SCHEMBL19712937

SCHEMBL19712937

[CH2]CNC(=O)Oc1ccc2cc(Cl)ccc2c1-c1c(OC(=O)NC[CH2])ccc2cc(Cl)ccc12

nearest known ligand 0.45

Predicted protein targets (top 3)

geneUniProtsupporting neighboursconfidence
MEN1 O00255 1/20 0.37
KMT2A Q03164 1/20 0.37
MAPT P10636 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL19712900 0.94 NCEH1 (0.44) MEN1KMT2A
SCHEMBL19712947 0.84 NCEH1 (0.48) KMT2A
SCHEMBL19712952 0.84 NCEH1 (0.35)
SCHEMBL19712933 0.84 FAAH (0.40)
SCHEMBL19712913 0.81 NCEH1 (0.49)
SCHEMBL19712917 0.80 NCEH1 (0.53) MAPT
SCHEMBL19712928 0.79 ALDH1A1 (0.38)
SCHEMBL19712944 0.79 NCEH1 (0.50) MEN1KMT2AMAPT
SCHEMBL19712938 0.79 NCEH1 (0.44) MAPT
SCHEMBL19712941 0.79 NCEH1 (0.44) MAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11267943-B2 Film structure containing a photopolymer layer for holographic exposure and a coating layer of high resistance COVESTRO DEUTSCHLAND AG (DE) 2022-03-08 US disclosed
US-20210292505-A1 FILM STRUCTURE CONTAINING A PHOTOPOLYMER LAYER FOR HOLOGRAPHIC EXPOSURE AND A COATING LAYER OF HIGH RESISTANCE COVESTRO DEUTSCHLAND AG (DE) 2021-09-23 US disclosed
US-20200166888-A1 HOLOGRAPHIC MEDIUM CONTAINING A PHOTOPOLYMER LAYER FOR HOLOGRAPHIC EXPOSURE AND A HIGHLY RESISTANT COATING LAYER COVESTRO DEUTSCHLAND AG (DE) 2020-05-28 US disclosed
US-10241402-B2 Naphthyl acrylates as writing monomers for photopolymers COVESTRO DEUTSCHLAND AG (DE) 2019-03-26 US disclosed
US-20170363957-A1 NAPHTHYL ACRYLATES AS WRITING MONOMERS FOR PHOTOPOLYMERS COVESTRO DEUTSCHLAND AG (DE) 2017-12-21 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20170363957-A1 NAPHTHYL ACRYLATES AS WRITING MONOMERS FOR PHOTOPOLYMERS NEFM, ACR, DIAPH1 MEN1 2606/4885KMT2A 1291/4885MAPT 207/4885
US-10241402-B2 Naphthyl acrylates as writing monomers for photopolymers NEFM, ACR, DIAPH1 MEN1 2606/4885KMT2A 1291/4885MAPT 207/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.