Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ADRA2A | P08913 | 10/20 | 0.40 |
| ▸ | ADRA2B | P18089 | 10/20 | 0.40 |
| ▸ | ADRA2C | P18825 | 10/20 | 0.40 |
| ▸ | HTR1A | P08908 | 6/20 | 0.39 |
| ▸ | KCNH2 | Q12809 | 3/20 | 0.38 |
| ▸ | SLC6A2 | P23975 | 1/20 | 0.38 |
| ▸ | SLC6A4 | P31645 | 1/20 | 0.38 |
| ▸ | NISCH | Q9Y2I1 | 2/20 | 0.38 |
| ▸ | TAS1R3 | Q7RTX0 | 1/20 | 0.37 |
| ▸ | TAS1R1 | Q7RTX1 | 1/20 | 0.37 |
| ▸ | IRAK4 | Q9NWZ3 | 1/20 | 0.37 |
| ▸ | MEN1 | O00255 | 1/20 | 0.35 |
| ▸ | POLB | P06746 | 1/20 | 0.35 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.35 |
| ▸ | MAOA | P21397 | 1/20 | 0.35 |
| ▸ | MAOB | P27338 | 1/20 | 0.35 |
| ▸ | USP2 | O75604 | 1/20 | 0.35 |
| ▸ | HPGD | P15428 | 1/20 | 0.35 |
| ▸ | TSHR | P16473 | 1/20 | 0.35 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.35 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1971094 | 0.83 | SLC6A2 (0.40) | ADRA2AADRA2BADRA2CKCNH2SLC6A2 | |
| SCHEMBL1974352 | 0.81 | IDO1 (0.47) | MEN1KMT2ASMN1; SMN2ALDH1A1ACHE | |
| SCHEMBL1971325 | 0.81 | L3MBTL1 (0.53) | MEN1POLBKMT2ATSHRNPSR1 | |
| SCHEMBL1973432 | 0.77 | SLC6A2 (0.40) | ADRA2AADRA2BADRA2CKCNH2SLC6A2 | |
| SCHEMBL1970120 | 0.77 | MAPT (0.34) | KCNH2TSHRNPSR1ALDH1A1 | |
| SCHEMBL1969698 | 0.76 | IRAK4 (0.44) | ADRA2AADRA2BADRA2CKCNH2SLC6A2 | |
| SCHEMBL5412735 | 0.76 | ADRA2A (0.51) | ADRA2AADRA2BADRA2CKCNH2SLC6A2 | |
| SCHEMBL5414155 | 0.74 | SLC6A2 (0.43) | ADRA2AADRA2BADRA2CKCNH2SLC6A2 | |
| SCHEMBL8142412 | 0.73 | TAAR1 (0.41) | ADRA2AADRA2BADRA2CMEN1KMT2A | |
| SCHEMBL12844604 | 0.73 | ADRA2A (0.54) | ADRA2AADRA2BADRA2CHTR1AKCNH2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 124 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20260118764-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM AND SILICON-CONTAINING RESIST UNDERLAYER FILM | NISSAN CHEMICAL CORPORATION (JP) | 2026-04-30 | — | — | US | disclosed |
| EP-4715465-A1 | MULTILAYER BODY, METHOD FOR PRODUCING MULTILAYER BODY, AND PHOTOSENSITIVE SURFACE MODIFIER | Nissan Chemical Corporation (JP) | 2026-03-25 | — | — | EP | disclosed |
| US-12585188-B2 | Composition for forming resist underlying film | NISSAN CHEMICAL CORPORATION (JP) | 2026-03-24 | — | — | US | disclosed |
| US-20260044081-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST FILM AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2026-02-12 | — | — | US | disclosed |
| EP-4692941-A2 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST FILM AND PATTERNING PROCESS | Shin-Etsu Chemical Co., Ltd. (JP) | 2026-02-11 | — | — | EP | disclosed |
| EP-4679175-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM | Nissan Chemical Corporation (JP) | 2026-01-14 | — | — | EP | disclosed |
| US-20250377596-A1 | SILICON-CONTAINING RESIST UNDERLAYER FILM-FORMING COMPOSITION | NISSAN CHEMICAL CORPORATION (JP) | 2025-12-11 | — | — | US | disclosed |
| US-12493243-B2 | Film-forming composition | NISSAN CHEMICAL CORPORATION (JP) | 2025-12-09 | — | — | US | disclosed |
| US-20250362609-A1 | SILICON-CONTAINING RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING POLYFUNCTIONAL SULFONIC ACID | NISSAN CHEMICAL CORPORATION (JP) | 2025-11-27 | — | — | US | disclosed |
