Predicted protein targets (top 12)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | RAB9A | P51151 | 1/20 | 0.40 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.38 |
| ▸ | MAPT | P10636 | 1/20 | 0.38 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.38 |
| ▸ | POLB | P06746 | 1/20 | 0.35 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.34 |
| ▸ | MEN1 | O00255 | 1/20 | 0.34 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.34 |
| ▸ | ACACB | O00763 | 3/20 | 0.34 |
| ▸ | GAA | P10253 | 1/20 | 0.33 |
| ▸ | FKBP1A | P62942 | 1/20 | 0.32 |
| ▸ | TSHR | P16473 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL15978740 | 0.85 | ALDH1A1 (0.49) | RAB9ASMN1; SMN2MAPTALDH1A1POLB | |
| SCHEMBL19901948 | 0.83 | POLB (0.37) | SMN1; SMN2ALDH1A1POLBKMT2AMEN1 | |
| SCHEMBL17936660 | 0.79 | RAB9A (0.45) | RAB9ASMN1; SMN2MAPTALDH1A1POLB | |
| SCHEMBL20109662 | 0.77 | POLB (0.34) | POLBKMT2AMEN1 | |
| SCHEMBL19901978 | 0.76 | HTR3E (0.33) | — | |
| SCHEMBL18356147 | 0.75 | TDP1 (0.44) | RAB9ASMN1; SMN2ALDH1A1KMT2AMEN1 | |
| SCHEMBL18356832 | 0.74 | ALDH1A1 (0.51) | RAB9ASMN1; SMN2MAPTALDH1A1POLB | |
| SCHEMBL19901944 | 0.72 | HTR3E (0.38) | — | |
| SCHEMBL20109663 | 0.72 | POLB (0.46) | RAB9ASMN1; SMN2ALDH1A1POLBKMT2A | |
| SCHEMBL12459475 | 0.70 | PTPN1 (0.43) | RAB9ASMN1; SMN2MAPTALDH1A1KMT2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9904168-B2 | Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, mask blank provided with actinic ray-sensitive or radiation-sensitive film, pattern forming method, method for manufacturing electronic device, and electronic device | FUJIFILM CORPORATION (JP) | 2018-02-27 | — | — | US | disclosed |