
| US-12300593-B2 | Semiconductor device and method of manufacture | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 2025-05-13 | — | — | US | disclosed |
| US-12234369-B2 | Photoresist topcoat compositions and methods of processing photoresist compositions | DUPONT ELECTRONIC MATERIALS INTERNATIONAL, LLC (US) | 2025-02-25 | — | — | US | disclosed |
| CN-118955829-A | Ethynyl-derived complexes, compositions comprising the same, methods of making coatings therefrom, and methods of making devices comprising the coatings | 默克专利有限公司 | 2024-11-15 | — | — | CN | disclosed |
| EP-1563343-A1 | ANTIREFLECTIVE COMPOSITIONS FOR PHOTORESISTS | Clariant International Ltd. (CH) | 2005-08-17 | — | — | EP | disclosed |
| CN-1215381-C | Antireflective composition for deep ultraviolet photoresist | AZ ELECTRONIC MATERIAL CO LTD (JP) | 2005-08-17 | — | — | CN | disclosed |
| WO-2005052016-A2 | BOTTOM ANTIREFLECTIVE COATINGS | AZ ELECTRONIC MATERIALS USA CORP. (DE) | 2005-06-09 | — | — | WO | disclosed |
| US-20050112494-A1 | Bottom antireflective coatings | AZ ELECTRONIC MATERIALS USA CORP. | 2005-05-26 | — | — | US | disclosed |
| WO-2004046828-A1 | ANTIREFLECTIVE COMPOSITIONS FOR PHOTORESISTS | AZ ELECTRONIC MATERIALS USA CORP. (US) | 2004-06-03 | — | — | WO | disclosed |
| US-20040101779-A1 | Antireflective compositions for photoresists | MERCK PATENT GMBH (DE) | 2004-05-27 | — | — | US | disclosed |
| CN-1330779-A | Antireflective composition for deep ultraviolet photoresist | CLARIANT INT LTD (CH) | 2002-01-09 | — | — | CN | disclosed |
| EP-1131678-A2 | ANTIREFLECTIVE COMPOSITION FOR A DEEP ULTRAVIOLET PHOTORESIST | CLARIANT INTERNATIONAL LTD. (CH) | 2001-09-12 | — | — | EP | disclosed |
| US-6114085-A | Antireflective composition for a deep ultraviolet photoresist | CLARIANT FINANCE (BVI) LIMITED (VG) | 2000-09-05 | — | — | US | disclosed |
| WO-2000029906-A2 | ANTIREFLECTIVE COMPOSITION FOR A DEEP ULTRAVIOLET PHOTORESIST | CLARIANT INTERNATIONAL LTD. (CH) | 2000-05-25 | — | — | WO | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-12638775-B2 | Methods and compositions for improved patterning of photoresist | DSG1, SCO2, ERCC1 | LMNA 606/4885ALDH1A1 1401/4885MAPT 1537/4885 |
| US-20260140448-A1 | UNDERLAYER COMPOSITION FOR USE IN MANUFACTURING ELECTRONIC DEVICES | ARCN1, ASH2L, ITGB4 | LMNA 1543/4885ALDH1A1 2211/4885MAPT 3460/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.