| US-20250355357-A1 | SILICON-CONTAINING RESIST UNDERLAYER FILM-FORMING COMPOSITION | NISSAN CHEMICAL CORPORATION (JP) | 2025-11-20 | — | — | US | disclosed |
| US-8877425-B2 | Silicon-containing resist underlayer film forming composition having fluorine-based additive | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2014-11-04 | — | — | US | disclosed |
| US-8864894-B2 | Resist underlayer film forming composition containing silicone having onium group | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2014-10-21 | — | — | US | disclosed |
| US-8828879-B2 | Silicon-containing composition having sulfonamide group for forming resist underlayer film | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2014-09-09 | — | — | US | disclosed |
| EP-2479615-B1 | SILICON-CONTAINING COMPOSITION HAVING SULFONAMIDE GROUP FOR FORMING RESIST UNDERLAYER FILM | NISSAN CHEMICAL IND LTD (JP) | 2014-04-23 | — | — | EP | disclosed |
| US-20130224957-A1 | SILICON-CONTAINING RESIST UNDERLAYER FILM FORMING COMPOSITION HAVING FLUORINE-BASED ADDITIVE | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2013-08-29 | — | — | US | disclosed |
| US-20130183830-A1 | SILICON-CONTAINING COMPOSITION FOR FORMATION OF RESIST UNDERLAYER FILM, WHICH CONTAINS ORGANIC GROUP CONTAINING PROTECTED ALIPHATIC ALCOHOL | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2013-07-18 | — | — | US | disclosed |
| EP-2479615-A1 | SILICON-CONTAINING COMPOSITION HAVING SULFONAMIDE GROUP FOR FORMING RESIST UNDERLAYER FILM | Nissan Chemical Industries, Ltd. (JP) | 2012-07-25 | — | — | EP | disclosed |
| US-20120178261-A1 | SILICON-CONTAINING COMPOSITION HAVING SULFONAMIDE GROUP FOR FORMING RESIST UNDERLAYER FILM | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2012-07-12 | — | — | US | disclosed |
| EP-2336256-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM WITH ONIUM GROUP | Nissan Chemical Industries, Ltd. (JP) | 2011-06-22 | — | — | EP | disclosed |
| US-20110143149-A1 | RESIST UNDERLAYER FILM FORMING COMPOSITION CONTAINING SILICONE HAVING ONIUM GROUP | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2011-06-16 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (5 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20260118764-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM AND SILICON-CONTAINING RESIST UNDERLAYER FILM | SRSF1, MACF1, SRPK1 | ADRA2A 4262/4885ADRA2B 4559/4885ADRA2C 4431/4885 |
| US-20110143149-A1 | RESIST UNDERLAYER FILM FORMING COMPOSITION CONTAINING SILICONE HAVING ONIUM GROUP | SRR, KDM2B, MSR1 | ADRA2A 2393/4885ADRA2B 1522/4885ADRA2C 3298/4885 |
| US-12585188-B2 | Composition for forming resist underlying film | SRR, SMC1A, ASH2L | ADRA2A 1545/4885ADRA2B 1154/4885ADRA2C 2637/4885 |
| US-20120178261-A1 | SILICON-CONTAINING COMPOSITION HAVING SULFONAMIDE GROUP FOR FORMING RESIST UNDERLAYER FILM | STS, SI, MUS81 | ADRA2A 4692/4885ADRA2B 4862/4885ADRA2C 4852/4885 |
| US-20260044081-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST FILM AND PATTERNING PROCESS | SMC1A, SPOUT1, LBR | ADRA2A 1179/4885ADRA2B 1452/4885ADRA2C 2129/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.