Predicted protein targets (top 9)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HTR3E | A5X5Y0 | 4/20 | 0.33 |
| ▸ | HTR3B | O95264 | 4/20 | 0.33 |
| ▸ | HTR3A | P46098 | 4/20 | 0.33 |
| ▸ | HTR3D | Q70Z44 | 4/20 | 0.33 |
| ▸ | HTR3C | Q8WXA8 | 4/20 | 0.33 |
| ▸ | LGALS9 | O00182 | 1/20 | 0.32 |
| ▸ | LGALS1 | P09382 | 1/20 | 0.32 |
| ▸ | LGALS3 | P17931 | 1/20 | 0.32 |
| ▸ | LGALS7; LGALS7B | P47929 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL10053070 | 0.86 | HDAC4 (0.33) | HTR3EHTR3BHTR3AHTR3DHTR3C | |
| SCHEMBL19901944 | 0.85 | HTR3E (0.38) | HTR3EHTR3BHTR3AHTR3DHTR3C | |
| SCHEMBL19901945 | 0.83 | POLB (0.33) | — | |
| SCHEMBL19901950 | 0.80 | HTR3A (0.32) | HTR3EHTR3BHTR3AHTR3DHTR3C | |
| SCHEMBL10053086 | 0.80 | TP53 (0.31) | HTR3EHTR3BHTR3AHTR3DHTR3C | |
| SCHEMBL10053080 | 0.80 | TP53 (0.31) | HTR3EHTR3BHTR3AHTR3DHTR3C | |
| SCHEMBL10053071 | 0.79 | HDAC4 (0.33) | HTR3EHTR3BHTR3AHTR3DHTR3C | |
| SCHEMBL19901949 | 0.76 | RAB9A (0.40) | — | |
| SCHEMBL10053075 | 0.73 | HTR3E (0.35) | HTR3EHTR3BHTR3AHTR3DHTR3C | |
| SCHEMBL20109662 | 0.72 | POLB (0.34) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9904168-B2 | Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, mask blank provided with actinic ray-sensitive or radiation-sensitive film, pattern forming method, method for manufacturing electronic device, and electronic device | FUJIFILM CORPORATION (JP) | 2018-02-27 | — | — | US | disclosed |